Home » Effects of boron profiles on the open circuit voltage of p-i-n and n-i-p amorphous silicon solar cells

TITLE

Effects of boron profiles on the open circuit voltage of p-i-n and n-i-p amorphous silicon solar cells

AUTHOR(S)

Jeffrey, F. R.; Vernstrom, G. D.

PUB. DATE

June 1986

SOURCE

Applied Physics Letters;6/2/1986, Vol. 48 Issue 22, p1538

SOURCE TYPE

Academic Journal

DOC. TYPE

Article

ABSTRACT

Data are presented showing that boron carryover into the i layer is responsible for the commonly observed difference in open circuit voltage between p-i-n and n-i-p amorphous silicon solar cells. It is proposed that the lower voltage samples are being limited by surface recombination at the p/i interface and that boron carryover reduces this recombination current. The Voc is then able to rise to the point where it is limited by the bulk recombination current.

ACCESSION #

9819975

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