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Abstract:

A printed wiring board includes an interlayer insulation layer, first
pads positioned to mount a semiconductor element and forming a first pad
group on the insulation layer, second pads forming a second pad group on
the insulation layer and positioned along a peripheral portion of the
first group, a first solder-resist layer formed on the insulation layer
and having first openings exposing the first pads, respectively, and
second openings exposing the second pads, respectively, conductive posts
formed on the second pads through the second openings of the first
solder-resist layer, respectively, and a second solder-resist layer
formed on the first solder-resist layer and having a third opening
exposing the first pads and fourth openings exposing surfaces of the
posts, respectively. The second openings have a diameter greater than a
diameter of the posts, and the second solder-resist layer is filling gaps
formed between the second openings and the posts.

Claims:

1. A printed wiring board, comprising: an interlayer insulation layer; a
plurality of first pads positioned to mount a semiconductor element and
forming a first pad group on the interlayer insulation layer; a plurality
of second pads forming a second pad group on the interlayer insulation
layer and positioned along a peripheral portion of the first pad group; a
first solder-resist layer formed on the interlayer insulation layer and
having a plurality of first opening portions exposing portions of the
first pads, respectively, and a plurality of second opening portions
exposing portions of the second pads, respectively; a plurality of
conductive posts formed on the plurality of second pads through the
plurality of second opening portions of the first solder-resist layer,
respectively; and a second solder-resist layer formed on the first
solder-resist layer and having a third opening portion exposing the
plurality of first pads and a plurality of fourth opening portions
exposing surface portions of the conductive posts, respectively, wherein
the plurality of second opening portions has a diameter which is set
greater than a diameter of the plurality of conductive posts, and the
second solder-resist layer is filling gaps formed between the second
opening portions and the conductive posts.

2. The printed wiring board according to claim 1, wherein the first
solder-resist layer and the second solder-resist layer have the same
composition.

3. The printed wiring board according to claim 1, further comprising: a
plurality of first bumps formed in the plurality of first opening
portions of the first solder-resist layer, respectively; and a plurality
of second bumps formed in the plurality of fourth opening portions of the
second solder-resist layer, respectively.

4. The printed wiring board according to claim 1, wherein the plurality
of fourth opening portions of the second solder-resist layer has
diameters which are set greater than diameters of the plurality of first
opening portions of the first solder-resist layer.

5. The printed wiring board according to claim 1, wherein the surface
portions of the conductive posts have peripheral portions covered by the
second solder-resist layer.

6. The printed wiring board according to claim 1, wherein the plurality
of fourth opening portions exposes the surface portions and side portions
of the conductive posts.

7. The printed wiring board according to claim 1, wherein the plurality
of second pads is in contact with the first solder-resist layer and the
second solder-resist layer.

8. The printed wiring board according to claim 1, wherein the plurality
of conductive posts is in contact with the second solder-resist layer and
is not in contact with the first solder-resist layer.

9. The printed wiring board according to claim 1, wherein the plurality
of second pads is positioned to mount a package substrate over the
semiconductor element mounted on the plurality of first pads.

10. A method for manufacturing a printed wiring board, comprising:
forming on an interlayer insulation layer a plurality of first pads
positioned to mount a semiconductor element such that the plurality of
first pads forms a first pad group; forming a plurality of second pads
along a peripheral portion of the first pad group such that the plurality
of second pads forms a second pad group on the interlayer insulation
layer; forming on the interlayer insulation layer a first solder-resist
layer having a plurality of first opening portions such that the first
opening portions expose at least portions of the first pads,
respectively, and a plurality of second opening portions such that the
second opening portions expose at least portions of the second pads,
respectively; forming a plurality of conductive posts on the plurality of
second pads through the plurality of second opening portions of the first
solder-resist layer, respectively; and forming on the first solder-resist
layer a second solder-resist layer having a third opening portion such
that the third opening portion exposes the first pad group and a
plurality of fourth opening portions such that the fourth opening
portions expose surface portions of the conductive posts, respectively,
wherein the plurality of second opening portions has a diameter which is
set greater than a diameter of the plurality of conductive posts, and the
forming of the second solder-resist layer comprises filling gaps formed
between the second opening portions and the conductive posts.

11. The method for manufacturing a printed wiring board according to
claim 10, wherein the first solder-resist layer and the second
solder-resist layer have the same composition.

12. The method for manufacturing a printed wiring board according to
claim 10, further comprising: forming a plurality of first bumps in the
plurality of first opening portions of the first solder-resist layer; and
forming a plurality of second bumps in the plurality of fourth opening
portions of the second solder-resist layer.

13. The method for manufacturing a printed wiring board according to
claim 10, wherein the forming of the second solder-resist layer comprises
forming the plurality of fourth opening portions such that the plurality
of fourth opening portions has diameters which are set greater than
diameters of the plurality of first opening portions of the first
solder-resist layer.

14. The method for manufacturing a printed wiring board according to
claim 10, wherein the forming of the second solder-resist layer comprises
forming the plurality of fourth opening portions such that the plurality
of fourth opening portions exposes only the surface portions of the
conductive posts, respectively.

15. The method for manufacturing a printed wiring board according to
claim 10, wherein the forming of the second solder-resist layer comprises
forming the plurality of fourth opening portions such that the plurality
of fourth opening portions exposes the surface portions and side portions
of the conductive posts.

16. The method for manufacturing a printed wiring board according to
claim 10, wherein the forming of the first solder-resist layer comprises
forming of the first solder-resist layer such that the plurality of
second pads is in contact with the first solder-resist layer, and the
forming of the second solder-resist layer comprises forming of the second
solder-resist layer such that the plurality of second pads is in contact
with the second solder-resist layer.

17. The method for manufacturing a printed wiring board according to
claim 10, wherein the forming of the conductive posts comprises forming
the conductive posts such that the plurality of conductive posts is in
contact with the second solder-resist layer and is not in contact with
the first solder-resist layer.

18. The method for manufacturing a printed wiring board according to
claim 10, wherein the forming of the second solder-resist layer comprises
laminating a solder-resist layer for forming the second solder-resist
layer on the first solder-resist layer which is uncured.

19. The method for manufacturing a printed wiring board according to
claim 10, wherein the first solder-resist layer and the second
solder-resist layer are thermally cured simultaneously.

20. The method for manufacturing a printed wiring board according to
claim 10, wherein the forming of the first solder-resist layer comprises
exposing and developing the first solder-resist layer such that the first
opening portions and the second opening portions are formed, and the
forming of the second solder-resist layer comprises exposing and
developing the second solder-resist layer such that the third opening
portion and the fourth opening portions are formed.

Description:

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] The present application is based on and claims the benefit of
priority to U.S. Application No. 61/470,006, filed Mar. 31, 2011, the
entire contents of which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

[0002] 1. Field of the Invention

[0003] The present invention relates to a package-substrate-mounting
printed wiring board for mounting an upper package substrate of a
package-on-package substrate, and to a method for manufacturing such a
printed wiring board.

[0004] 2. Discussion of the Background

[0005] US 2010/0123235 A1 describes a package-substrate-mounting printed
wiring board for mounting an upper package substrate where a second pad
is formed on a first pad for connecting the upper package substrate. The
entire contents of this publication are incorporated herein by reference.

SUMMARY OF THE INVENTION

[0006] According to one aspect of the present invention, a printed wiring
board includes an interlayer insulation layer, first pads positioned to
mount a semiconductor element and forming a first pad group on the
interlayer insulation layer, second pads forming a second pad group on
the interlayer insulation layer and positioned along a peripheral portion
of the first pad group, a first solder-resist layer formed on the
interlayer insulation layer and having first opening portions exposing
portions of the first pads, respectively, and second opening portions
exposing portions of the second pads, respectively, conductive posts
formed on the second pads through the second opening portions of the
first solder-resist layer, respectively, and a second solder-resist layer
formed on the first solder-resist layer and having a third opening
portion exposing the first pads and fourth opening portions exposing
surface portions of the conductive posts, respectively. The second
opening portions have a diameter which is set greater than a diameter of
the conductive posts, and the second solder-resist layer is filling gaps
formed between the second opening portions and the conductive posts.

[0007] According to another aspect of the present invention, a method for
manufacturing a printed wiring board includes forming on an interlayer
insulation layer first pads positioned to mount a semiconductor element
such that the first pads form a first pad group, forming second pads
along a peripheral portion of the first pad group such that the second
pads form a second pad group on the interlayer insulation layer, forming
on the interlayer insulation layer a first solder-resist layer having
first opening portions such that the first opening portions expose at
least portions of the first pads, respectively, and second opening
portions such that the second opening portions expose at least portions
of the second pads, respectively, forming conductive posts on the second
pads through the second opening portions of the first solder-resist
layer, respectively, and forming on the first solder-resist layer a
second solder-resist layer having a third opening portion such that the
third opening portion exposes the first pad group and fourth opening
portions such that the fourth opening portions expose surface portions of
the conductive posts, respectively. The second opening portions have a
diameter which is set greater than a diameter of the conductive posts,
and the forming of the second solder-resist layer includes filling gaps
formed between the second opening portions and the conductive posts.

BRIEF DESCRIPTION OF THE DRAWINGS

[0008] A more complete appreciation of the invention and many of the
attendant advantages thereof will be readily obtained as the same becomes
better understood by reference to the following detailed description when
considered in connection with the accompanying drawings, wherein:

[0009] FIGS. 1(A)-1(E) are views of steps showing a method for
manufacturing a package-substrate- mounting printed wiring board
according to a first example of the present invention;

[0010] FIGS. 2(A)-2(D) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0011] FIGS. 3(A)-3(C) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0012] FIGS. 4(A)-4(D) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0013] FIGS. 5(A)-5(C) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0014] FIGS. 6(A)-6(C) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0015] FIGS. 7(A)-7(C) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0016] FIGS. 8(A)-8(C) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0017] FIGS. 9(A)-9(C) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0018] FIGS. 10(A)-10(C) are views of steps showing the method for
manufacturing a package-substrate-mounting printed wiring board according
to the first example;

[0019] FIG. 11 is a cross-sectional view of a package-substrate-mounting
printed wiring board before mounting an IC chip and a package substrate;

[0020]FIG. 12 is a cross-sectional view of the package-substrate-mounting
printed wiring board shown in FIG. 11 on which an IC chip and a package
substrate are mounted;

[0021]FIG. 13 is a plan view of the package-substrate-mounting printed
wiring board shown in FIG. 8(C);

[0022]FIG. 14(A) is a magnified cross-sectional view showing a surface of
the first solder-resist layer before exposure and development, and FIG.
14(B) is a magnified cross-sectional view showing a conductive post; and

[0023]FIG. 15 is a magnified cross-sectional view showing another example
of a conductive post.

DETAILED DESCRIPTION OF THE EMBODIMENTS

[0024] The embodiments will now be described with reference to the
accompanying drawings, wherein like reference numerals designate
corresponding or identical elements throughout the various drawings.

[0025] With reference to FIGS. 11 and 12, following is a description of a
package-substrate-mounting printed wiring board according to a first
example of the present invention.

[0028] In package-substrate-mounting printed wiring board 10, conductive
circuits 34 are formed on surfaces of core substrate 30. Conductive
circuit 34 on a first surface (upper surface) of core substrate 30 is
connected to conductive circuit 34 on a second surface (lower surface) by
through-hole conductor 36. Through-hole conductor 36 is filled with
metal. On conductive circuit 34 of the core substrate, interlayer
insulation layer 50 is formed, having via conductor 60 and conductive
circuit 58, and interlayer insulation layer 150 is formed, having via
conductor 160, first pad 158 and second pad 159. Conductive post 80 is
formed on second pad 159 which is arranged along the periphery of the
first pad group. First solder-resist layer 70 is formed on via conductor
160, first pad 158 and second pad 159. In first opening portions 71 of
first solder-resist layer 70, first bump (76U) is formed on via conductor
160 or first pad 158 in the central area of the first surface, and solder
bump (76D) is formed on the second surface. First solder-resist layer 70
has second opening portion 73 which partially exposes second pad 159 and
exposes conductive post 80. First solder-resist layer 70 is formed on
interlayer insulation layer 150, and second solder-resist layer 170 is
further formed on first solder-resist layer 70. Second solder-resist
layer 170 is filled between the inner wall of a second opening portion
and a conductive post. In second solder-resist layer 170, third opening
portion (170A) is formed to expose the first pad group, and fourth
opening portion 171 to expose the upper surface of conductive post 80.
Second bump (76S) is formed in fourth opening portion 171 of second
solder-resist layer 170.

[0029]FIG. 13 shows a plan view of package-substrate-mounting printed
wiring board 10 prior to loading solder balls. Second solder-resist layer
170 is formed along the periphery of package-substrate-mounting printed
wiring board 10, and has third opening portion (170A) in the central
area. Fourth opening portion 171 for accommodating second bump (76S) is
formed along the periphery of package-substrate-mounting printed wiring
board 10. In first solder-resist layer 70, first opening portion 71 for
positioning first bump (76U) is formed in the central area of
package-substrate-mounting printed wiring board 10.

[0030]FIG. 14(B) is a magnified view of conductive post 80 before second
bump (76S) is formed. Conductive post 80 is formed on second pad 159. The
thickness of second pad 159 is set at 15 μm. The thickness from the
upper surface of second pad 159 to a surface of first solder-resist layer
70 is set at 20 μm. The thickness of second solder-resist layer 170 is
set at 20 μm. Namely, conductive post 80 is accommodated in a 55
μm-thick portion, which is the sum of thicknesses of first
solder-resist layer 70 and second solder-resist layer 170. A fourth
opening portion with an opening diameter of 250 μm is formed on the
upper surface of conductive post 80. The diameter of conductive post 80
is set at 280 μm. The diameter of second opening portion 73 in first
solder-resist layer 70 is set at 340 μm. The diameter of second pad
159 is set at 370 μm. The peripheral area of second pad 159 is covered
by first solder-resist layer 70 for a distance of 30 μm from the
outermost periphery toward the center, and second pad 159 is further
covered by second solder-resist layer 170 at the bottom of the second
opening portion. The diameter of first opening portion 71 is set at 80
μm.

[0031] The clearance between conductive post 80 and second opening portion
73 is set at 30 μm. Namely, second opening portion 73 is formed in
first solder-resist layer 70 along the periphery of conductive post 80
for a distance of 30 μm from the periphery of conductive post 80 to an
inner wall of second opening portion 73, and second solder-resist layer
170 on first solder-resist layer 70 is filled between the inner wall of
the second opening portion and the conductive post. In setting so,
conductive post 80 does not contact the connecting boundary of first
solder-resist layer 70 and second solder-resist layer 170, which is
thought to become a likely origination point for peeling. Accordingly,
because of the anchoring effect of the second solder-resist layer,
peeling seldom occurs at the connecting surface where the second
solder-resist layer is formed on the first solder-resist layer, and
reliability is enhanced.

[0032] In addition, while second pad 159 is in contact with first
solder-resist layer 70, it is also in contact with second solder-resist
layer 170 through second opening portion 73 of first solder-resist layer
70. Second pad 159 is hardly removed from interlayer insulation layer 150
because it is covered by two solder-resist layers, and thus its
reliability is enhanced.

[0033] The opening diameter of fourth opening portion 171 is set at 250
μm in the first example. Since the diameter of conductive post 80 is
set at 280 μm, the peripheral area of the surface of conductive post
80 is covered by the second solder-resist layer for 15 μm from the
outermost periphery toward the center (FIG. 14(B)). In such a case,
adhesiveness is enhanced between conductive post 80 and the second
solder-resist layer at the contact area of conductive post 80 and second
bump (76S), which is largely affected by stress. After conductive post 80
is formed, the entire surface is covered by second solder-resist layer
170, and fourth opening portion 171 is formed through exposure and
development. Accordingly, the opening diameter of fourth opening portion
171 is made smaller than the diameter of the conductive post. Therefore,
adhesiveness with second bump (76S) is secured against thermal stress and
its reliability is enhanced.

[0034] However, the above first example is not the only option. The
opening diameter of fourth opening portion 171 may be set greater than
the diameter of conductive post 80. In such a case, in addition to its
upper surface, part of a side surface of conductive post 80 is also
exposed (FIG. 15). When second bump (76S) is formed in fourth opening
portion 171, second bump (76S) makes contact with part of the side
surface of conductive post 80 in addition to its upper surface.
Accordingly, adhesiveness is enhanced between conductive post 80 and
second bump (76S), which are largely affected by stress.

[0035] In the package-substrate-mounting printed wiring board of the first
example, since the same resin is used for first solder-resist layer 70
and second solder-resist layer 170, the thermal expansion coefficient of
the first solder-resist layer is the same as that of the second
solder-resist layer; thus, peeling seldom occurs during heat cycles. In
addition, lower cost is achieved by using the same resin.

[0036] When second solder-resist layer 170 is laminated on first
solder-resist layer 70 in the method for manufacturing a
package-substrate-mounting printed wiring board according to the first
example, first solder-resist layer 70 is not thermally cured after first
opening portion 71 and second opening portion 73 are formed. Namely,
second solder-resist layer 170 is laminated on uncured first
solder-resist layer 70. Third opening portion (170A) and fourth opening
portion 171 are formed in second solder-resist layer 170 after it is
laminated on uncured first solder-resist layer 70. After third opening
portion (170A) and fourth opening portion 171 are formed, first
solder-resist layer 70 and second solder-resist layer 170 are thermally
cured simultaneously. Since the surface of uncured first solder-resist
layer 70 is highly adhesive, second solder-resist layer 170 is securely
adhered. Moreover, by thermally curing first solder-resist layer 70 and
second solder-resist layer 170 at the same time, thermal damage to the
printed wiring board is reduced, while productivity is enhanced since the
curing process is conducted in one step.

[0037] In package-substrate-mounting printed wiring board 10 of the first
example, package substrate 94 is mounted on package-substrate-mounting
printed wiring board 10 through conductive post 80, which is formed on
outermost second pad 159 positioned along the periphery on the
first-surface side, and through second bump (76S) on conductive post 80.
Accordingly, clearance is set by tall conductive post 80 without
depending only on a solder bump to set the clearance. Accordingly,
package-substrate-mounting printed wiring board 10 and package substrate
94 are connected by small-diameter second bump (76S), while clearance is
secured between IC chip 90 and package substrate 94 to be mounted on
package substrate 10. Since connection is obtained through small-diameter
second bump (76S), the pitch of terminal 96 is set narrow, and
high-density package substrate 94 is achieved.

[0038] By referring to FIGS. 1-11, the following describes a method for
manufacturing package-substrate-mounting printed wiring board 10
described above with reference to FIG. 12.

[0039] (1) The starting material is copper-clad laminate (30A), which is
formed by laminating 5˜35 μm-thick copper foil 32 on both
surfaces of insulative substrate 30 made of glass epoxy resin or BT
(bismaleimide triazine) resin with a thickness of 0.2˜0.8 mm (FIG.
1(A)).

[0040] (2) First, a laser is used to form penetrating hole 33 for a
through hole in copper-clad laminate (30A), and plated film 31 is formed
through electroless plating (FIG. 1(B)).

[0041] (3) Plating resist 28 with a predetermined pattern is formed (FIG.
1(C)).

[0042] (4) Electrolytic plating is performed to form electrolytic plated
film 35 on portions where plating resist 28 is not formed, and
electrolytic plating is filled in penetrating hole 33 for a through hole
(FIG. 1(D)).

[0043] (5) The plating resist is removed, and plated film 31 and copper
foil 32 under the plating resist are etched away to form conductive
circuits 34 on both surfaces of the substrate, through-hole conductor 36
in penetrating hole 33 for a through hole, and roughened layer (35β)
(FIG. 1(E)).

[0044] (6) A layer of resin filler 39 is formed on the substrate where
conductive circuits are not formed, and conductive layers 34 are polished
(FIG. 2(A)).

[0045] (7) After washing with water and acid degreasing are conducted, the
substrate is soft etched and an etching solution is sprayed on both
surfaces of the substrate. Accordingly, surfaces of conductive circuits
34 and land surfaces of through-hole conductor 36 are etched to form
roughened surface (34β) on the entire surface of the conductive
circuits (FIG. 2(B)).

[0046] (8) After the above procedure, 50 μm-thick resin film for
interlayer insulation layers with a size slightly greater than the core
substrate is vacuum pressed to be laminated on both surfaces of core
substrate 30, while temperatures are increased from 50 to 150° C.

[0048] (9) Next, a CO2 gas laser is used to form via opening portions 51
with an opening diameter of 80 μm in interlayer resin insulation
layers 50 (FIG. 2(D)).

[0049] (10) Next, the substrate is immersed in an oxidizing agent such as
chromic acid or permanganate to form roughened surface (50β) on
interlayer insulation layers 50 (FIG. 3(A)).

[0050] (11) A catalyst such as palladium is attached on surface layers of
interlayer insulation layers 50, and the substrate is immersed in an
electroless plating solution for 5˜60 minutes to form electroless
plated film 52 with a thickness of 0.1˜5 μm (FIG. 3(B)).

[0051] (12) After the above process, a commercially available
photosensitive dry film is laminated on substrate 30, exposed to light
with a photomask placed thereon, and developed with sodium carbonate to
form 15 μm-thick plating resist 54 (FIG. 3(C)).

[0052] (13) Electrolytic plating is performed to form 15 μm-thick
electrolytic plated film 56 (FIG. 4(A)).

[0053] (14) After plating resist 54 is removed by 5% NaOH, electroless
plated film 52 under the plating resist is dissolved and removed by
etching using a mixed solution of nitric acid, sulfuric acid and hydrogen
peroxide to form 15 μm-thick conductive circuit 58 and via conductor
60 made of electroless plated film 52 and electrolytic plated film 56
(FIG. 4(B)). Using an etching solution containing copper (II) complex and
organic acid, roughened surface (58β) is formed on surfaces of
conductive circuit 58 and via conductor 60 (FIG. 4(C)).

[0054] (15) The same as (8) and (9) above, upper interlayer insulation
layers 150 with opening portions 151 are formed (FIG. 4(D)), and
electroless plated film 152 to become electrolytic plating seed is formed
on interlayer insulation layers 150 the same as (11) above (FIG. 5(A)).
Plating resist 154 with a predetermined pattern is formed the same as
(12) above (FIG. 5(B)), and electrolytic plated film 156 is formed the
same as (13) above (FIG. 5C)).

[0055] (16) Plating resist 154 is removed the same as (14) above to form
15 μm-thick first pad 158, second pad 159 and via conductor 160 made
of electroless plated film 152 and electrolytic plated film 156 (FIG.
6(A)). The diameter of second pad 159 is set at 370 μm. Here, to form
later-described conductive post 80, electroless plated film 152 is not
removed.

[0056] (17) Plating resist is applied on the substrate surfaces, and is
exposed and developed to form plating resist 254 having opening (254a)
corresponding to a conductive post described above with reference to FIG.
12 (FIG. 6(B)). Opening (254a) is formed on second pad 159 so that the
center of opening portion (254a) aligns with the center of second pad
159.

[0057] (18) Current is flowed through electroless plated film 152 as a
shield layer to fill electrolytic plating 157 in opening portion (254a)
on second pad 159 (FIG. 6(C)).

[0058] (19) After plating resist 254 is removed, electroless plated film
152 under the plating resist is etched away so that conductive post 80 is
formed on second pad 159 (FIG. 7A)). Using an etching solution containing
copper (II) complex and organic acid, roughened surface (80β) is
formed on surfaces of conductive post 80, first pad 158, second pad 159
and via conductor 160 (FIG. 7(B)). The diameter of conductive post 80 is
set at 280 μm, and conductive post 80 is formed in such a way that the
center of the diameter of conductive post 80 aligns with the center of
the diameter of second pad 159.

[0059] (20) Then, after the above process, 35 μm-thick first
solder-resist layer 70 is laminated on the substrate surfaces. At that
time, first solder-resist layer 70 is laminated so that the entire
surface of the first and second pads and part of conductive post 80 are
exposed (FIG. 14(A)). Through exposure and development, first opening
portion 71 with a diameter of 80 μm is formed, and simultaneously,
second opening portion 73 with a diameter of 340 μm is formed to
surround conductive post 80 so that a clearance of 30 μm is formed
along the periphery of conductive post 80 (FIG. 8(A)). The center of the
diameter of second opening portion 73 is set to align with the center of
second pad 159. Upper and side surfaces of conductive post 80 are exposed
through second opening portion 73. At that time, first solder-resist
layer 70 is uncured.

[0060] (21) On uncured first solder-resist layer 70, 20 μm-thick second
solder-resist layer 170 is laminated (FIG. 8(B)). During that time, part
of second solder-resist layer 170 is filled between an inner wall of
second opening portion 73 and conductive post 80. At that time,
conductive post 80 does not contact a connecting boundary of first
solder-resist layer 70 and second solder-resist layer 170, which is
thought to be a likely origination point for peeling. Accordingly,
peeling seldom occurs at the connecting surface where the second
solder-resist layer is formed on the first solder-resist layer due to the
anchoring effect of the second solder-resist layer. Therefore,
reliability is enhanced. In addition, second pad 159 is in contact with
first solder-resist layer 70, while being in contact with second
solder-resist layer 170 through second opening portion 73 of first
solder-resist layer 70. By being double covered by solder-resist layers
(70, 171), second pad 159 is seldom removed from interlayer insulation
layer 150, and reliability is enhanced.

[0061] (22) Through exposure and development, second solder-resist layer
170 is formed to have third opening portion (170A) in the central area of
the substrate to expose first opening portion 71 of first solder-resist
layer 70, along with fourth opening portion 171 to expose the upper
surface of conductive post 80 (FIG. 8(C)). The opening diameter of fourth
opening portion 171 is set at 250 μm. Since the diameter of conductive
post 80 is set at 280 μm, the peripheral area of the upper surface of
conductive post 80 is covered by second solder-resist layer 170 for 15
μm from the outermost periphery toward the center. In such a case,
adhesiveness is enhanced between conductive post 80 and the second
solder-resist layer at the contact area between conductive post 80 and
second bump (76S), which is largely affected by stress. In addition, the
above first example is not the only option, and fourth opening portion
171 may have an opening diameter greater than the 280-μm diameter of
conductive post 80. In such a case, not only the upper surface, but part
of a side surface of conductive post 80 is also exposed (see FIG. 15).
When second bump (76S) is formed in fourth opening portion 171, second
bump (76S) makes contact with part of the side surface of conductive post
80 along with its upper surface. Thus, adhesiveness is enhanced between
conductive post 80 and second bump (76S), which are largely affected by
stress.

[0062] (23) First solder-resist layer 70 and second solder-resist layer
170 are thermally cured simultaneously (omitted in the drawings). When
second solder-resist layer 170 is laminated on first solder-resist layer
70, first solder-resist layer 70 is not thermally cured after first
opening portion 71 and second opening portion 73 are formed. Namely,
second solder-resist layer 170 is laminated on uncured first
solder-resist layer 70. Third opening portion (170A) and fourth opening
portion 171 are formed in second solder-resist layer 170 after it is
laminated on uncured first solder-resist layer 70. First solder-resist
layer 70 and second solder-resist layer 170 are thermally cured
simultaneously after third opening portion (170A) and fourth opening
portion 171 are formed. Since the surface of uncured first solder-resist
layer 70 is highly adhesive, it is securely adhered to second
solder-resist layer 170. Furthermore, since first solder-resist layer 70
and second solder-resist layer 170 are thermally cured simultaneously,
thermal damage is reduced in the printed wiring board and productivity is
enhanced because the curing process is done in one step.

[0063] (24) The substrate is immersed in an electroless nickel plating
solution to form 5 μm-thick nickel-plated film in first opening
portion 71 and fourth opening portion 171. Then, the substrate is
immersed in an electroless gold plating solution to form a 0.03
μm-thick gold-plated layer on the nickel-plated layer (FIG. 9(A)).
Instead of nickel-gold layers, nickel-palladium-gold layers may also be
formed.

[0064] (25) After that, solder ball (75U) with a smaller diameter is
loaded in first opening portion 71 using a mask for loading solder balls.
Such a mask for loading solder balls has a concave portion corresponding
to third opening portion (170A) in second solder-resist layer 170, and
there is a hole corresponding to first opening portion 7l at the bottom
of the concave portion. Then, using their respective flat masks for
loading solder balls, solder ball (75S) with a larger diameter is loaded
in fourth opening portion 171, and solder ball (75D) with a medium
diameter is loaded in opening 71 on the second-surface side (bottom
portion) (FIG. 9(B)).

[0065] (26) A reflow is conducted so that a package-substrate-mounting
printed wiring board is manufactured to have first bump (76U) in first
opening portion 71 on the first-surface (upper-surface) side, second bump
(76S) in fourth opening portion 171, and solder bump (76D) in opening 71
on the second-surface (bottom-surface) side (FIG. 9(C), FIG. 11). In the
present example, the diameter of second bump (76S) is greater than that
of first bump (76U).

[0067] In the method for manufacturing a package-substrate-mounting
printed wiring board according to the first example, first solder-resist
layer 70 is formed to have second opening portion 73 along the periphery
of conductive post 80, and second solder-resist layer 170 is filled in
second opening portion 73 while second solder-resist layer 170 is formed
on first solder-resist layer 70. Namely, second opening portion 73 is
formed in first solder-resist layer 70 to surround the periphery of a
conductive post, and second solder-resist layer 170 on the first
solder-resist layer is filled between an inner wall of second opening
portion 73 of the first solder-resist layer and the conductive post.
Thus, due to the anchoring effect in such a portion, peeling seldom
occurs at the connecting surface where the second solder-resist layer is
formed on the first solder-resist layer, and reliability is enhanced.

[0068] When second solder-resist layer 170 is laminated on first
solder-resist layer 70 in the method for manufacturing a
package-substrate-mounting printed wiring board according to the first
example, first solder-resist layer 70 is not thermally cured after first
opening portion 71 and second opening portion 73 are formed. Namely,
second solder-resist layer 170 is laminated on uncured first
solder-resist layer 70. Third opening portion (170A) and fourth opening
portion 171 are formed in second solder-resist layer 170 after it is
laminated on uncured first solder-resist layer 70. First solder-resist
layer 70 and second solder-resist layer 170 are thermally cured
simultaneously after third opening portion (170A) and fourth opening
portion 171 are formed. Since the surface of uncured first solder-resist
layer 70 is highly adhesive, it is securely adhered to second
solder-resist layer 170. Furthermore, since first solder-resist layer 70
and second solder-resist layer 170 are thermally cured simultaneously,
thermal damage is reduced in the printed wiring board, while productivity
is enhanced because the curing process is done in one step.

[0069] In the method for manufacturing a package-substrate-mounting
printed wiring board according to the first example, the same resin is
used for first solder-resist layer 70 and second solder-resist layer 170.
Thus, the thermal expansion coefficient of first solder-resist layer 70
is the same as that of second solder-resist layer 170, and peeling seldom
occurs during heat cycles. Also, low cost is achieved by using the same
resin.

[0070] In the method for manufacturing a package-substrate-mounting
printed wiring board according to the first example, plating resist 254
is formed having opening (254a) which corresponds to the location for
forming conductive post 80 (FIG. 6(B)), electrolytic plating 157 is
filled in opening (254a) of plating resist 254 (FIG. 6(C)), and
conductive post 80 is formed by removing plating resist 254. After that,
first solder-resist layer 70 and second solder-resist layer 170 are
formed. Plating resist 254 for electrolytic plating is removed, and the
first solder-resist layer and the second solder-resist layer are formed
without requiring plating. Therefore, durable and highly reliable resin
material can be selected for the first and second solder-resist layers.
Since conductive post 80 is formed using shield layer 152 for
electrolytic plating (electrolytic plated film), which is used for
forming first pad 158 and second pad 159, another shield layer is not
required for the conductive post. Therefore, a step is omitted while
reliability is enhanced.

[0071] The features of a printed wiring board according to an embodiment
of the present invention are as follows: an interlayer insulation layer;
a first pad group which is arranged on the interlayer insulation layer
and is formed with multiple first pads for mounting a semiconductor
element; a second pad group which is arranged on the interlayer
insulation layer along the periphery of the first pad group and is formed
with multiple second pads; a first solder-resist layer which is formed on
the interlayer insulation layer and has a first opening portion to
partially expose a first pad and a second opening portion to partially
expose a second pad; a conductive post to be formed on a second pad; and
a second solder-resist layer which is formed on the first solder-resist
layer and has a third opening portion to expose the first pad group and a
fourth opening portion to expose the upper surface of the conductive
post. In such a printed wiring board, the diameter of the second opening
portion is set greater than the diameter of the conductive post, and the
second solder-resist layer is filled between an inner wall of the second
opening portion and the conductive post.

[0072] In the printed wiring board described above, since the second
solder-resist layer is filled between an inner wall of a second opening
portion and a conductive post, peeling seldom occurs at a connecting
surface between the first solder-resist layer and the second
solder-resist layer. Thus, connection reliability with the upper
substrate is enhanced.

[0073] Obviously, numerous modifications and variations of the present
invention are possible in light of the above teachings. It is therefore
to be understood that within the scope of the appended claims, the
invention may be practiced otherwise than as specifically described
herein.