CMP Slurries

CMP Slurries

As a pioneer in chemical mechanical planarization (CMP) slurries, Cabot Microelectronics commercialized our original Semi-Sperse™ products in the 1980s for 250nm cmp applications. With continuous improvement of some of these slurries, enhanced versions are still in use and key to our customer solutions today, such as our flagship Semi-Sperse W2000 product for tungsten CMP.

Over the years, we have successfully introduced a number of new CMP slurry platforms to meet our customers’ evolving CMP needs, while reducing overall cost of ownership. For example, our portfolio of iDIEL™ dielectrics slurries utilizes engineered particles and unique chemistries to achieve improved planarity while significantly reducing defectivity.

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