PELCO® Silicon Nitride Support Films for TEM

The PELCO® Silicon Nitride Support Films for TEM
(also called Si3N4
TEM membranes) have been developed as an addition to our extensive range of TEM support films to
further enable nanotechnology applications and extend molecular biology research. These superior
products are made by state-of-the-art semiconductor and patented MEMS fabrication techniques
using resilient, low-stress inorganic and amorphous silicon nitride thin films supported by a sturdy silicon
frame. PELCO® Silicon Nitride Support Films are available
in four window sizes combined with either 8, 15, 35, 50nm, or 200nm thin membrane thickness on
an EM industry standard 3mm diameter round frame, making them the most desirable and useful
silicon nitride support films in the current marketplace.

Silicon Nitride Support Films have the advantages of being chemically and mechanically
robust and can withstand
temperature changes up to 1000°C. They are extremely stable and suitable to conduct
a variety of nanotechnology
experiments with particles or cells mounted directly on the support films.

The PELCO® Silicon Nitride Support Films are indispensable
tools for virtually all fields of nanotechnology research. They enable direct deposition and in
situ observations of dynamic reactions over a wide temperature range. The support film can be
used as a passive support film but can also play a role as an active participant in experiments.

Hydrophobic and Hydrophilic Substrates have been added for nanotechnology and biotechnology
applications.
The ultra-low-stress 15nm, 50nm, and 200nm membranes have been Atomic Layer-Deposited (ALD)
to create these surfaces:
go to Hydrophobic / Hydrophilic support films.

Iron nanoparticles dispersed on a SiN support film and oxidized at 350°C while supported on the PELCO® SiN support
films. The image shows the product of the oxidization process: hollow iron oxide nanoparticles.
Haitao Liu, Dept. of Chemistry, UC Berkeley, California.

PELCO® Silicon Nitride Support Films are manufactured using state-of-the-art
semiconductor and MEMS manufacturing techniques. The amorphous Silicon Nitride Support Film is grown on a silicon wafer to
the desired membrane thickness of 8, 15, 35, 50, or 200nm. The specimen viewing area is created by etching away a
window in the silicon substrate, leaving a perfectly smooth, resilient and chemically robust silicon nitride film.
The frame is manufactured as a 3mm silicon disc with smooth EasyGrip edges for easy manipulation by tweezers
and will fit perfectly in standard TEM holders. Standard thickness of the silicon frame is 200µm which will
fit most TEM holders. A special version with a 50µm thickness and a 0.25 x 0.25mm window is available for
special TEM holders which only accommodate thinner supports. Easy handling capabilities and smoothness of the edges
are design advantages over other brands of silicon nitride support films.
The PELCO® Silicon Nitride Support Films are manufactured like grids and are
completely free from debris particles. The mechanical and chemical stability allow for cleaning of the Silicon
Nitride Support Films with chemicals (solvents, acids and bases), glow discharge and plasma cleaning. It is
recommended that ultrasonic cleaning not be used, as it can easily shatter the PELCO® Silicon Nitride Support Films.

Cell biology: attached cells can be grown in their environment on the support film and subsequently analyzed

Analysis of colloids, aerosols, nanoparticles

Self-assembled mono-layers

Polymer research

Thin film research (directly deposited on the Silicon Nitride Support Film)

Materials science

Properties of nano-structures for semiconductor devices

Semiconductor: characterization of thin films

Catalyst development

a

b

c

(a) (b) Single slice electron tomogram of a single synapse in (a) where
synaptic vesicles and microtubules can be clearly discerned. (c)
Three-dimensional model of the tomographic data in (b) created by
the use of the IMOD suite of programs. Prof. M. Stowell, et. al., MCDB, CU-Boulder, Colorado.

The Silicon Nitride Assortment Pack

with various membrane thicknesses and sizes

The Silicon Nitride Assortment Pack is the ideal way to determine which membrane thickness or size of silicon nitride or silicon dioxide is the optimum product for your application. The assortment pack includes the following thickness and window sizes on 200um thick silicon frames:

Position
In Grid Box

Unit

Membrane Type

1A

1 ea

Si3N4 15nm membrane with 0.25 x 0.25mm window

1B

1 ea

1 ea Si3N4 15nm membrane with 0.25 x 0.25mm window

1C

1 ea

1 ea Si3N4 50nm membrane with 0.25 x 0.25mm window

1D

1 ea

1 ea Si3N4 50nm membrane with 9 ea 0.1 x 0.1mm windows

1E

1 ea

Si3N4 50nm membrane with 0.5 x 0.5mm window

2A

1 ea

Si3N4 50nm membrane with 0.75 x 0.75mm window

2B

1 ea

Si3N4 200nm membrane with 0.25 x 0.25mm window

2C

1 ea

Si3N4 200nm membrane with 0.5 x 0.5mm window

2D

1 ea

SiO2 40nm membrane with 0.5 x 0.5mm window

2E

1 ea

Holey Si3N4 200nm membrane with 2.5µm holes with 0.5 x 0.5mm window

Made in USA

Prod #

Description

Unit

Price

Order / Quote

21597-10

Silicon Nitride Assortment Pack (10 different membranes)

each

$195.00

Qty:

PELCO® Hydrophilic and Hydrophobic Silicon Nitride Membrane Surfaces

15nm, 50nm and 200nm membrane thickness

Silicon Nitride membranes have been modified using Atomic Layer-Deposited (ALD) techniques to change their surface properties. Depending on the process used, both Hydrophilic and Hydrophobic substrates have been created with the following advantages:

Hydrophobic surfaces improve sample preparation for materials that are dissolved or suspended
in organics solvents. Nanoparticles in organic solvents (such as carbon nanotubes) will readily
disperse on the Silicon Nitride membrane surface.
Hydrophilic surfaces enhance wetting and dispersion of aqueous solutions. This avoids particle
aggregation effects commonly observed on less hydrophilic surfaces. Particularly useful in water
based sols and life science applications.

Both coatings are available on 50nm and 200nm PELCO® Silicon Nitride Membranes with a 0.5 x 0.5mm window and 15nm Si3N4 membrane with 9 each 0.1 x 0.1nm windows on a 200µm silicon frame with a diameter of 3mm, compatible with all standard TEM grid holders. Both sides of the membrane and frame are coated. We advise to handle the discs by gripping at the edge.