Collaboration Will Demonstrate New EUV Materials at Resist Materials and Development Center at CNSE's Albany NanoTech

Published on August 31, 2009 at 8:13 AM

SEMATECH, a global
consortium of chipmakers, and Shin-Etsu Chemical Co., Ltd., one of the world's
largest suppliers of semiconductor materials, announced today that Shin-Etsu
has joined SEMATECH's Resist Materials and Development Center (RMDC) at
the College of Nanoscale Science and Engineering's (CNSE) Albany NanoTech
Complex.

As a Resist member of SEMATECH's lithography program, Shin-Etsu will
team with researchers at SEMATECH to develop and demonstrate advanced EUV photoresist
for use at the 22 nm node and beyond.

“Partnering with resist suppliers such as Shin-Etsu will accelerate our
progress in tackling key challenges – such as resolution, line-width roughness,
and pattern collapse – in the critical area of advanced imaging,”
said Bryan Rice, director of Lithography at SEMATECH. “We are pleased
to welcome Shin-Etsu to SEMATECH's RMDC, where it will partner with dozens
of researchers representing universities and companies from around the world
united in advancing resist process development.”

“The cutting-edge research and development that is necessary for the
commercialization of EUVL technology will be further enhanced by the addition
of Shin-Etsu,” said Richard Brilla, CNSE Vice President for Strategy,
Alliances and Consortia. “This new partnership will build on the world-class
capabilities at the UAlbany NanoCollege in support of the advanced technology
needs of our global corporate partners and the nanoelectronics industry.”

The collaboration will be based on SEMATECH's extensive network of hardware
and research expertise, semiconductor experience, and highly respected market
leadership and on Shin-Etsu's proven, industry-leading semiconductor specialty
materials. SEMATECH's RMDC will provide access to two micro-exposure tools
(METs) located at the University at Albany's College of Nanoscale Science
and Engineering and University of California at Berkeley, as well as several
metrology tools.

For several years SEMATECH has maintained a world-class exposure capability
for materials development. The RMDC brings together leading resist and materials
suppliers and a large portfolio of resist research projects employing academic
and industry researchers from around the world. Together, the RMDC provides
the hardware and research expertise to develop EUV resist processes meeting
the stringent resolution, line-width roughness, and sensitivity specifications
needed for continued progress in manufacturing.