STRAIN ENGINEERED MOSFETS PDF

Strain engineering is the main technological booster used by semiconductor companies for the 65 and 45 nm technology nodes to improve the. Overview In the field of microelectronics, the planar Si metal-oxide-semiconductor field-effect transistor (MOSFET) is perhaps the most important invention. This work reviews the current progress in high-mobility strained MOSFETs and covers the latest developments in strain engineering. We focus on the.