Abstract: P1.00324 : Application of Scanning Probe Nanolithography to fabrication and study of large area graphene and Transition Metal Dichalcogenides heterostructures*

Authors:

Rui Dong(Saint Louis University)

Logan Moore(Saint Louis University)

Irma Kuljansihvili(Saint Louis University)

Two-dimensional atomic crystals, such as graphene and layered
transition metal dichalcogenides (TMDCs), have drawn significant attention
because of the unique physical and chemical properties. Recently developed
graphene/TMDCs stacking structures provide an attracting solution to design
and fabricate unique electronic devices and nanostructures. In this study,
we employ the ``direct write'' patterning technique, to fabricate
Graphene/TMDCs heterostructures. TMDCs precursor is utilized as an ``ink'' to
create the arrays of patterns employing multi-pen AFM cantilevers. The
patterned structures of TMDCs precursor on graphene /silicon oxide/silicon
in processed in CVD to produce Graphene/TMDCs heterostructures. Raman
spectroscopy and AFM characterization demonstrates high quality of
as-prepared Graphene/TMDCs nanostructures. Mask free approach significantly
reduces contamination of the grahene surface during patterning and
demonstrates a promising unconventional technology for fabricating high
quality Graphene/TMDCs or other layered nanostructures in a convenient and
economical manner with the nanoscale precision.

*IK acknoledges support from Saint Louis Univeristy's President's Research Fund

To cite this abstract, use the following reference: http://meetings.aps.org/link/BAPS.2015.MAR.P1.324