Aimed at Industry and Acad­emia, Three-​​day Inter­na­tional Event will Explore New Tech­nolo­gies, Chal­lenges and Solu­tions in Sur­face Cleaning

North­eastern Uni­ver­sity is orga­nizing and hosting its 5th Annual Sur­face Cleaning Work­shop to present and dis­cuss cur­rent and future chal­lenges and solu­tions in sur­face cleaning, offering tuto­rials, work­shops and a host of guest speakers.

Orga­nized by North­eastern Uni­ver­sity and Hanyang Uni­ver­sity of Seoul, South Korea, the three-​​day internationally-​​focused event will take place from November 12–14 at North­eastern University’s campus and the Colon­nade Hotel in Boston. The con­fer­ence will include invited and con­tributed pre­sen­ta­tions and panel discussions.

Ahmed A. Bus­naina, Ph.D., William Lin­coln Smith Pro­fessor and Director of the NSF Center for Micro­con­t­a­m­i­na­tion Con­trol and the Nanoman­u­fac­turing Research Insti­tute at North­eastern Uni­ver­sity, will pro­vide the opening remarks during the November 13 work­shop at the Colonnade.

“Sur­face cleaning and prepa­ra­tion is a nec­es­sary and required process that pre­cedes most man­u­fac­turing processes in the man­u­fac­turing of all of con­sumer and com­mer­cial elec­tronics, storage, med­ical and many other appli­ca­tions,” said Bus­naina. “Without sur­face cleaning, these prod­ucts’ yield will be low and most of today’s elec­tronics could be very expensive.”

An all-​​day tuto­rial on the fun­da­men­tals of sur­face cleaning with an emphasis on Post-​​CMP cleaning is tai­lored to meet the needs of engi­neers, chemists, man­agers, con­sul­tants, cer­ti­fying per­sonnel and other pro­fes­sionals involved with sur­face cleaning, prepa­ra­tion or engi­neering, par­ticle removal and con­t­a­m­i­na­tion con­trol respon­si­bility in the semi­con­ductor, flat panel dis­play, disk drive and other indus­tries involved in clean manufacturing.

Aimed at giving end-​​users, researchers and sup­pliers, the two-​​day work­shop will pro­vide a forum to dis­cuss new tech­nolo­gies, solu­tions and lim­i­ta­tions in meeting sur­face cleaning needs. Topics that will be dis­cussed and pre­sented at the work­shop include the chal­lenges in fil­tra­tion for Post CMP cleaning chemistries, par­ticle adhe­sion to pho­tomask sub­strates, fun­da­men­tals and wet and dry cleaning, enhanced cleaning chem­istry for par­ticle removal and damage-​​free cleans, new advances in EUV mask blank cleaning and the effects of plasma damage on low-​​k film sur­face prop­er­ties and mois­ture adsorption.

For more infor­ma­tion, please con­tact Renata Nyul at 617–373-7424 or r.​nyul@​neu.​edu and visit http://​www​.cmc​.neu​.edu/​m​e​e​t​i​n​g​s​_​e​v​e​n​t​s​/​5​t​h​_​s​u​r​f​a​c​e​_​c​l​e​a​n​i​ng/

About North­eastern

Founded in 1898, North­eastern Uni­ver­sity is a pri­vate research uni­ver­sity located in the heart of Boston. North­eastern is a leader in inter­dis­ci­pli­nary research, urban engage­ment, and the inte­gra­tion of class­room learning with real-​​world expe­ri­ence. The university’s dis­tinc­tive coop­er­a­tive edu­ca­tion pro­gram, where stu­dents alter­nate semes­ters of full-​​time study with semes­ters of paid work in fields rel­e­vant to their pro­fes­sional inter­ests and major, is one of the largest and most inno­v­a­tive in the world. The Uni­ver­sity offers a com­pre­hen­sive range of under­grad­uate and grad­uate pro­grams leading to degrees through the doc­torate in six under­grad­uate col­leges, eight grad­uate schools, and two part-​​time divi­sions. For more infor­ma­tion, please visit www​.north​eastern​.edu.

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