Description:

This SEM has resolution of 1.0 nm at 15 kV, and 1.7 nm at 1 kV at high vacuum mode (HV); 2nm at 30kV at variable pressure mode (VP). 100V to 30kV represents the wide range of the accelerating voltage used on the machine with capability of imaging insulating samples at the lower end of the spectrum. Electromagnetic beam and aperature alignment enables rapid changing between the six beam defining apertures. The GEMINI column employs a Schottky field emittor electron source using a single condenser with a crossover-free beam path. The machine is equiped with a Everhardt Thornley secondary electron (SE) detector, a variable pressure secondary electron (VPSE) detector for use at variable pressure mode with real time automatic contrast/brightness and manual override, a backscatter detector as well as a through the lens SE detector.

Capabilities:

1.7nm resolution at 1kV

1nm resolution at 15kV

Variable pressure mode for non-conducting materials

Low energy ebeam lithography with the connected Nabity system

Additional Resources:

Results:

This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.