You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

Abstract

Using a site services development spray monitor (DSM 100) and a post processing algorithm, the in-situ measured development rates of photoresist were obtained. The interference signals for eight different wavelengths were simultaneously monitored on a patterned wafer as it spun on the development module of a wafer track. Since the interference signal is generated from a circularly polarized light source, the DSM 100 has demonstrated robustness to the red cloud effect, developer spray, bubbles in the developer, and ambient light. After collecting the eight interference curves, these post processing algorithms used the Marquardt Levenberg non- linear regression algorithm and a linear regression approach to find the development rate as a function of development time. The first approach generated the better curve. A plot of development rate versus depth was generated via numerical integration of the plot of development rate versus time. This technique is equally well suited for other types of exposure and resist chemistries.

Keywords/Phrases

Keywords

in

Remove

in

Remove

in

Remove

+ Add another field

Search In:

Proceedings

Volume

Journals +

Volume

Issue

Page

Journal of Applied Remote SensingJournal of Astronomical Telescopes Instruments and SystemsJournal of Biomedical OpticsJournal of Electronic ImagingJournal of Medical ImagingJournal of Micro/Nanolithography, MEMS, and MOEMSJournal of NanophotonicsJournal of Photonics for EnergyNeurophotonicsOptical EngineeringSPIE Reviews