Blue Wave Physical Vapor Deposition Systems

Blue Wave believes that placing a strategic focus on semiconductor fabrication equipment and device technologies will produce benefits that will enhance a development team’s ability to create the future of thin film technologies. Their knowledge, gained through the entire process, equipment design and device fabrication allows them to remain at the forefront of thin film deposition and nano-technologies. Blue Wave develops low cost, reliable and customized thin film fabrication tools for the R&D market so that researchers can continue advances in nanotechnology and thin film research.

Please inquire if you do not see the deposition system you are interested in below, as Blue Wave manufactures many custom systems and can probably provide the specific deposition system you are interested in.

Thermal Evaporation
PVD System

Pulsed Laser Deposition
(PLD) System

Electron Beam
(EBeam) PVD System

Hot Filament Chemical
Vapor Deposition (HFCVD) System

Thermal Evaporation PVD System

Blue Wave's Thermal Evaporation System is one of the simplest of the Physical Vapor Deposition (PVD) tools available in the market. It is a fully customizable state-of-the-art physical vapor deposition system designed for synthesis of high quality metal and oxide thin films. In addition, the system can be used for single layer or multi-layer metal thin films (Al, Au, Pt, Ag, Cu, Ti, Cr, etc.), oxides (MnO3, TiO2, Al2O3), and organic OLEDs and multi-layer thin films.

This Thermal Evaporation System uses a resistive heating technique. In this technique, a pair of water-cooled high current vacuum electrical feedthroughs are used to heat a boat (alumina coated titanium or alumina coated molybdenum) or a coil (tungsten) as the heating element. These boats/coils have a trench or slot for placing the evaporation sources (deposition material in the form of pellets, balls or random pieces) in them. When a significant amount of current is passed through the feedthrough, the evaporation source is melted and evaporated. The rate of deposition depends on the amount of the current passed through (i.e. the higher the current, the higher is the deposition rate and vice versa). This deposition process is recommended to be performed at low pressures where the mean free path is longer than the distance of the substrate from the evaporation source.

Blue Wave has developed this Thermal Evaporation System to offer a variety of in-built and custom features such as:

High vacuum system (available in benchtop and standalone machine)

Ability to hold any shape and size substrate using simple clamp technique

Pulsed Laser Deposition (PLD) System

The Blue Wave PLD System is a fully customizable state-of-the-art physical vapor deposition system designed for the synthesis of high quality thin films and thin film research. This PLD System offers a variety of built-in and custom features such as: optimized 3-target carousel, substrate heater, and pressure adjustment. It is designed for easy integration with a variety of other deposition techniques and sources such as: Sputtering, Thermal Evaporation & CVD, E-beam, and more.

Features

3-target Carousel

Substrate Heating Stage

Mass Flow Controller

Vacuum Pumping

Temperature Controller

Laser & Laser Optics

Specifications

Process Chamber

Customizable 12" diameter spherical stainless steel chamber

Multiple (six 8" and 18" CF and one 6" CF) flange ports for mounting optical windows and other accessories

Semi-1000 Electron Beam (EBeam) PVD System

Blue Wave's Semi-1000 is a high productivity electron beam (E-beam) system for depositions of metal films (Au, Au, Ti, Ni, Cr, Si, Co etc.) and oxide thin films (Al2O3, SiO2, MgO, Y2O3, HfO2 etc.) designed for R&D labs and prototype fabricators. The system handles a single 4" wafer or multiple small substrates (such as 1 cm2, 1 in2, or odd shape samples) with clips. The Semi-1000 is excellent for undergraduate or graduate researchers, Ph.D. students, and Research Scientists working in the field of thin film materials science, surface and interface engineering, thin film devices, sensors and advanced thin film research activities in R&D Universities, National Labs, and industry.

Hot Filament Chemical Vapor Deposition (HFCVD) System

The Blue Wave HFCVD system is a fully-customizable hot filament chemical vapor deposition system designed for synthesis of nano-diamond coatings, CVD diamond films, Micro crystalline CVD diamond coatings, graphene, carbon nanotubes(CNTs), and a variety of other thin film coatings. Designed for an affordable and simplified deposition process, the HFCVD system is used in universities and research labs throughout the USA and internationally, and offers several built-in and custom features necessary to begin deposition of high quality films within hours of installation.