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Compugraphics attended the Micro and Nanofabrication of Next Generation Technologies conference in Oxfordshire in December. The event was hosted by Glasgow University and Kelvin Nanotechnology (KNT) and aimed to highlight the various applications of Nanotechnology.

A number of speakers shared insight into their work with Micro and Nanofabrication and how the technologies are shaping the future for many industries such as: Medicine, Energy, Defense and Security.

Glasgow University has been working with nanotechnology since 1978 and now possesses over 36 years’ experience. Kelvin Nanotechnology Ltd (KNT) is the commercial arm of the University providing nanofabrication solutions to industry and academia delivered through the state of the art James Watt Nanofabrication Centre (JWNC).

KNT specialise in high resolution, large area, lithography for applications such as transistor gate writing, imprint masks, optical elements, photonic crystals, nanotextured surfaces and many more.

Professor Douglas Paul from Glasgow University gave a compelling presentation on the advances in nanotechnology and demonstrated how Glasgow University is able to produce technology down to 5nm. Douglas also touched on gravity gradiometer applications and how the technology can be used for oil and gas prospecting or applied to security at airports to detect malicious material.

Glasgow University is one of the best institutions in the world when it comes to nanofabrication. The university has unique micro & nanoscale capabilities enabling basic science, through applications to small scale manufacture.

Compugraphics has been working with KNT for over 3 years now, the company has a long track record of providing nanofabrication based solutions to industry and academia. The company delivers into and is expanding in global high tech markets for the next generation products.

Leading edge research and design is produced throughout the world using high end E-beam systems and Glasgow University along with KNT are seen as being a pioneer in this technology.

E-beam is an effective technology for one-off or limited production wafers but for large volume production use; photomasks and reduction stepper/scanner are unmatched to achieving the volumes necessary to make production cost affordable.