Product Briefing Outline: Brion Technologies, an ASML
company, has introduced Tachyon Lithography Aware Design (LAD), an
extension of the company's Tachyon suite for optical proximity
correction (OPC) verification and OPC application. Tachyon LAD is
intended to assist designers of advanced ICs in the ability to
accurately assess how circuit designs will print on silicon under
real-world production conditions.

Problem: Tachyon LAD analyzes standard GDSII data and
models how the lithography process will reproduce a design on silicon,
eliminating the need for EDA vendors to develop new software tools or
become experts in the manufacturing process. Tachyon LAD works with
existing manufacturing processes and flows, so there is no need to
calibrate new models to drive the process.

Solution:
Tachyon LAD uses the same production-proven lithography analysis
capability found in Tachyon Lithography Manufacturability Check (LMC),
and the process-calibrated OPC technology found in Tachyon OPC+.
Tachyon LAD is based on existing, proven models, allowing for faster
startup time and reduced overall cost of ownership when compared with
other approaches that require new model development.

Applications: Lithography-driven challenges at the 45nm and 32nm nodes.