*Greetings RAITH Group XXVI:
**
If you are listed in the To: section of this email you are confirmed to
be in RAITH Group** XXIV**.
If you are listed in the CC: section of this email; I still am in need
of further information or a commitment from you, and hope to add you in
the next class. Any RAITH user wishing to attend are also welcome if you
desire a review of operations on the RAITH system.
**
We wish to invite all interested parties to the Tuesday morning lecture
session and demo layer one training following at 2 PM - 6 PM in the
afternoon. All are also welcome to attend as observers the other
'hands-on' sessions through the week.
All Users are encouraged to join any Raith Champion when they are on
the system to gain further exposure to the system.
*
*If you are listed in the To: section of this email:
*This is your first reminder and confirmation of your commitment for
attending the RAITH Group XXIV Training course to be held April 17 - 20,
2007.
The schedule follows along with a listing of Participants whom you will
be working with as a Team. This will be an intensive four day workshop. _
*You are expected to attend all sessions in order to gain the experience
and skills you will need to qualify on the RAITH 150 system.*
_*NOTE:* *_There are prerequisites you must complete before attending
this class:_*
You must have recent relevant SEM and LITHO experience before your can
sit for this class. Please see me directly during my office hour if you
have any questions.
*Please bring examples of your best high resolution SEM work to the
first class.**
If you don't have intermediate SEM operations experience you will be
dropped from this class. *
Users are also encouraged to attend the *"Take a Spin with Me"* class
covering Ebeam Resist handling procedures.
Next class is to be scheduled in the weeks after your RAITH Class. There
is a separate sign up for this class on the white board in my office at
CIS 31.
Thank you for your interest in Electron Beam Technologies at the
Stanford Nanofabrication Facility,
James Conway
Ebeam Technology Group
650-725-7075
---------------------------------
* **RAITH Group** XXVI** Schedule: ** *
*Raith 150 Basic Users Training – Intensive 4 Day Short Course*
*April 17 - 20, 2007 from 10 - 6 PM Tuesday through Friday.*
*The Plan of Action:
*We will start out with a half day of lecture in the morning Tuesday;
quickly moving into entirely 'hands on' operations training through the
remainder of the week.
We will break for lunch at various times, while the system is writing,
so plan to be flexible with your other outside commitments. You should
have started working on your GDS II patterns and preparing PMMA on your
substrates if you wish to write on your material. Please bring your
patterns and materials to the 'Hands-On' sessions. Some afternoons we
may also be able to finish earlier, letting the system write on its own
to the end of our reservations on the system.*
*
* Schedule:*
Tuesday April 17, 2007:
10:00 - 12:30 Session 1: Basic Users Course Lecture -- CIS-X 201
14:00 - 17:00 Session 2: RAITH System Demonstration - Layer One --
EBEAM LAB CIS L104
Wednesday April 18, 2007:
10:00 - 12:30 Session 3: RAITH System Demonstration - Layer Two:
OVERLAY -- EBEAM LAB CIS L104
14:00 - 18:00 Session 4: Hands On training session One -- EBEAM LAB CIS
L104
Thursday April 19, 2007:
10:00 - 12:30 Session 5: Hands On training session Two -- EBEAM LAB CIS L104
14:00 - 18:00 Session 6: Hands On training session Three -- EBEAM LAB
CIS L104
Friday April 20, 2007:
10:00 - 12:30 Session 7: Hands On training session Four -- EBEAM LAB CIS
L104
14:00 - 18:00 Session 8: Hands On training session Five -- EBEAM LAB CIS
L104
Individual Qualification Sessions will be held after this class where-
you can demonstrate your skill on the system to me and gain your login
to the system.
I CAN PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU
HAVE NOT ALREADY RECEIVED ONE YET.
You can stop by my office hour and pick up a copy of these training
materials during my daily office hour. (8:30 - 9:30 AM CIS 31)
-------------------------------------------------------------------------------------------------------------------------------------------
*RAITH Group XXVI Date April 17 –20, 2007
BASIC USER INTENSIVE FOUR DAY SHORT COURSE.*
1. Leili Baghaei Rad leili@stanford.edu <mailto:leili@stanford.edu>
Coral: leili
Pease Group Project: Digital reconstruction of SEM Images.
2. Susan Clark sclark4@stanford.edu <mailto:sclark4@stanford.edu>
Coral: sclark4
Yamamoto Group Project: Mesa and waveguide on Qdot. InAs
3. Kosar Baghbani Parizi kosarb@stanford.edu
<mailto:kosarb@stanford.edu> Coral: kosarb
Nishi Group Project: Bio-FET on SOI.
4. Vanessa Sih vsih@stanford.edu <mailto:vsih@stanford.edu> Coral:
vsih Vuckovic
Group Project: Photonic Crystals in Si.
5. Byoung Il bilee@stanford.edu <mailto:bilee@stanford.edu> Coral: bilee
H.S. Phillip Wong Group Project: Non-Volatile Memory Project.
6. Justin White whitejs@stanford.edu <mailto:whitejs@stanford.edu>
Coral: whitejs
Brongersma Group Project: surface plasmon enhanced detectors.
Observers in this class in preparation for RAITH Group XXVII:
7. Kyeongran Yoo raneeyoo@stanford.edu <mailto:raneeyoo@stanford.edu>
Coral: raneeyoo
Phillip Wong Group, Project: moving channel MEMS Device
8. J. Brian Leen bleen@stanford.edu <mailto:bleen@stanford.edu> Coral:
bleen
Hesselink Group Project: C Apertures for optical confinement.

["multipart/related" not shown]Greetings RAITH Group XXVI:

If you are listed in the To: section of this email you are confirmed to
be in
RAITH Group XXIV.
If you are listed in the CC: section of this email; I still am in need
of further information or a commitment from you, and hope to add you in
the
next class. Any RAITH user wishing to attend are also welcome if you
desire a review of operations on the RAITH system.
We wish to invite all interested parties to the Tuesday morning
lecture
session and
demo layer one training following at 2 PM - 6 PM in the afternoon. All
are also
welcome to attend as observers the other 'hands-on' sessions through
the
week.
All Users are encouraged to join any Raith
Champion when they are on the
system to gain further exposure to the system.

If you are listed in the To: section of this email:This is your first reminder and confirmation of your
commitment for attending the RAITH Group XXIV Training course to be
held April 17 - 20, 2007.
The schedule follows along with a listing of
Participants
whom you will be working with as a Team.
This will be an intensive four day workshop. You are expected to
attend all sessions in order to gain the experience and skills you
will need to qualify on the RAITH 150 system.

NOTE:There are prerequisites you must complete
before
attending this class:
You must have recent relevant SEM and LITHO
experience before your
can sit for this class. Please see me directly during my office hour if
you have any questions.Please bring examples of your best high
resolution
SEM work to the first class.
If you don't have intermediate SEM
operations experience you will be dropped from this class.

Users are also encouraged to attend the "Take
a Spin with Me" class covering Ebeam Resist handling procedures.
Next class is to be scheduled in the weeks after your RAITH Class.
There is a separate sign up for this class on the white
board in my office at CIS 31.

Thank you for your interest in Electron Beam Technologies at the
Stanford Nanofabrication Facility,

The Plan of
Action:We will start out with a half day of lecture in the morning
Tuesday;
quickly moving into
entirely 'hands on' operations training through the remainder of
the week.
We will break for lunch at various times, while the system
is writing, so plan to be flexible with your other outside
commitments. You should have started working on your GDS II patterns
and preparing PMMA on your substrates if you wish to
write on your material. Please bring your patterns and materials to the
'Hands-On' sessions. Some afternoons
we may also be able to finish earlier, letting the system write on its
own to the end of our reservations on the system.

Individual Qualification Sessions will be held
after this
class where- you can demonstrate your skill on the system to me and
gain
your login to the system.

I CAN PROVIDE A CD AND PRINTED MATERIALS AT THE FIRST MEETING, IF YOU
HAVE NOT ALREADY RECEIVED ONE YET.
You can stop by my office hour and pick up a copy of these training
materials during my daily office hour. (8:30 - 9:30 AM CIS 31)