The paper appears to be a process and device development report with statistics on process variations and various optimizations of the device parameters. The conclusion is: "Novel GOS lock-in pixel is investigated at 940nm and 1550nm wavelengths and shown to be a strong contender against conventional Si lock-in pixel. The measured statistical data further demonstrate the technology yields good within wafer and wafer-to-wafer uniformities that may be ready for mass production in the near future."