You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

Abstract

Modern optical applications have special demands on the lithographic fabrication technologies. This relates to the lateral shape of the structures as well as to their three dimensional surface profile. On the other hand optical nano-structures are often periodic which allows for the use of dedicated lithographic exposure principles. The paper briefly reviews actual developments in the field of optical nano-structure generation. Special emphasis will be given to two technologies: electron-beam lithography based on a flexible cell-projection method and the actual developments in diffractive mask aligner lithography. Both offer a cost effective fabrication alternative for high resolution structures or three-dimensional optical surface profiles.

Keywords/Phrases

Keywords

in

Remove

in

Remove

in

Remove

+ Add another field

Search In:

Proceedings

Volume

Journals +

Volume

Issue

Page

Journal of Applied Remote SensingJournal of Astronomical Telescopes Instruments and SystemsJournal of Biomedical OpticsJournal of Electronic ImagingJournal of Medical ImagingJournal of Micro/Nanolithography, MEMS, and MOEMSJournal of NanophotonicsJournal of Photonics for EnergyNeurophotonicsOptical EngineeringSPIE Reviews