In order to observe the phenomena of plasma charges around microcavities, I came up with the appropriate design and made microcavity plasma devices using glass materials. The devices are built by etching to make two 210~250 μm spherical holes in each of the two glass substrates and putting them together, so the holes touch each other and create two circular cavities from a side view. I varied the distance between the two cavities from 80 μm to 1.6 mm to observe their different behaviors when plasma was generated. I generated plasma inside the cavities by flowing Neon gas in between the dielectric glass barriers and applying the voltage/electric field between the plates. Then, ionization occurred and during the process, electron clouds or plasma were generated. At the cavities, because the electric fields were stronger and, due to the thinner dielectric layer (closer to the conducting plates), more ionization occurred, and the increased plasma was relatively more intense. The fabrication process of the devices includes stamping, etching, making measurements with a microscope, aligning, and bonding. These steps need to be done precisely to meet the required specifications before testing the devices. The devices with different distances between the cavities (80 μm and 1.6 mm) were tested and observed with an ICCD camera. The photos were analyzed using Matlab to compare size, intensity, and distance between charge carriers around the cavities of the two devices.