Layerava® Plasma Enhanced ALD

Layerava® Plasma Enhanced ALD

Layerava® utilizes a large area high density hollow cathode source and a compact reactor design. Hollow cathode plasma sources are widely used by the ALD research community as replacements for inductively coupled plasma (ICP) sources because there is less oxygen contamination when depositing non-oxide materials. However, there may be far more important advantages for the industry moving forward. An extremely high radical flux, to the point where the ion signal (ion densities are similar to ICP sources) is swamped by the signal of radicals during optical emission spectroscopy measurements, and relatively low plasma damage. Below is a useful table showing some results demonstrating the advantage of breaking away from the old ICP plasma delivery paradigm.

Layerava® can be configured to be used with Ammonia, Argon, Chlorine, Hydrogen, Nitrous Oxide, Oxygen, Nitrogen, and other gases too.

Hollow cathode plasma sources have been used with Ammonia, Argon, Chlorine, Hydrogen, Nitrous Oxide, Oxygen, Nitrogen, and other gases too.

We develop custom Atomic Layer Deposition tools and recipes. Our team has decades of experience in ALD science and technology with over 300 scientific journal and conference articles in the ALD area Read More