We demonstrate a novel approach to femtosecond microfabrication of transparent dielectrics, which employs nondiffracting Bessel beams instead of the conventionally used Gaussian beams. The main advantage of Bessel beams is the possibility of recording linear photomodified tracks, extending along the lines of nondiffractive beam propagation without sample translation, as would be required for Gaussian beams. Recording of patterns with an aspect ratio of up to 10(2)-10(3) in vitreous silica using amplified femtosecond Ti:saphire laser pulses is demonstrated.