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COATING, ARTICLE COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE

Abstract

A coating includes a nano-composite layer including a plurality of films.
The films are stacked together one after another. Each film includes a
zirconium-copper carbonitride layer and a zirconium carbonitride layer.

1. A coating, comprising: a deposited layer, wherein the deposited layer
is a zirconium-copper carbonitride layer.

2. The coating as claimed in claim 1, wherein the deposited layer has a
thickness ranging from about 0.5 micrometer to about 3 micrometer.

3. The coating as claimed in claim 1, wherein the coating further
comprises a color layer formed on the deposited layer.

4. An article, comprising: a substrate; a bonding layer deposited on the
substrate; and a deposited layer, wherein the deposited layer is a
zirconium-copper carbonitride layer.

5. The article as claimed in claim 4, wherein the deposited layer has a
thickness ranging from about 0.5 micrometer to about 3 micrometer.

6. The article as claimed in claim 4, wherein the coating further
comprises a color layer covering on the deposited layer.

7. The article as claimed in claim 4, wherein the substrate is made of
high speed steel, hard alloy, or stainless steel.

8. The article as claimed in claim 4, wherein the bonding layer is a
zirconium copper layer, the bonding layer has a thickness ranging from
about 0.05 micrometer to about 0.2 micrometer

9. The article as claimed in claim 4, wherein the chemical stability of
the bonding layer is between the chemical stability of the substrate and
the chemical stability of the coating, and the coefficient of thermal
expansion of the bonding layer is between the coefficient of thermal
expansion of the substrate and the coefficient of thermal expansion of
the coating.

10. A method for manufacturing an article comprising steps of: providing
a substrate, wherein the substrate is made of high speed steel, hard
alloy, or stainless steel; depositing a bonding layer on the substrate by
magnetron sputtering, wherein the bonding layer is a zirconium copper
layer; and depositing a deposited layer on the bonding layer, wherein the
deposited layer is a zirconium-copper carbonitride layer.

11. The method of claim 10, wherein during depositing a bonding layer on
the substrate, the substrate is retained in a vacuum chamber 60 of a
magnetron sputtering coating machine 100; argon is floated into the
vacuum chamber 60 at a flux from about 100 sccm to 300 sccm; a bias
voltage applied to the substrate is in a range about -100 to -300 volts
for about 20 to 60 min, to deposit the bonding layer on the substrate.

12. The method of claim 10, wherein the zirconium copper layer contains
zirconium in a range about 20 to about 80 wt %.

13. The method of claim 10, wherein during depositing a deposited layer
on the bonding layer, the temperature in the vacuum chamber 60 is
adjusted to 100-200.degree. C.; nitrogen is floated into the vacuum
chamber 60 at a flux from about 10 sccm to about 100 sccm and an
acetylene gas is floated into the vacuum chamber 60 at a flux from about
10 sccm to about 100 sccm; a zirconium copper alloy target is evaporated
in a power from 7 kw to 11 kw for a time from 90 min to 200 min, to
deposit the deposited layer on the bonding layer.

14. The method of claim 10, further including a step of pretreating the
substrate between providing a substrate and depositing a bonding layer on
the substrate, the step of pretreating the substrate includes a first
step which the substrate is washed with a solution in an ultrasonic
cleaner.

15. The method of claim 14, wherein the step of pretreating the substrate
further includes a second step which the substrate is dried.

16. The method of claim 15, wherein the step of pretreating the substrate
further includes a third step which the substrate is retained on a
rotating bracket 50 in a vacuum chamber 60 of a magnetron sputtering
coating machine 100; the vacuum level of the vacuum chamber 60 is
adjusted to 8.0.times.10-3 Pa, pure argon is floated into the vacuum
chamber 60 at a flux of about 300 sccm to 600 sccm, and a bias voltage is
applied to the substrate in a range about -300 to -800 volts for about
2-8 minutes, so the substrate is washed by argon plasma.

Description

[0001] The present application is related to co-pending U.S. patent
application (Attorney Docket No. US34915), entitled "COATING, ARTICLE
COATED WITH COATING, AND METHOD FOR MANUFACTURING ARTICLE", by Zhang et
al. This application has the same assignee as the present application and
has been concurrently filed herewith. The above-identified applications
are incorporated herein by reference.

BACKGROUND

[0002] 1. Technical Field

[0003] The exemplary disclosure generally relates to coatings, and
particularly relates to articles coated with the coatings and a method
for manufacturing the articles.

[0004] 2. Description of Related Art

[0005] Physical vapor deposition (PVD) has conventionally been used to
form a coating on metal bases of cutting tools or molds. Materials used
as this coating material are required to have good durability. At
present, Zirconium carbonitride (ZrCN) is used as a material satisfying
these requirements. However, ZrCN poorly adheres to metal properties and
may easily peel off.

[0006] Therefore, there is room for improvement within the art.

BRIEF DESCRIPTION OF THE DRAWINGS

[0007] Many aspects of the embodiments can be better understood with
reference to the following drawings. The components in the drawings are
not necessarily drawn to scale, the emphasis instead being placed upon
clearly illustrating the principles of the exemplary coating, article
coated with the coating and method for manufacturing the article.
Moreover, in the drawings like reference numerals designate corresponding
parts throughout the several views. Wherever possible, the same reference
numbers are used throughout the drawings to refer to the same or like
elements of an embodiment.

[0008] FIG. 1 is a cross-sectional view of an exemplary embodiment of a
coating.

[0009] FIG. 2 is a cross-sectional view of an article coated with the
coating in FIG. 1.

[0010] FIG. 3 is a block diagram showing the steps of an exemplary method
for manufacturing the article in FIG. 2.

[0011] FIG. 4 is a schematic view of a magnetron sputtering coating
machine for manufacturing the article in FIG. 2.

DETAILED DESCRIPTION

[0012] A coating 30 includes a deposited layer 31. The deposited layer 31
is a zirconium-copper carbonitride (ZrCuCN) layer. The deposited layer 31
may be deposited by magnetron sputtering or cathodic arc deposition.

[0013] The deposited layer 31 has a thickness ranging from about 1
micrometers to about 3 micrometers. In this exemplary embodiment, the
thickness of the deposited layer 31 is 2 micrometers. It is to be
understood that the coating may include a color layer 33 covering on the
deposited layer 31, to decorate the appearance of the coating 30.

[0014] Referring to FIG. 2, an exemplary article 40 includes a substrate
10, a bonding layer 20 deposited on the substrate 10 and the coating 30
deposited on the bonding layer 20. The substrate 10 is made of metal,
such as high speed steel, hard alloy, or stainless steel. The article 40
may be cutting tools, mold, or housings of electronic devices. The
bonding layer 20 is a zirconium copper (ZrCu) layer. The bonding layer 20
has a thickness ranging from about 0.05 micrometer to about 0.2
micrometer. The bonding layer 20 can be deposited by magnetron sputtering
or cathodic arc deposition. The chemical stability of the bonding layer
20 is between the chemical stability of the substrate 10 and the chemical
stability of the coating 30, and the coefficient of thermal expansion of
the bonding layer 20 is between the coefficient of thermal expansion of
the substrate 10 and the coefficient of thermal expansion of the coating
30. Thus, the bonding layer 20 is used to improve binding between the
substrate 10 and the coating 30 so that the coating 30 can be firmly
deposited on the substrate 10.

[0015] Referring to FIG. 3, a method for manufacturing the article 40 may
include at least the following steps.

[0016] A substrate 10 is provided. The substrate 10 may be made of high
speed steel, hard alloy, or stainless steel.

[0017] The substrate 10 is pretreated. Firstly, the substrate 10 is washed
with a solution (e.g., Alcohol or Acetone) in an ultrasonic cleaner, to
remove, e.g., grease, dirt, and/or impurities. Secondly, the substrate 10
is dried. Thirdly, the substrate 10 is cleaned by argon plasma cleaning.
The substrate 10 is retained on a rotating bracket 50 in a vacuum chamber
60 of a magnetron sputtering coating machine 100. The vacuum level of the
vacuum chamber 60 is adjusted to 8.0.times.10-3 Pa. Pure argon is floated
into the vacuum chamber 60 at a flux of about 300 sccm (Standard Cubic
Centimeters per Minute) to 600 sccm from a gas inlet 90, and a bias
voltage is applied to the substrate 10 in a range about -300 to -800
volts for about 3-10 minutes. So the substrate 10 is washed by argon
plasma, to further remove the grease or dirt. Thus, the binding force
between the substrate 10 and the bonding layer 20 is enhanced.

[0018] A bonding layer 20 is deposited on the substrate 10. The argon is
floated into the vacuum chamber 60 at a flux from about 100 sccm to 300
sccm from the gas inlet 90, preferably is about 150 sccm; a zirconium
copper alloy target 70 is evaporated; a bias voltage applied to the
substrate 10 may be in a range about -100 to -300 volts for about 5 to 20
min (preferably is 10 min), to deposit the bonding layer 20 on the
substrate 10. The zirconium copper alloy contains zirconium in a range
about 30 to about 70 wt %.

[0019] A deposited layer 31 is deposited on the bonding layer 20. The
temperature in the vacuum chamber 60 is adjusted to 100.about.200.degree.
C. Nitrogen is floated into the vacuum chamber 60 at a flux from about 10
sccm to about 100 sccm and acetylene gas is floated into the vacuum
chamber 60 at a flux from about 10 sccm to about 100 sccm from the gas
inlet 90; the zirconium copper alloy target 70 is continuously evaporated
in a power from 7 kw to 11 kw for a time from 30 min to 180 min
(preferably is 60 min), to deposit the deposited layer 31 on the bonding
layer 20. During depositing the deposited layer 31, atomic copper and
atomic zirconium can not react to solid solution phase, and atomic copper
is not easily to react with atomic nitrogen, so atomic nitrogen has a
priority of reaction with atomic zirconium to form zirconium-nitrogen
crystal. Additionally, atomic copper is independently from copper phase
at the boundary of the zirconium-nitrogen crystal, which can prevent the
zirconium-nitrogen crystal from enlarging, to maintain the
zirconium-nitrogen crystal in nanometer level. The nanometer lever
zirconium-nitrogen can improve hardness and toughness of the coating 30.

[0020] It is to be understood that the color layer 33 may be deposited on
the deposited layer 31 to improve the appearance of the article 40.

[0021] It is to be understood, however, that even through numerous
characteristics and advantages of the exemplary disclosure have been set
forth in the foregoing description, together with details of the system
and function of the disclosure, the disclosure is illustrative only, and
changes may be made in detail, especially in matters of shape, size, and
arrangement of parts within the principles of the disclosure to the full
extent indicated by the broad general meaning of the terms in which the
appended claims are expressed.