Conference Proceedings

Extreme UV Lightsource for Nanoscale Lithography

K. RitalaUniversity of Washington, US

Keywords:EUV lithography, Z-pinch, nanoscale fabrication

Abstract:Researchers at the University of Washington have developed a novel technique to produce a stable, high power gas discharge plasma serve as a 13.5 nm light source for extreme ultraviolet (EUV) lithography.

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