An electrostatic chuck device which is provided with: a stage that has a stage surface on which a plate-like sample is placed; an annular focus ring; and a cooling means that cools the focus ring. The stage has a holding part which is provided so as to surround the stage surface; and the holding part is provided with an annular groove that surrounds the stage surface and a through hole that opens to the bottom surface of the groove. A cylindrical insulator is inserted into the through hole. The upper surface of the holding part on both sides of the groove in the width direction serves as a holding surface that is in contact with the focus ring and holds the focus ring; and the holding surface satisfies the conditions (i)-(iii) described below.
(i) The holding surface has a surface roughness of 0.05 μm or less.
(ii) The holding surface has a flatness of 20 μm or less.
(iii) The holding surface does not have a recess which extends in the direction that is perpendicular to the holding surface, and which has a depth of 1.0 μm or more.