Hey all,
A friend from Caltech told me that they use SU-8 on their modified SEM to
write e-beam patterns as negative resist.
Their recipe use a rather thick SU-8 resist (1200-1800 nm thick) with
standard SU-8 developing afterwards. Their resolution is probably only 50
nm at these thickness values.
Does anyone use SU-8 here on the Raith?
Can someone give me some details about resist type and thickness,
resolution you get and some details about processing and dose to clear..
Many thanks,
Ofer
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Ofer Levi, Ph.D.
Department of Electrical Engineering, Stanford University
CIS-X Rm 310, Stanford, CA 94305-4075
Phone: (650)725-6907 or 723-0464
Fax: (650)723-4659
Adm. Asst.: Gail Chun-Creech Ph: (650)723-0983
E-Mail: levi at snow.stanford.edu
Web page: http://snow.stanford.edu/~levi/
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