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Method of Patterning Using Unconventional Shadow Masks

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method of patterning a variety of materials, such as gold, chromium, nickel, etc., using unconventional shadow masks. Benefits include simplifying the patterning process and reducing process costs.

Country

United States

Language

English (United States)

This text was extracted from a Microsoft Word document.

At least one non-text object (such as an image or picture) has been suppressed.

This is the abbreviated version, containing approximately
63% of the total text.

Method of Patterning Using
Unconventional Shadow Masks

Disclosed is a method of patterning a variety of materials,
such as gold, chromium, nickel, etc., using unconventional shadow masks.
Benefits include simplifying the patterning process and reducing process costs.

Background

Currently, patterning is a multi-step, traditional lift-off
process that uses a number of wet chemicals. This process is complex and
costly, and relies on specially made shadow masks.

General Description

The disclosed method is a one-step, dry process; unlike the
current state of the art, the disclosed method uses shadow masks that are
commercially available or easily made in-house. For example, a variety of TEM
grids with different designs and feature sizes are available commercially.
Also, block copolymers and polymer thin films can be used as shadow masks.

The disclosed method’s process is
shown in Fig. 1. The TEM grid(s) are used as shadow masks, and are mounted onto
the substrate of choice (silicon, mica, gold on mica etc.) using Kapton tape or
glue. Additionally or alternatively, polymer or block copolymer thin film is
spun or spotted on the substrate to create different shadow mask patterns. The
material that needs to be patterned is sputtered or evaporated onto the substrate
with the unconventional shadow mask. After sputtering or evaporation, the
shadow mask is removed, leaving the deposited material pattern on the
substrate.