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As devices scale towards atomistic sizes, researches in silicon electronic device technology are investigating alternative structures and materials. As predicted by the International Roadmap for Semiconductors, (ITRS), structures will evolve from planar devices into devices that include 3D features, strong channel confinement, strain engineering, and gate all around placement for better electrostatic control on the channel. Alternative channel materials such as carbon nanotubes (CNT), nanowires …