Job Description

Position Description

We invite you to apply for a Postdoctoral Appointee – in the area of thin film growth by Atomic Layer Deposition (ALD). This position is with our Applied Material Division (AMD), Functional coating/ALD group. Under the mentorship of a supervisor, you will synthesize variety nano-materials/thin films mainly using atomic layer deposition methods.

You will also work on following areas:

Develop ALD processes for novel nanomaterials, analyze, and evaluate these materials using variety of surface sensitive in-situ and ex-situ characterization techniques such as QCM, FTIR, and magnetic measurements. Focus will on efficient coating method for nanoparticles and large wafers

Routinely deliver the samples to the collaboration

Contribute to the preparation of technical reports, papers and presentations that describe the results.

Pursue new ideas and contributes to program development activities within the group.

Position Requirements

Expected candidate will have the following knowledge and skills:

Synthesis of thin film materials using thermal or/and plasma ALD

Carrying out detail in-situ and ex-situ characterization of thin film materials

Exercising independent judgment and defining program objectives and scientific/technical approach

Some skills on the safe handling of hazardous nanomaterials and chemicals

Oral and written communications and presentations in group and meetings

This position requires knowledge and skills is typically achieved through a Ph.D. in chemistry or materials science or equivalent area along with some hands on ALD thin film process and hardware development experience.

As an equal employment opportunity and affirmative action employer, Argonne National Laboratory is committed to a diverse and inclusive workplace that fosters collaborative scientific discovery and innovation. In support of this commitment, Argonne encourages minorities, women, veterans and individuals with disabilities to apply for employment. Argonne considers all qualified applicants for employment without regard to age, ancestry, citizenship status, color, disability, gender, gender identity, genetic information, marital status, national origin, pregnancy, race, religion, sexual orientation, veteran status or any other characteristic protected by law. Argonne employees, and certain guest researchers and contractors, are subject to particular restrictions related to participation in Foreign Government Talent Recruitment Programs, as defined and detailed in United States Department of Energy Order 486.1. You will be asked to disclose any such participation in the application phase for review by Argonne’s Legal Department.

Argonne is an equal opportunity employer, and we value diversity in our workforce. As an equal employment opportunity and affirmative action employer, Argonne National Laboratory is committed to a diverse and inclusive workplace that fosters collaborative scientific discovery and innovation. In support of this commitment, Argonne prohibits discrimination or harassment based on an individual's age, ancestry, citizenship status, color, disability, gender, gender identity, genetic information, marital status, national origin, pregnancy, race, religion, sexual orientation, veteran status or any other characteristic protected by law.

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