Nanotechnology Business News

Next Generation EVO delivers Workflow Automation and High Definition Imaging

(Nanowerk News) At M&M 2013, Indianapolis, ZEISS launched the next generation EVO series for material and life science applications. Customer productivity and imaging performance are dramatically increased by the SEM’s workflow automation, beam deceleration technology and class leading HD BSE detector.

EVO reduces a typical workflow from over 400 steps to just 15. Workflow productivity is improved by automated image settings such as the beam alignment, magnification and focus, allowing the imaging of areas of interest in the shortest possible time. A user-friendly mid-column click-stop aperture changer is introduced for reliable and reproducible results.

The EVO series continues to offer full environmental capabilities, three chamber sizes and class leading X-ray geometry. Visit the ZEISS booth at Microscopy and Microanalysis this week to experience these improvements first-hand.

Source: Carl Zeiss (press release)

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