Advanced process technologies require that more process corners be characterized for each cell to accurately represent the process variation and physical effects on the design. More cell variants are also needed to accommodate different design considerations, such as cells for low power and cells for high speed. These advanced process technology requirements result in increased run time that must be mitigated by high performance SPICE simulation for library characterization.

“TSMC is the technology leader in advanced process technology so clearly Eldo’s role as TSMC’s simulator for 40nm standard cell characterization is an important one,” said Jue-Hsien Chern, vice president and general manager, Deep Submicron Division at Mentor.

About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of over $850 million and employs approximately 4,200 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777.