WHO SHOULD ATTEND?
Peoples from academia and industry working in the area of nanostructured materials are encouraged to attend this course to deepen and widen their knowledge. In addition, the course is designed for those who would like to start to work in the challenging area of nanotechnology.

About Professor Stan Veprek

After his initial research work in plasma diagnostics and spectroscopy, Stan Veprek began his work on the deposition of thin films by means of plasma CVD 40 years ago at the Institute of Physics of the Czech Academy of Science where he started his scientific career after an education as a high school teacher (in Ceske Budejovice) followed by the study of physics at the Charles University in Prague (graduated 1962). His first major result was the deposition of nanocrystalline silicon, nc-Si, by means of chemical transport in plasma (published in 1968; nowadays, nc-Si is an important material for large-scale microelectronics, flat panel displays and thin films solar cells). He became involved in the research of the plasma-wall interactions in nuclear fusion devices. In 1976 he proposed the protective coating of the inner wall with boron carbide, and in the following years developed "boronization" by means of plasma CVD, which found successful application in several large fusion devices around the world.