Access to eBooks is limited to institutions that have purchased
or currently subscribe to the SPIE eBooks program. eBooks are not
available via an individual subscription. SPIE books (print and
digital) may be purchased individually on
SPIE.Org.

You currently do not have any folders to save your paper to! Create a new folder below.

Abstract

Fabrication of diffractive optical elements with binary transmission lithographic masks was used in Chapters 6 and 7 to demonstrate a number of principles. However, there are other techniques that have been developed for fabrication of diffractive microstructures. As previously noted, these techniques fall into three main categories: lithographic methods, direct machining, and replication. In this chapter we present a survey of other techniques used to make diffractive optics. Additional overviews of the history and techniques of modern micro-optics fabrication can be found in several references.
In addition to the binary mask method discussed in Chapter 7, other lithographic techniques are commonly used for fabrication of surface relief structures. These techniques differ from those used in creating binary optics primarily in the method used to expose the pattern on the photoresist. Some of the methods use a different etching procedure as well. We now consider several additional lithographic techniques for fabrication of diffractive optical elements, including direct writing, interferometric exposure, gray-scale lithography, and near-field holography (NFH).

Keywords/Phrases

Keywords

in

Remove

in

Remove

in

Remove

+ Add another field

Search In:

Proceedings

Volume

Journals +

Volume

Issue

Page

Journal of Applied Remote SensingJournal of Astronomical Telescopes Instruments and SystemsJournal of Biomedical OpticsJournal of Electronic ImagingJournal of Medical ImagingJournal of Micro/Nanolithography, MEMS, and MOEMSJournal of NanophotonicsJournal of Photonics for EnergyNeurophotonicsOptical EngineeringSPIE Reviews