Since May 2012 ATSL represents Arradiance Inc. In Israel. Arradiance specilized in the production of Bench-Top Atomic Layer Deposition (ALD) and Annealing Systems. Arradiance Inc. is American company located in MA.

Arradiance ALD systems deposit low temperature, conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They are designed for uniform conformal growth of films from precursors that have a CVD growth component. The uniformity of thin films can determine whether a process or device works, the system is designed to provide the user with the most uniform films possible, even in challenging HAR through-hole applications.