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Magnetron Sputtering Vacuum Coating

Operational principle:
Sputtering is physical phenomenon that electron collide with argon atoms and turn into Argon ions and electron ions when electron accelerated flying towards the substrate under the electric field effect. Thereafter, the argon ions accelerated bombard target in the electric field, that will sputter a large number of target atoms, neutral target atoms (or molecules) depositing on the surface of the substrate forming a layer or multi-layers decorative and functional film. Equipment configuration:
Structure type: vertical type or Horizontal type
Chamber type: single door or double doors
Power type: DC or Mid-frequencyApplication field:
It can be widely used in high-grade decorative and functional films for watch, glasses , communications, electronics, machinery, decoration and transportation aviation and other industries.