Infrastructure

» Electron Microscopy

Scanning Electron Microscopy

SEM

Scaning Electron Microscopy methods utilize two apparatus. The electron column of the Helios
NanoLab Dual Beam FIB system is exploited as an excellent SEM, used especially for images with very high
resolution in the secondary electron mode. The XL-30 Phillips SEM is used especially in
cathodoluminescence, EBIC (Electron Beam Induced Current) and XEDS modes, as well as in the modes of
secondary and backscattered electrons.

Focused Ion Beam, used for micro- and nano-processing and Scanning Ion Microscopy.

FIB

The possessed Focused Ion Beam Helios NanoLab Dual Beam system allows for multiple types of
nanoprocessing: milling/etching of all materials, deposition of metals and insulator. The system allows
for fabrication of designed patterns on different materials without the use of masks (direct writing).
FIB system is applied e.g. for preparation of TEM specimens (besides classical technique of argon ion
milling). Scanning Ion Microscopy with ion beam enables imaging of material surface or cross-sections
(e.g. fabricated previously with FIB) with the use of ions, being especially applicable for high material
contrast. There are also attached two Kleindiek manipulators for micro- and nano-manipulation and local
electrical measurements.