Molecular ruler nanolithography combines conventional lithography techniques with chemical self-assembly methods to improve the resolution of the existing lithography tools. We demonstrate the implementation of molecular ruler nanolithography using sacrificial multilayer host structures defined by electron-beam lithography. Using this process, 40-nm metal features are produced using host features spaced 100 nm apart. Using a thicker sacrificial layer, 100-nm-thick daughter metal layers are also produced, demonstrating the flexibility of this technique.