…production FBGs while also delivering the unit-to-unit consistency critical to their successful use in sensing and other applications. Ralph Delmdahl is product marketing manager at Coherent, Santa Clara CA; e-mail: ralph.delmdahl@coherent.com; www.coherent.com. Kristian Buchwald is vice president…

UTE BUTTGEREIT RALPH DELMDAHL T he current 65 nm feature size is already well below the traditional diffraction limit for the exposure wavelength of 193 nm that is used in the photolithographic fabrication process. Producing such small features requires the use of a number of very clever techniques…

2 R. Delmdahl et al. Figure 1. Fabrication scheme of flexible displays by means of excimer LLO. Figure 2. Schematics of the LLO characteristics using short and long wavelengths. about 100 nm, with the typical polymer layer thicknesses extending from some ten to some hundred micrometers [5]. As a…

UTE BUTTGEREIT RALPH DELMDAHL T he current 65 nm feature size is already well below the traditional diffraction limit for the exposure wavelength of 193 nm that is used in the photolithographic fabrication process. Producing such small features requires the use of a number of very clever techniques…

2 R. Delmdahl et al. Figure 1. Fabrication scheme of flexible displays by means of excimer LLO. Figure 2. Schematics of the LLO characteristics using short and long wavelengths. about 100 nm, with the typical polymer layer thicknesses extending from some ten to some hundred micrometers [5]. As a…

UTE BUTTGEREIT RALPH DELMDAHL T he current 65 nm feature size is already well below the traditional diffraction limit for the exposure wavelength of 193 nm that is used in the photolithographic fabrication process. Producing such small features requires the use of a number of very clever techniques…

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