Photomask / Direct Write Lithography

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JEOL Electron Beam Lithography

We offer the widest range of e-beam tools for mask, reticle, and direct-write lithography, from high volume production to advanced research and development of NIL, photonic crystals, and sub-10 nanometer linewidths. Whether your applications are for next generation and beyond, production of ultra-high accuracy reticles and FET devices, ASIC fabrication, or direct pattern lithography on wafers, JEOL has a solution. We also offer an FEG SEM that is expandable for simple lithography and research applications.