(Cat? OR feline) AND NOT dog?
Cat? W/5 behavior
(Cat? OR feline) AND traits
Cat AND charact*

This guide provides a more detailed description of the syntax that is supported along with examples.

This search box also supports the look-up of an IP.com Digital Signature (also referred to as Fingerprint); enter the 72-, 48-, or 32-character code to retrieve details of the associated file or submission.

Concept Search - What can I type?

For a concept search, you can enter phrases, sentences, or full paragraphs in English. For example, copy and paste the abstract of a patent application or paragraphs from an article.

Concept search eliminates the need for complex Boolean syntax to inform retrieval. Our Semantic Gist engine uses advanced cognitive semantic analysis to extract the meaning of data. This reduces the chances of missing valuable information, that may result from traditional keyword searching.

Surface Treatment During Transistor Fabrication

Publishing Venue

IBM

Related People

Fink, MS: AUTHOR

Abstract

A noble metal contact system for high-speed transistors includes electroless Pd on Pt-Si. However, the Pt deposition and alloying result in the formation of a carbon containing residue on the thermal oxide and platinum-silicide surface. This leads to high contact resistance and poor adhesion.

Country

United States

Language

English (United States)

This text was extracted from a PDF file.

This is the abbreviated version, containing approximately
100% of the total text.

Page 1 of 1

Surface Treatment During Transistor Fabrication

A noble metal contact system for high-speed transistors includes electroless
Pd on Pt-Si. However, the Pt deposition and alloying result in the formation of a
carbon containing residue on the thermal oxide and platinum-silicide surface.
This leads to high contact resistance and poor adhesion.

To overcome this problem, after Pt-Si formation, but before Pd deposition,
the following procedure is followed to remove the carbon residue.

1. Oxidize the carbon residue, as by immersion in a hot oxidation solution or
by burning. This leaves another residue of silicon oxide, but only on the surface
of the platinum silicide.

2. Remove the silicon oxide residue by ultrasonic etching in a
NH(4)H(2)PO(4) solution.

The residue is removed in about two minutes and adherent low resistance
palladium can then be electrolessly plated.