Coordinator of Exploratory Nanotechnology within NanoLund

Teaching

1. The course "Advanced Processing of Nanostructures" (Avancerad Framställning av Nanostrukturer) FFFN01 or FYST31, is given 2 times a year. The aim of the course is to teach different methods of fabrication of semiconductor nanostructures, with emphasis on practical work in our cleanroom (Lund Nano Lab). The course includes (a) 8 hours of lectures, (b) 3 laboratory works and (c) a 6 to 8 week-long project work. The project work is oriented towards our research activity and supervised by the lab staff and PhD-students. Due to "hands on" orientation of the course, the students work in the labs in small (2-4 persons) groups, which makes it possible to teach them different technological methods in a very efficient way.

According to the course evaluations made in 2009 - 2013, the course is ranked highly by the students. Most course participants appreciate practical experience they get during the laboratory and project work in the Lund Nano Lab. "It's a really good course overall", "Good combination of lectures and labs", "It was actually one of the best courses I've taken here at LTH" - here is just a few comments by the course participants.

Due to the practical nature of the course and restrictions of our cleanroom, the number of students is limited to 12 persons.

2. Apart from the regular teaching, I am also responsible for the Lund Nano Lab cleanroom and safety course, which is given appoximately every 3-4 weeks. All new users of the Lund Nano Lab must attend this course in order to start using the cleanroom. The dates of the course are announced on the Lund Nano Lab laboratory information and management server (LIMS).

At the moment I am a Research Infrastructure Fellow (RIF) of the Swedish Foundation of Strategic Research (SSF) at Lund Nano Lab. This SSF-grant (2016-2020) gives me a possibility to develop nanoimprint infrastructure at LNL, which includes both methods and applications of nanoimprint in large-scale patterning for fabrication of III-V nanowires and other nano-devices.

I also work to develop novel, high-resolution methods of nano lithography based on block copolymers (BCP) to reach sub-10 nm features. One of possible applications of such lithography would be technology of ultra-small III-V nanowires.