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Abstract

A nonlinear separation of molecular weight components of positive photoresist is used to emphasize sensitivity to high molecular weight fractions. By the use of this technique with Size Exclusion Chromatography (SEC), batches of photoresist having lower fractions of high molecular weight components are found to have good silylation properties. This is an especially important characteristic of positive photoresist used in oxygen ion etching applications.

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United States

Language

English (United States)

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This is the abbreviated version, containing approximately
94% of the total text.

A nonlinear
separation of molecular weight components of
positive photoresist is used to emphasize sensitivity to high
molecular weight fractions. By the use
of this technique with Size
Exclusion Chromatography (SEC), batches of photoresist having lower
fractions of high molecular weight components are found to have good
silylation properties. This is an
especially important
characteristic of positive photoresist used in oxygen ion etching
applications.

This method
also provides convenient comparison of
Polymer/Photo Active Compoment (PAC) ratios, and can discriminate
small changes in PAC loading. Subtle
variation detectability make
the method a viable technique for comparative analysis of similar
lots.

This method
uses a set of only two gel porosity columns, 500
Angstroms (A) and 100 A instead of the usual set of 500, 1000, 10000,
100 A. While the conventional column
configuration provides
relatively linear separations of log molecular weight vs. retention
time, the new configuration is non-linear and skews the distribution
toward lower molecular weights. This
skew produces total exclusion
of large molecules from the column set and results in a rapidly
eluting, high molecular weight peak, not seen with the conventional
separation method. While non-linear, the
separation profile rapidly
identifies the relative fraction of high molecular weight compon...