From 2013 to 2016, the Netherlands company ASML - an expert in industrial equipment for the production of semiconductors - supplied customers with 14 lithographic scanners of the EUV range. This equipment was considered to be proficient, since the power of the radiation sources in its composition did not allow processing silicon plates with a sufficiently high speed. To date, the power of EUV-radiation sources has been raised to 250 W and provides a processing speed of about 100 plates per hour.
Next year, the processing speed will be increased to 125 plates per hour. Replacement will require only a radiation source, which allows for on-site modernization.

Taking into account technological pauses, each ASML scanner of the latest generation per day can process 2000 plates with a diameter of 300 mm. The wavelength of EUV radiation in this generation of scanners is 13.5 nm, which is an order of magnitude shorter than that of actual mass scanners. The use of EUV-scanners will begin with a 7-nm process technology. Samsung plans to begin commercial operation of EUV-equipment in the first generation of 7-nm process technology in 2018, while TSMC and
GlobalFoundries expect to introduce the EUV-projection in 2019 or 2020 for the second generation of 7-nm process technology.

The commercial maturity of EUV-scanners allows to start full-scale equipment supplies. So, this year ASML will supply 12 scanners to customers, and next year 24 installations. The cost of each of them will be more than 100 million euros ($ 119). ASML remains a monopolist. In addition, no one in the world can produce projection units for working with the EUV-range. The previous leader of the market for lithographic scanners - the Japanese company Nikon - at an early stage of development
abandoned the EUV-range and focused on the technology of nano printing (nanoimprint). So today ASML owns about 80% of the market of lithographic scanners, and Nikon reduces the personnel and the amount of work performed, producing equipment on request.