resist exposure mode in lithographic processes in which the same pattern is projected on the surface of the wafer in the series of consecutive exposures instead of the exposure of the entire wafer.

stepper

resist exposure tool commonly used in photolithograhy; works using projection printing; in contrast to full-field exposure tools stepper exposes through the remotely located reticle only part of the wafer and repeats the process ("step-and-repeat") as many time as needed to expose entire wafer.

full-field exposure

exposure of the entire wafer during photolithography processes through properly designed mask; used in contact and proximity printing; as oposed to step-and-repeat exposurep process used in steppers.