Experts from SEMATECH's Front End Processes (FEP) program will present breakthrough research results in advanced logic and future non-volatile technologies at the International Symposium on VLSI Technology, System and Applications (VLSI-TSA) on April 27-29, 2009 at the Ambassador Hotel in Hsinchu, Taiwan. The papers report progress in areas such as next generation high-k/metal gate (HKMG) materials, advanced flash memory, planar and non-planar CMOS technologies and HKMG defect metrology.

"Through collaborative research, our goal is to develop and characterize cutting-edge new materials and device structures that enable scaling logic, memory, and emerging technologies," said Raj Jammy, SEMATECH's vice president of emerging technologies. "SEMATECH's work has always blended innovation with practical solutions to move the industry forward. We are happy to be sharing our results with an august community of technologists assembled in Taiwan, which plays an increasingly significant role in propelling the semiconductor industry towards future generations."

* Band Engineered Tunnel Oxides for Improved TANOS-type Flash Program/Erase with Good Retention and 100K Cycle Endurance - Demonstrates, for the first time, that band-engineered tunnel oxides integrated with a high-k/metal gate can improve program, erase, and endurance in charge-trapped flash memory devices. * High Mobility SiGe Shell-Si Core Omega Gate PFETs - Explores the use of Omega gate-type pFETs with a SiGe shell (high mobility channel) on a Si core.

Serving as the bridge between R&D and manufacturing, SEMATECH drives pre-competitive cooperation and collaboration to accelerate the commercialization of nanoelectronics and nanotechnology. SEMATECH's FEP engineers are focused on developing new techniques for extending high-k dielectrics, metal gates, high mobility channels, and advanced memory technologies in collaboration with member companies, universities, national labs, and supplier partners.

The International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) is sponsored by the Institute of Electrical and Electronics Engineers (IEEE), a leading professional association for the advancement of technology, in association with Taiwan's Industrial Technology Research Institute (ITRI). VLSI-TSA is one of many industry forums SEMATECH uses to collaborate with scientists and engineers from corporations, universities, and other research institutions.

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About SEMATECHFor 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.