This bench is dedicated to RCA (SC1, HF, SC2) Batch Cleans. The bench will only be filled with chemicals when there is a need for multiple samples i.e. several wafers per run. Only clean silicon wafers (pre furnace) or oxide ONLY wafers may be processed in this bench. No other materials are allowed.

This bench is dedicated to RCA (SC1, HF, SC2) Batch Cleans. The bench will only be filled with chemicals when there is a need for multiple samples i.e. several wafers per run. Only clean silicon wafers (pre furnace) or oxide ONLY wafers may be processed in this bench. No other materials are allowed.