Abstract

Patterns of assembled nanoparticles on Si(111) wafer were formed by the self-assembly technique. Three factors, concentration of the nanoparticles solution, dosage of the solution, and temperature of the Si wafer, were found to affect the quality of the nanoparticlepatterns. The prepared Si(111) wafer was used as the substrate to grow the patternedboronnanowires by thermoreduction method. Furthermore, a notable field emission property with moderate turn on field was obtained on the patternedboronnanowires. Our results indicate that the patternedboronnanowires have a great potential of applications in flat plane display and electron emission nanodevices.