Category

The sputtering target refers to the sputtering source that is deposited on a substrate to form various functional films under appropriate process conditions. Sputtering targets are widely used in many fields such as decoration, tooling, glass, electronic devices, semiconductors, and solar cells. Sputtering targets required in different fields vary. They can be classified into pure...

Happy new year, my dear friends. We are very happy with your company and encouragement. SAM Sputter Target’s website has not been established for a long time, but we always insist on updating the news and knowledge about targets and coatings every week. On the occasion of the arrival of 2019, let us summarize the...

About PBN Pyrolytic boron nitride is abbreviated as Pyrolytic BN or PBN, also known as Chemical vapor-deposited Boron Nitride, or CVD-BN, since PBN is mainly obtained by chemical vapor deposition. When it comes to boron nitride, we must talk about its two main structures: hexagonal and cubic. Hexagonal boron nitride and graphite are very similar...

Vacuum evaporation is a process in which a solid material (referred to as the evaporating material) is heated in a high vacuum environment to be deposited on a specific substrate to obtain a film. The vacuum evaporation process is mainly used in microelectronics to make active components, device contacts and metal interconnections, high precision low-temperature...

Aluminum sputtering target can be considered a product after a series of processes from high-purity aluminum. It is a type of sputtering materials used mounted on a vacuum coating machine to deposit a film in the vacuum coating industry. The property of the sputtering target directly affects the performance of the obtained film. Physical properties...

Definition The full name of ITO is indium tin oxide, a composition of indium, tin, and oxygen with different proportions. The substance of ITO and ITO sputtering target is the same, the latter of which is actually a black-gray ceramic semiconductor formed by mixing indium oxide and tin oxide powder in a certain ratio. How...

Metal titanium and titanium target are essentially the same, both of which are composed of titanium element; the difference is that metal titanium is more like a raw material, and titanium target is more like a titanium product. Titanium as a raw material can be made into titanium sputtering targets by several methods, and they...

Rare Earth is a general term for 17 elements of lanthanides as well as scandium and yttrium in the chemical periodic table. Scandium and yttrium are included in rare earth element because they are often symbiotic with lanthanide elements in mineral deposits, thus have similar chemical properties. Rare earth materials are important for many aspects,...

Physical vapor deposition (PVD) is a widely used thin film fabrication technique. When it comes to this phrase, many people compare it to chemical vapor deposition (CVD). Although the two phrases literally differ by only one word, the difference between them is actually great. Physical vapor deposition uses physical methods, that is, the transformation of...

Featured Products

SPUTTERTARGETS

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.