...PVD MagnetronSputtering Coating Machine 1. Magnetronsputtering is a plasma coating process where by sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber ...

... power supply is commonly used in electrical arc ion plating, DC magnetronsputtering, magnetronsputtering ion plating, unbalancedmagnetronsputtering, and twin magnetronsputtering systems for substrate bias during film deposition. The main features of...

... reproducibility from batch to batch rectangular cathodes in facing configuration for high coating uniformity. Unbalancedmagnetronsputtering technology for deep penetrating plasma Low and easy maintenance High system availability Short process cycle...

... years of dedicated research and development by our engineers, through a unique cathodic arc ion and unbalancedmagnetron systems, we have developed a computer automatic control system to make good density of the coating...