Description:

The AJA Ion Mill is a 22cm diameter Kaufman RF-ICP gridded ion source producing a collimated Argon ion beam which provides uniform etching of samples up to 6 inch diameter. The sample holder is water cooled at 20 degrees C. and has motorized tilt (0-180 degrees), and continuous sample rotation up to 25 RPM. The system is Cryo Pumped with a base pressure in the 10-8 torr range.

Capabilities:

Etching a wide range of Materials at rates which are related to their sputter yield. The wafer tilt and rotation feature is typically used to control the etch wall angle.

Processes Available:

The system is set with 4 different beam energies: 400V, 600V, 800V, and 1000V.

Applications:

This material is based upon work supported by the National Science Foundation under Grant No. ECCS-1542081. Any opinions, findings, conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.