Beneq,
a company providing industrial and R+D equipment and technology for functional
coatings, has further strengthened its position in the plasma enhanced Atomic
Layer Deposition (PEALD) equipment market, by establishing a collaboration agreement
with Dr. Arthur Sherman, the pioneer and key inventor of PEALD technology.

Dr. Sherman noted that "PEALD technology provides important additional
capabilities in expanding ALD process and chemistry options, e.g. for lower
process temperatures and for new coating materials, not currently available
using traditional thermal ALD."

Dr. Tommi Vainio, CTO of Beneq, added that "This collaboration agreement
with Dr. Sherman further accelerates Beneq´s expansion in the PEALD applications,
including not only our current popular R&D ALD systems, TFS 200 and TFS
500, but also future industrial production ALD systems utilizing PEALD capabilities.
Beneq´s customers have now access to strong PEALD process support, in
addition to the advanced and proven ALD systems from Beneq."

Related to this collaboration, Dr. Sherman provided the keynote presentation
during Beneq´s ALD customer meeting on September 2, 2009.

Graphene oxide membranes have been receiving attention for their extremely powerful separation abilities and the ease at which it can be modified, allowing for membrane permittivity to be fine-tuned. These membranes show the potential to be used for water purification, ‘green’ gas purification and greenhouse gas capture.