LAEIS: Presses for Sputtering Targets

Sputtering targets are used in physical vapor deposition (PVD ) coating as a source for the coating material. This method allows coatings with special optical, electrical or other characteristics to be achieved, such as on large plasma screens, laptops displays, mobile phones or architectural glass.

The Alpha 4200 has a maximum pressing force of 42,000 kN (4200 t). Large sputtering targets with dimensions up to about 1600 mm in length and 500 mm width with a thickness of only 8-14 mm, can be pressed with uniform density. The PH 6500, with a pressing force of 6500 t, can produce sputtering targets even larger, up to approximately 0.8 m². The Alpha 800, with a pressing force of 800 t, is used for the production of sputtering targets with smaller dimensions.

Materials such as indium tin oxide (ITO), alumina-doped zinc oxide (AZO) and others, can be used . AZO powder for this application, as well as supports for the firing process, can be produced by the LAEIS subsidiary ALPHA CERAMICS in Aachen.