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Since the mid 1960's there have been numerous papers published on the modification of organic polymers in a pure oxygen or oxygen-f luorocarbon plasma. In terms of this thesis, chemical modification occurs when a polymer is either passivated (fluorinated) or etched. Many parameters influence the degree to which a polymer is modified downstream of a microwave (MW) plasma. Some of the parameters include: substrate temperature, MW power, gas feed composition, chamber pressure and total gas flow rate; the latter two determine the gas flow velocity. One of the more important parameters, in the case of polyimide (PI), which influences etching, is the [0]/[F] ratio. That is. the ratio between the atomic oxygen concentration and the atomic fluorine concentration. [1,2,3]

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