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Our professional arc management solutions

The solution

We offer matching arc management systems that meet the requirements of a variety of processes. This enables the generator to respond to the arc quickly and precisely. The innovative sensors improve processing results and increase productivity. We offer improved output at the same price without the need to purchase additional hardware.

Products

MF Plasma Excitation

MF Plasma Excitation from TRUMPF Hüttinger is above all used in dual cathode systems, for example, dual magnetron sputtering.