The new 300mm bare wafer ADR provides a fully automated defect review process by AFM from transfer and alignment of defect maps to the survey and zoom-in scan imaging of defects that uses a unique remapping process that does not require any reference marker on a sample wafer. Unlike SEM which leaves destructive irradiation marks, square-shaped, on defect sites after its run, the new Park ADR AFM enables advanced coordinate translation with enhanced vision that uses the wafer edge and notch to automatically enable the linkage between a defect inspection tool and Park AFM. Since it is fully automated, it does not require any separate step to calibrate the stage of the targeted defect inspection system, increasing throughput by up to 1,000 percent. READ MORE

Featured Product: Park NX-Wafer

Park Systems, a leading manufacturer of atomic force microscopy (AFM) products announces Park NX-Wafer, a revolutionary AFM design for bare wafer manufacturing that fully automates the automatic defect review process and increases production throughput by an astounding 1,000%. Park NX-Wafer produces sub-Angstrom roughness measurements for the flattest substrates and wafers with tip-to-tip variation of less than 2%, for the first time ever in the entire history of the semiconductor industry.READ MORE

Park Cover Story: Microscopy & Analysis

In this issue, Park Systems shows the world's first observation of rat tracheal tissue in an aqueous environment.

By using Park XE-Bio SICM, Professor Ushiki and his team from Niigata University have successfully imaged the hair-like cells of rat tracheal issue in liquid.READ MORE

New Park AFM Website IS Now Ready

This website has an interactive, visitor-focused design. Many of the features of the new website were made in direct response to the requests received from customers around the world.