induced secondary electron emission coefficient, ISEE(Ti) = 0.11, ISEE(Cu) = 0.08 electron per ion, for argon ion energy of about 500 eV [ 39 ]. With the ISEE(Cu) being lower than ISEE(Ti), the discharge voltage is higher in case of copper sputtering ( Fig. 1 ). Taking into account invariant discharge current pulses (constant amplitude, duration time) one can conclude that higher energy is delivered to the magnetron source with each pulse while sputtering copper than titanium. To keep the same average discharge power, the number of pulses in a group has to be lower in