Nancy,
This machine does look like a wonder machine. What is the cycle time for
this machine? Does it take one wafer at a time or take multiple wafers?
Ultimately, what is the throughput of this machine?
Thanks.
Ben Jian
-------Original Message-------
From: Nancy Latta
Subject: New Fusion tool for UV cure
Sent: 12 Jan '07 17:32
Folks,
Recently Paul Rissman requested labmembers to use the fusion tool for
testing before turning over for general lab use. In the tests that he
and I did last week it appears as though the tool could be a great
replacement for our 'UV cure and super bake' procedure. It is much
faster and does a good job of stopping the resist burning issues we see
with long (over 10 mins) etches.
The fusion might be worth looking into for those of you with long etches
using photoresist masks.
-Nancy
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <http://snf.stanford.edu/pipermail/amtetcher/attachments/20070112/168a898a/attachment.html>