Synopsys today announced the adoption of Synopsys' Proteus™ LRC by MagnaChip Semiconductor Corporation, a Korea-based designer and manufacturer of analog and mixed-signal semiconductor products. MagnaChip uses Proteus LRC in their production mask synthesis flow to identify hotspot locations in designs that are sensitive to variations in the manufacturing process.

SSMC has deployed Proteus LRC in their production and development flows for post-OPC lithography verification to identify critical manufacturing hotspot locations that are sensitive to process variation and susceptible to increased yield loss.

Proteus LRC provides comprehensive, process-window-aware checking features to identify locations in a design that are sensitive to process variations, thereby enabling corrective action to be taken prior to committing a design to manufacture.

SVTC Technologies has chosen Synopsys' manufacturing tool suite to enable its customers to reduce time-to-market for a wide variety of innovative products using CMOS processes, MEMS, photovoltaics and other related nanotechnologies.

The 28-nm node pushes the limits for single-exposure photon-based lithography, and by selecting Proteus, Renesas can achieve their aggressive OPC accuracy specifications with improvement of process robustness.

Synopsys, Inc. today announced that they have developed a seamless link between Hitachi High-Tech's DesignGauge design data measuring system and Synopsys' Proteus optical proximity correction (OPC) solution.