he self-assembly in various polymeric systems is the core principle to many of advanced nanotechnologies. Success of most of these applications utilizing the self-assembly relies on how well one can adjust and switch the shape and size arrangement direction of self-assembly. Hence there have been active research efforts in understanding the underlying physics and controlling the self-assembly, augmented by theoretical and numerical modeling. Complicated interactions, high sensitivity on various system parameters, wide range of length and time scales related with self-assembled structures make finding theoretical modeling very challenging.

In this talk, I will introduce both of field- and particle- based modeling approaches which have successfully applied in predicting the self-assembly of block copolymer and describe how simulations have helped advance research in block copolymer thin films as a promising high resolution lithographic tool. Moreover, recent efforts to predict the kinetics of self-assembly will be also discussed along with challenges and vision of the future research.