(Nanowerk News) Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices, today announced that it has received a follow-on, multiple-system order for its laser spike anneal (LSA) tools from a major foundry in Asia. Ultratech's LSA100A systems will be used to support high-volume production for advanced logic devices in 2010. Based on Ultratech's proprietary long-wavelength annealing technology, the LSA100A provides significant cost of ownership, process uniformity, and process control advantages that make it an ideal tool for foundry manufacturing. Ultratech's LSA tools are currently being used in all major logic foundries.

Ultratech's Vice President of Laser Product Marketing, Jeff Hebb, Ph.D., noted, "Our foundry customers require a cost-effective, advanced annealing solution that has the flexibility to process many different product layouts while maintaining high product yields. The unique technology of the LSA100A system has demonstrated that it can meet these critical requirements in a foundry environment, and is also extendible to the next two technology generations. Our LSA system provides uniform temperature and uniform process results that are independent of the device layout. As a result, our foundry customers can feel confident that they will not experience yield issues when transferring LSA processes to new product designs, as many have done already. This follow-on, multi-system order further confirms the LSA100A system provides a low-risk solution for the foundries' advanced annealing requirements."

About Ultratech

Ultratech, Inc. designs, manufactures and markets photolithography and laser processing equipment. Founded in 1979, the company's market-leading advanced lithography products deliver high throughput and production yields at a low, overall cost of ownership for bump packaging of integrated circuits and high-brightness LEDs. A pioneer of laser processing, Ultratech developed laser spike anneal technology, which increases device yield, improves transistor performance and enables the progression of Moore's Law for 65-nm and below production of state-of-the-art consumer electronics.

Source: Ultratech (press release)

If you liked this article, please give it a quick review on reddit or StumbleUpon. Thanks!