Products

It applies a uniform dose of acoustic energy to a rotating substrate. The MegPie will improve process efficiency and lower process time. It is easy to retrofit to your single-substrate processing tool.

Particle-neutral sapphire resonator – no particles added to the process

Patented crystal bond to the resonator

Patented RF connection to the crystal

Redundant internal RTD temperature monitoring

Available in 100mm to 450mm+

Custom sizes available

Sapphire resonator compatible with all processing chemistries

Uniform direct acoustic energy applied to the process

Increased process efficiency

Reduced process time

Reduced process chemistry usage

No moving parts to maintain

No consumables – works better than brushes

For more information please visited our booth #560

K-Patents Semicon Process Refractometer PR-33-S

Monitors the fab chemicals' concentration in cleanroom environment and in the integrated process tools (blending, clean, etch, and CMP)... More Info Less Info

The PR-33-S consists of an ultra-pure, modified PTFE flow cell body and an Ethernet cable that any standard PoE (Power-over-Ethernet) switch can use to transmit power to the sensor and data to a computer. The PR-33-S monitors chemical concentrations in real-time and provides an Ethernet output signal and immediate feedback, if the chemical is out of specifications. For example, low and high concentration alarms may be configured to control and increase bath life. The concentration is determined by making an optical measurement of the solution’s Refractive Index nD and temperature.

The PR-33-S is mounted directly in-line with a flare or pillar fitting. The PR-33-S has a compact, metal-free construction and it only needs a small footprint area.

Key Features:

PR-33-S is used for process control and monitoring.

Compact and mounted directly in-line. The measurement is not influenced by particles, bubbles or turbulent flow and impurities in the ppm range.

Provide lower cost of ownership with better process results. Our products have been tested and proven in production by major semiconductor manufactures in USA, Europe, Taiwan and Korea.
... More Info Less Info

Characteristics
We minimize diamond loss possibilities during the process by analyzing the pads and slurries as well as each individual disk prior to manyfacturing.

Excellent Diamond Retention

Longer Disk Life

Increased Pad Life

Significant Lowering of Micro Scratches Consistent Removal Rate

Special Proven Low ph Coatings

CMP Processes
We have the capability to meet the needs of each customer by porviding customized disks based on years of experience cooperating with major fabs and R&D centers

Oxide CMP : BPSG, TEOS, SC

Metal CMP : W, CU

STI, PGI etc.

Availability of Our Products
Our CMP disks are available in various production quantities, shapes and sizes for all CMP production platforms.