CVD-04: Nanowire Growth System

The Atomate Nanowire Growth System uses a chemical vapor deposition process to grow doped silicon, germanium, or silicon germanium nanowires.
During growth these structures can be doped with boron or phosphorous resulting in nanoscale diodes and transistors. Carbon based structures
such as nanotubes and grapheme can also be grown but require a change of gases to methane and acetylene. Please see staff to change
gases.

Several hazardous gases are plumbed into this system, including: silane, diborane, phosphine and hydrogen.
Extreme care must be exercised by users.