Thursday, July 13, 2017

San Diego, Calif – July 13, 2017–RASIRC will announce the latest generation of its BRUTE Hydrazine product line at the annual ALD Conference held July 15-18, 2017 in Denver, Colorado. At low temperatures, ammonia or nitrogen plasmas cannot grow nitride ALD films on three dimensional, high aspect ratio (HAR) structures. BRUTE Hydrazine solves this problem and enables process engineers to incorporate nitrides into new device architectures.

RASIRC Chief Technology Officer Dan Alvarez will present “Low Resistivity Titanium Nitride ALD: Low Temperature Enabled by the Use of Ultra‐High Purity Hydrazine” on Tuesday July 18, at 1:45PM in Room Plaza F. Alvarez is a contributing author on another paper and two posters to be presented during the conference. RASIRC will also present the latest findings related to novel reactive chemistries for in-situ surface functionalization at Booth #16.

BRUTE Hydrazine for Low Temperature Nitride ALD

Sub-400°C metal nitride deposition is required for next generation logic and memory devices due to thermal sensitivity of new materials. These low thermal budgets and high aspect ratio (HAR) structures create challenges for nitride deposition. Hydrazine gas is a strong nitridation designed specifically for low temperature ALD. BRUTE Hydrazine delivers this gas in a stable, reliable flow from a liquid source in a sealed vaporizer.

BRUTE Peroxide is a novel oxidant that improves passivation and nucleation density at semiconductor interfaces when compared to water. Surface functionalization is denser and initiation is faster using this anhydrous hydrogen peroxide gas compared with alternatives. Key is that anhydrous hydrogen peroxide may react with only 1-2 monolayers of the substrate, ensuring that sub-surface oxidation is minimal. This allows for surface functionalization without surface damage, making BRUTE Peroxide potentially useful in ALE applications as well.

Both hydrazine and hydrogen peroxide are uniquely qualified for ALD and surface functionalization. Hydrazine has a weak N-N bond, is more reactive than ammonia and has less hydrogen to be trapped in the film. Hydrogen peroxide has a very weak O-O bond, is a stronger oxidant than water, less oxidizing than Ozone, and has lower steric hindrance then either molecule.

Exhibit Booth

Conference attendees are invited to visit RASIRC at Booth #16. Representatives will be available to answer any questions and discuss exciting results from recent customer testing. Stop by to get the latest research papers and see a demonstration model of our unique solvent-based delivery system for BRUTE Hydrogen Peroxide and BRUTE Hydrazine. Also learn about the Peroxidizer® for high-volume surface hydroxylation and atomic layer deposition. Ask about Hydrogen Peroxide Steam.

Product Availability

RASIRC BRUTE® Peroxide and BRUTE Hydrazine both use a proprietary delivery system to enable delivery of pure gases. BRUTE Hydrazine is available in 250g and 750g replaceable units. BRUTE Peroxide is available in 300g and 900g replaceable units. Both BRUTE chemistries are also available in a compact Laboratory edition is also available for use under vacuum draw. This plug-and-play version enables universities, research institutes and advanced technology groups to work with the smaller amounts of chemistry for rapid thin film process screening. The Peroxidizer delivers hydrogen peroxide gas in stable, high concentrations from 12,500 to 50,000 ppm, which equates to 1.25 to 5% gas by volume. The system handles gas flows of 5 to 30 slm in vacuum or atmospheric conditions.

About RASIRC

RASIRC specializes in products that generate and deliver gas to fabrication processes. Each unit is a dynamic gas plant in a box—converting common liquid chemistries into safe and reliable gas flow for most processes. First to generate ultra-high purity (UHP) steam from de-ionized water, RASIRC technology can now also deliver hydrogen peroxide gas and hydrazine gas in controlled, repeatable concentrations. RASIRC gas delivery systems, humidifiers, and closed loop humidification systems are critical for many applications in semiconductor, photovoltaic, pharmaceutical, medical, biological, fuel cell, and power industries. Call 858-259-1220, email info@rasirc.com or visit http://www.rasirc.com.