Chemical stability of a composite material based on silicon and boron nitrides

Chemical stability of a composite material based on silicon and boron nitrides
Kelina, I.; Ershova, N.; Drobinskaya, Y.; Plyasunkova, L.
2007-11-30 00:00:00
Results of a study of the chemical resistance of a composite Si3N4 — BN material to the action of acids and alkalis are presented. Independently of the content of BN and the porosity the material resists the action of HC1, HNO3, H2SO4, and KOH. Hydrofluoric acid has a strong effect on the composite material with over 30% BN even after only 10 days of contact. It is shown that the decomposition of the material obeys the rule “glass phase → Si3N4” and is selective; BN is more chemically stable than Si3N4.
http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.pngRefractories and Industrial CeramicsSpringer Journalshttp://www.deepdyve.com/lp/springer-journals/chemical-stability-of-a-composite-material-based-on-silicon-and-boron-hkpFloIH3X

Chemical stability of a composite material based on silicon and boron nitrides

Abstract

Results of a study of the chemical resistance of a composite Si3N4 — BN material to the action of acids and alkalis are presented. Independently of the content of BN and the porosity the material resists the action of HC1, HNO3, H2SO4, and KOH. Hydrofluoric acid has a strong effect on the composite material with over 30% BN even after only 10 days of contact. It is shown that the decomposition of the material obeys the rule “glass phase → Si3N4” and is selective; BN is more chemically stable than Si3N4.