Working Mask

Photomask – A design or Pattern of Photographically produced actinically opaque images used in Microlithography. These images may be on various films or glass substrates and the images may be made of various materials and of various sizes.

HTA Photomask manufactures 1x mask. The two most common type of substrate material used for making photomasks are soda lime and fused silica. And the two most common type of metallization coating are chrome and iron oxide. The size of the plate ranges from three inches to nine inches and the thickness also varies.