SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR

21

Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

67

Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

H

ELECTRICITY

01

BASIC ELECTRIC ELEMENTS

L

SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR

21

Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

67

Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

68

for positioning, orientation or alignment

H

ELECTRICITY

01

BASIC ELECTRIC ELEMENTS

L

SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR

21

Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

67

Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components

683

for supporting or gripping

687

using mechanical means, e.g. chucks, clamps or pinches

H

ELECTRICITY

01

BASIC ELECTRIC ELEMENTS

L

SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR

21

Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

(EN)METHOD AND SYSTEM FOR MOVING A SUBSTRATE(FR)PROCÉDÉ ET SYSTÈME POUR DÉPLACER UN SUBSTRAT

Abstract:

(EN)A method and a system for moving a substrate, the system includes a chamber, a chuck, a movement system that is positioned outside the chamber, a controller, an intermediate element, at least one sealing element that is configured to form a dynamic seal between the intermediate element and the chamber housing. The movement system is configured to repeat, for each region of the substrate out of a plurality of regions of the substrate, the steps of: rotating the chuck to position a given portion of the region of the substrate within a field of view that is related to an opening of the chamber housing; and moving the chuck relation to the opening to position additional portions of the region of the substrate within the field of view that is related to the opening.(FR)L'invention concerne un procédé et un système pour déplacer un substrat, le système comprenant une chambre, un mandrin, un système de déplacement qui est positionné à l'extérieur de la chambre, un dispositif de commande, un élément intermédiaire, au moins un élément d'étanchéité qui est conçu pour former un joint d'étanchéité dynamique entre l'élément intermédiaire et le boîtier de chambre. Le système de mouvement est configuré pour répéter, pour chaque région du substrat sur une pluralité de régions du substrat, les étapes consistant à : faire tourner le mandrin pour positionner une partie donnée de la région du substrat dans un champ de vision qui est associé à une ouverture du boîtier de chambre ; et à déplacer la relation de mandrin par rapport à l'ouverture pour positionner des parties supplémentaires de la région du substrat dans le champ de vision qui est associé à l'ouverture.