Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, silicon photonics, mask making as well as integrated optics and several new emerging markets.

The Asylum Research Cypher™ AFMs are considered to be in a class of their own. Every design choice was guided to obtain an exceptional combination of highest resolution, integrated environmental control, fast scanning and supreme productivity.