A 90nm Twin Flash memory cell with a size of 0.029/spl mu/m/sup 2//bit (3.5F/sup 2/) is presented. This cell is introduced first in a 1.8V, 2Gbit data flash. The Twin Flash technology is based on a… (More)

The atomic layer deposition of alumina using TMA (trimethyl-aluminum) and O/sub 3/, O (atomic oxygen), or H/sub 2/O into high aspect ratio trenches is investigated. We determine the activation energy… (More)