Growth of Graphene Layers on Silicon Carbide

Abstract:

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The so-called “growth” of graphene was performed using a horizontal chemical vapor deposition (CVD) hot-wall reactor. In-situ etching in the mixture (H2-C3H8) was performed prior to growth at 1600oC temperature under 100 mbar. Systematic studies of the influence of the decomposition temperature and time, substrates roughness, etching of the substrates, heating rate, SiC dezorientation and other process parameters on the graphene thickness and quality have been conducted. Morphology and atomic scale structure of graphene was examined by Scanning Tunnelling Microscopy (STM), Transmission Electron Microscopy (TEM) and Raman scattering methods.

Abstract: Graphene is a 2D material with potential for almost any purpose, thanks to a combination of excellent characteristics, e.g. high electrical conductivity. Graphene grown on SiC wafers is one of the promising routes for graphene integration into planar technology electronic applications. Synthesis is based on the decomposition of a SiC single crystal surface at high temperature, where Si-terminated SiC substrates require the formation of the C buffer layer. In spite of numerous experimental and theoretical works the understanding and control upon crucial factors such as step and terrace stability or surface roughening is far from been fully comprehended and then technologically optimized. We present experimental results on the deposition of graphene onto Si-terminated 6H-SiC. We analyze the effect of ex situ and in situ conditionings of the SiC surface in the thermal decomposition and reconstruction of the SiC terraces, toward higher control upon the growth process of graphene films.