1When this research was performed, C. Montcalm was with the Institut National de la Recherche Scientifique-Énergie et Materiaux, Université du Québec, P.O. Box 1020, Varennes, Québec J3X 1S2,
Canada, and the Institute for Microstructural Sciences, National Research Council of Canada, Montréal Road, Ottawa, Ontario K1A 0R6, Canada, and a visiting researcher at the Laboratory for X-Ray Optics, Optical Sciences Center and Department of Physics, University of Arizona, Tucson, Arizona 85721.

Abstract

We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray–extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.

References

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