COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

14

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

14

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

14

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

(EN)BASE SUPPORT COMPONENT, FILM FORMING DEVICE AND METHOD(FR)ÉLÉMENT DE SUPPORT DE BASE, DISPOSITIF ET PROCÉDÉ DE FORMATION DE FILM(ZH)基底支持组件、成膜设备和方法

Abstract:

(EN)A base support component (10), comprising a support plate (1) which is configured to support a base (5) in a film forming process. The support plate (1) has a working surface configured to face the base (5), wherein a plurality of openings (11) are formed in the working surface of the support plate (1) at intervals; a moving block (2) and a driver (3) are disposed in at least some or all of the plurality of openings (11); the driver (3) is configured to drive the moving block (2) to ascend and descend relative to the working surface, so that the top surface of the moving block (2) may at least move between a position flush with the working surface and a position protruding from the working surface. Further disclosed are a film forming device and a film forming method.(FR)La présente invention concerne un élément de support de base (10), comprenant une plaque de support (1) conçue pour porter une base (5) au cours d'un processus de formation de film. La plaque de support (1) comporte une surface de travail conçue pour faire face à la base (5), une pluralité d'ouvertures (11) étant formées à intervalles dans la surface de travail de la plaque de support (1) ; un bloc mobile (2) et une came (3) sont disposés dans au moins une partie ou dans la totalité de la pluralité d'ouvertures (11) ; la came (3) est conçue pour entraîner le bloc mobile (2) en montée et en descente par rapport à la surface de travail, de sorte que la surface supérieure du bloc mobile (2) peut au moins se déplacer entre une position affleurant la surface de travail et une position faisant saillie depuis la surface de travail. L'invention concerne également un dispositif de formation de film et un procédé de formation de film.(ZH)一种基底支持组件(10)，包括配置为在成膜工艺中支持基底(5)的支持板(1)，支持板(1)具有配置为朝向基底(5)的工作面，其中，支持板(1)的工作面上设置有间隔的多个开口(11)，多个开口(11)至少部分或全部中设有活动块(2)和驱动器(3)驱动器(3)配置为驱动活动块(2)相对于工作面升降，以使活动块(2)的顶面至少能在与工作面齐平的位置和凸出于工作面的位置间运动。还公开了一种成膜设备和成膜方法。