From jwc at snf.stanford.edu Fri Feb 3 11:31:07 2006
From: jwc at snf.stanford.edu (James Conway)
Date: Fri, 03 Feb 2006 11:31:07 -0800
Subject: First Announcement: Ebeam Town Hall Meeting for February 28, 2006
from 2:30 - 4:30 in CIS 101
Message-ID: <43E3AF7B.9080103@snf.stanford.edu>
Greetings Ebeam and Raith Communities:
The next Ebeam Town Hall Meeting will be held Tuesday February 28, 2006
from 2:30 - 4:30 PM at CIS 101. We hope to have a good turnout for this
meeting as we will cover a number of topics under informal discussion
within the Ebeam Lab. We also sincerely desire your input and feedback.
The agenda and items for discussion are currently open for your input
and any request.
Ebeam Town Hall Meeting Agenda:
1. Welcome and Introduction by James Conway
( 5 minutes)
2. Feature Presentation: (
30 minutes + 10 for Q&A)
Yves Acremann, Stohr Group will be presenting an update from his group
who are using the RAITH 150.
Title: Magneto-dynamics: from field pulses to spin injection
Abstract:
Magnetic nanostructures still show complex switching behaviors which are
important for applications. Magnetic switching by a field is envisioned to be replaced
by injection of a spin polarized current into the magnet.
This has been demonstrated by transport experiments. Time resolved x-ray
microscopy allows for the first time to image the magnetization switching process in a spin transfer structure revealing
the limitations of the macrospin model.
Instead of the coherent magnetization reversal, we observe switching by
lateral motion of a magnetic vortex across a nanoscale element.
Our measurements reveal the fundamental roles played independently by the
torques due to charge and spin currents in breaking the magnetic symmetry on picosecond time scales.
3. Microchem MaN-2403 Negative EBL Resist Technical Review: (30 minutes + )
For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results using this resist.
MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified EBL resist.
Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step.
It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used at SNF.
Users whom have tested this material are encouraged to present data and images of their EBL results working with this material. Users wishing to test and evaluate this material in February are requested to see me directly to obtain access to this material.
Based on your feedback we will hope to gain consensus and together make a decision to make this material a standard stocked
resist material here at SNF.
4. Raith Reservation and Scheduling Issues: (<20 minutes )
Managing the Raith 150 system with a large number of users of various experience levels.
- Changes or Modification to the currently existing policies in place?
- Cancellation Policy -- 24 hour notice requested?
- Should we penalize users whom cancel, or repeatedly not show up for their reservations?
- Should we implement a Raith System Standby Users listing?
- 'Share the Ride' incentive for users working with small chips.
5. Ebeam Conference SWAG raffle: (10 minutes )
For years I have attended Three Beams, the Electron Ion Photon Beam Research Network Meeting (EIPBN) and other topical conferences. In this time I have collected a number of interesting items that I have no use for whatsoever.
So to lighten up this meeting all participants may enter into a raffle to share some of this cool stuff!
If you have similar items you have no use for, from comical prizes or awards to spare T-shirts and such, fell free to donate them to the Lab and we will distribute to the users in the Lab. Let have some fun with this idea at this meeting.
6. Additional Items to be determined...
The Agenda remains open awaiting your input!
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From jwc at snf.stanford.edu Wed Feb 15 11:48:07 2006
From: jwc at snf.stanford.edu (James Conway)
Date: Wed, 15 Feb 2006 11:48:07 -0800
Subject: 2nd Announcement: Ebeam Town Hall Meeting for February 28, 2006 from
2:30 - 4:30 in CIS 101
Message-ID: <43F38577.7020101@snf.stanford.edu>
Greetings Ebeam and Raith Communities:
The next Ebeam Town Hall Meeting will be held Tuesday February 28, 2006
from 2:30 - 4:30 PM at CIS 101. We hope to have a good turnout for this
meeting as we will cover a number of topics under informal discussion
within the Ebeam Lab. We also sincerely desire your input and feedback.
The agenda and items for discussion are currently open for your input
and any request.
Thank you for your interest in Ebeam Technologies at the Stanford
Nanofabrication Facility,
James Conway
Ebeam Town Hall Meeting Agenda:
1. Welcome and Introduction by James Conway
( 5 minutes)
2. Feature Presentation: (
30 minutes + 10 for Q&A)
Yves Acremann, Stohr Group will be presenting an update from his group
who are using the RAITH 150.
Title: Magneto-dynamics: from field pulses to spin injection
Abstract:
Magnetic nanostructures still show complex switching behaviors which are
important for applications. Magnetic switching by a field is envisioned to be replaced
by injection of a spin polarized current into the magnet.
This has been demonstrated by transport experiments. Time resolved x-ray
microscopy allows for the first time to image the magnetization switching process in a spin transfer structure revealing
the limitations of the macro spin model.
Instead of the coherent magnetization reversal, we observe switching by
lateral motion of a magnetic vortex across a nanoscale element.
Our measurements reveal the fundamental roles played independently by the
torques due to charge and spin currents in breaking the magnetic symmetry on picosecond time scales.
3. Microchem MaN-2403 Negative EBL Resist Technical Review: (30 minutes + )
For more than a year now we have been exploring the process parameter space working with MicroChem MaN-2403 Negative Ebeam Resist. A number of users have had a chance to test and evaluate this high quality resist material for their research here at Stanford. Several users have reported excellent EBL results using this resist.
MicroChem MaN-2403 Negative Ebeam Resist offers a alternative to working with our UVN-30 amplified EBL resist.
Specifically it has a wider process latitude for exposure and does not require the critical post exposure bake step.
It is a Novalak based resist system and offers similar etching characteristics to other Optical Photoresist used at SNF.
Users whom have tested this material are encouraged to present data and images of their EBL results working with this material. Users wishing to test and evaluate this material in February are requested to see me directly to obtain access to this material.
Based on your feedback we will hope to gain consensus and together make a decision to make this material a standard stocked
resist material here at SNF.
4. Raith Reservation and Scheduling Issues: (<20 minutes )
Managing the Raith 150 system with a large number of users of various experience levels.
- Changes or Modification to the currently existing policies in place?
- Cancellation Policy -- 24 hour notice requested?
- Should we penalize users whom cancel, or repeatedly not show up for their reservations?
- Should we implement a Raith System Standby Users listing?
- 'Share the Ride' incentive for users working with small chips.
5. Ebeam Conference SWAG raffle: (10 minutes )
For years I have attended Three Beams, the Electron Ion Photon Beam Research Network Meeting (EIPBN) and other topical conferences. In this time I have collected a number of interesting items that I have no use for whatsoever.
So to lighten up this meeting all participants may enter into a raffle to share some of this cool stuff!
If you have similar items you have no use for, from comical prizes or awards to spare T-shirts and such, fell free to donate them to the Lab and we will distribute to the users in the Lab. Let have some fun with this idea at this meeting.
6. Additional Items to be determined...
The Agenda remains open awaiting your input!
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From jwc at snf.stanford.edu Thu Feb 16 18:57:14 2006
From: jwc at snf.stanford.edu (James Conway)
Date: Thu, 16 Feb 2006 18:57:14 -0800
Subject: Please be careful in your utilization of the expensive PMMA materials.
Message-ID: <43F53B8A.6080706@snf.stanford.edu>
Greetings Ebeam and Raith Users Groups:
To ensure a supply of the normal blends of PMMA in the cleanroom over
the holiday weekend I have placed a new bottle of both 9% 950K PMMA - A
and 2% 950K PMMA -A into the yellow solvent cabinets. Please use up the
reminder of the 2% 950K PMMA - A before opening up a new bottle.
I finished up the old bottle of 9% 950K PMMA today.
Users are also requested to be frugal and careful in their use of these
expensive materials. No one should be doing any pour transfers or
placing PMMA into beakers while dispensing to the spinner coaters. If
you employ a syringe and a filter when spinning your material you will
obtain better and more consistent results with these materials.
Exposure to air and water vapor for even a few minutes will result in a
change in materials viscosity as they are nearly all solvents, and the
materials may hydrolyze resulting in reticulated film morphologies and
result in very poor Ebeam Lithography results. Finally you will expose
yourself to more solvent vapors that is necessary to complete your
coating task.
All users are encouraged to employ the Ebeam Resist Handling Procedures
that are posted on our web site in order to obtain optimal processing
results.
Thank you for your efforts to hold down cost of engineering materials
within the SNF Cleanroom and thank you for your support!
All the best,
James Conway
PS The PMMA materials are never to leave the SNF cleanroom or Ebeam lab
for any reason. Please see me directly during my office hour should you
desire a supply for any other outside usage. jwc
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