1. (WO2012099092) METHOD FOR PRODUCING HIGH-PURITY LANTHANUM, HIGH-PURITY LANTHANUM, SPUTTERING TARGET FORMED FROM HIGH-PURITY LANTHANUM, AND METAL GATE FILM HAVING HIGH-PURITY LANTHANUM AS MAIN COMPONENT

COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL

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Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

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characterised by the process of coating

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Sputtering

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ELECTRICITY

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BASIC ELECTRIC ELEMENTS

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SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR

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Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof