EUV & Imaging

Reading and Writing at the Atomic Scale

The pulsed plasmas used for EUV light generation for lithography applications has the side effect of coating the lenses used to focus it. Understanding this plasma is critical to understanding how to improve performance.

Electron beams are used for various imaging applications, the energy and divergence of these beams play a major role in performance and needs to be measured and understood.

Impedans offer a range of products suitable for EUV and other imaging applications. We have products suited for research and development and/or new equipment design.

EUV Generation | Z-pinch | Electron Beam Imaging

Working with the most advanced patterning or imaging technologies?We can find a diagnostic solution for you

About us

Impedans specialises in the delivery of high performance and high resolution plasma diagnostics solutions to customers in research and industry. Our products find applications in plasma process research and development, process monitoring and control, and manufacturing tool development in the semiconductor, surface coating, flat panel, thin film and solar sectors.

Impedans' products represent the next generation in plasma diagnostics technology, and coupled with our in-depth plasma knowledge and years of experience, our customers can be sure that they can fully characterise, optimise and monitor their plasma processes with confidence.