REGISTRATION
IS NOW CLOSED

The AVS Short Course Webinar focusing on
on Atomic Layer Deposition (ALD) will be held on
Thursday March 15 at 1:00 PM eastern time. This webinar will
be taught by AVS Instructor, Robert K. Grubbs. Dr. Grubbs
has been working in the field ALD for 20 years and has
applied the ALD process to solve myrid technical challenges
in the semiconductor industry and in the area of national
security.

This webinar on Atomic Layer Deposition (ALD) is for anyone
who wants to know specific details about how the ALD process
works and how to implement ALD in a laboratory setting. The
webinar will cover the basic aspects of the chemical
mechanism of ALD and how that leads to the unique and potent
properties of an ALD process. Multiple examples of ALD
chemistry will be covered as well as reactor design,
chemical precursor properties, plasma ALD, and molecular
layer deposition (MLD).

Who should attend:
Technicians, graduate students and engineers who are working
with ALD and want to know more about the subject and for the
novice who wants to become more familiar with the exciting
and ever expanding field of Atomic Layer Deposition.