gas comprising of three oxygens, O3, formed during the reaction of atomic oxygen, O, with molecular oxygen, O2; very strong oxidizing agent; in semiconductor processing used as a gas in "dry" processes or as a gas dissolved in deionized water to form ozonated water commonly used in wafer cleaning operations.

ozonated water

water with ozone dissolved in it to increase its oxidizing strength; commonly used in semiconductor processing to remove organic contaminants from the wafer surface.

UV/ozone

dry cleaning process used to remove organic contaminants from the surfaces of solids such as semiconductor wafers and masks; UV rradiation in the ambient containing oxygen generates ozone which is a very strong oxidizing agent; spectrum of UV light used should contain 185 nm and 254 nm wavelengths.