Focus is made on integrated silicon applications. Various standard technologies will be presented in CMOS bulk, BiCMOS, FD SOI, interposers. Special attention will be paid on RF and millimeter waves constraints. Weighing between the pros and cons will enable to enface a specific technology for a specific application, digital and/or analog, RF and/or millimeter waves. An overview of potentially future trends will be drawn also with alternative technologies: MEMS vs varactors for tunability, graphene for very high mobility channels.

- Clean room based fabrication – 8 hours – 1 ECTS

An 8-hour tutorial in the cleanroom of the CIME-Nanotech will illustrate this class.It will be dedicated to the clean-room presentation and the fabrication of diodes or MOM capacitors.