GHS P StatementP260-P301+P310-P303+P361+P353-P305+P351+P338-P361-P405-P501aDo not breathe dust/fume/gas/mist/vapors/spray.IF SWALLOWED: Immediately call a POISON CENTER or doctor/physician.IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower.IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing.Remove/Take off immediately all contaminated clothing.Store locked up.Dispose of contents/container in accordance with local/regional/national/international regulations.

ApplicationsTetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, as a basic solvent in the development of acidic photoresist in photolithography process, as a surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds application in the production of organic silicon, where it is used for computer silicon wafer surface brighteners and as a cleaning agent. It is also involved in the purification of some metallic elements.

GHS P StatementP260-P301+P310-P303+P361+P353-P305+P351+P338-P361-P405-P501aDo not breathe dust/fume/gas/mist/vapors/spray.IF SWALLOWED: Immediately call a POISON CENTER or doctor/physician.IF ON SKIN (or hair): Remove/Take off immediately all contaminated clothing. Rinse skin with water/shower.IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing.Remove/Take off immediately all contaminated clothing.Store locked up.Dispose of contents/container in accordance with local/regional/national/international regulations.