This is a small PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system. The equipment consists of a 500W RF plasma generator, a open-type tube furnace that the diameter is 50mm(with a vacuum flange and connecting pipe), and a direct connection double rotary mechanical pump. So this set of device models can be updated to different PECVD systems. This system is ideal for the material exploration under a limited budget.

1)Lower temperature processing compared to conventional CVD.

2)Film stress can be controlled by high/low frequency mixing techniques.