Learn More about FIB-SEM Upgrades

And their Benefits for Your Processes

Other Upgrades

Scanning Electron Microscopy

X-ray Microscopy

Detectors & Analytics

Analyze your sample through a wide range of different detectors. Different detectors allow you to receive various types of information about the surface, composition and other details which will help you to improve and ease your processes.

aSTEM Detector

Get Maximum Information Thanks to Optimized Annular Design

Add transmitted electron imaging capability to your FE-SEM or Crossbeam system. Get additional information out of your ultrathin biological or solid-state specimens without need to use a dedicated Transmission Electron Microscope and enjoy flexibility and versatility.

The Energy selective Backscattered (EsB) Detector is suitable for clear compositional contrast. It is an annular shaped incolumn detector that is located above the In-lens detector. The ability to detect BSE makes sub-surface information and nano-scale composition visible.

Get Detailed and Rich Information by Detecting Secondary Electrons and Ions

The Secondary Electrons Secondary Ions (SESI) Detector is a new type of detector available for Crossbeam workstations. This detector allows the acquisition of FIB secondary ion images or electron images.

The BSD4 detector is used to detect backscattered electrons that have been scattered under very low angles. The COMPO-Mode is suitable to produce high quality material contrast, meaning heavy materials are displayed brighter than lightweight materials.

Focused Ion Beam (FIB) / Gas Injection System (GIS)

Get more information about the Focused Ion Beam (FIB) and benefit from full sputtering capability and micro- and nano-machining tool functionality. The Gas Injection System (GIS) allows you a deposition of various materials on the specimen. Use the FIB-SIMS to analyze the composition of solid surfaces and thin films and receive detailed information through in-situ lamella viewing with the Micromanipulator.

FIB Column

Upgrade to a Crossbeam Workstation – Enables Micro- and Nano-Structuring with a FIB Column

Combine imaging and analytical performance of your Gemini column with the ability of a next generation Focused Ion Beam (FIB). Benefit from full sputtering capability and micro- and nano-machining tool functionality of a FIB upgrade.

ZEISS UniGIS (GIS = Gas Injection System) is a new single gas injection system used for ion or electron beam induced deposition (IBID /EBID) of precursors such as platinum, tungsten or carbon with ZEISS FIB-SEM systems.

Nanostructuring & Patterning

Create structures in nanometer range by either removing or applying surface material and using different systems (e.g. Atomic Force Microscope), or benefit from multi-modal images and comprehensive multiscale with the various options of ZEISS Atlas 5.

Other Accessories

Upgrade your microscope with additional accessories such as sample holders, the latest version of our dual joystick controller and control panel or an Uninterruptible Power Supply (UPS) which ensures the safety of your system in case of a power failure.

Uninterruptible Power Supply

Secure Your Microscope in Case of a Power Failure and Prevent Data Loss

An Uninterruptable Power Supply (UPS) will be used if there is no steady supply of electrical power possible. It is designed to bridge short power failures and to shut down the microscope in a controlled manner during longer power failures.

With the Dual Joystick Controller and the Control Panel installed, operating becomes much more comfortable. The Dual Joystick Controller can be used for stage control and specimen navigation and the Control Panel gives you easy access to the most frequently used functions of the SEM.

With Shuttle & Find you connect your electron microscope and light microscope from ZEISS. The combined hardware and software solution enables you to transfer your specimen from one microscope system to another within just minutes.

Vacuum & Ease of Use

Increase your convenience and facilitate your work routine e.g. reduced loading time and increased sample throughput through the Airlock or a significantly reduced noise level through the Vac Quiet Mode. Decontaminate your specimen and chamber with the Plasma Cleaner or improve image quality through the compensation of charging effect with the Flood Gun or the Charge Compensation.

Airlock

Reduce Loading Time – Increase Sample Throughput

The airlock allows efficient loading of samples without breaking the existing vacuum and thus reducing the risk of contamination of the sample chamber. By using this method sample exchange time is also significantly reduced.

The Charge Compensation system offers localized discharging of non-conductive specimens by ionization of nitrogen. High resolution combined with an additional expansion of analytical capabilities are, with the integration of a Charge Compensation system, not restricted to conductive samples only but can also be executed for all kinds of non-conductive samples.

The Flood Gun is an enhanced device for charge neutralization on positive charged insulator or semiconductor specimens. It provides a steady flow of low-energy electrons to discharge an area on the sample where the focused ion beam has left a net positive charge.

ZEISS offers you a fast and cost-efficient solution for specimen and chamber decontamination. A Plasma Cleaner is used to generate reactive gas-phase radicals in a plasma. The radicals migrate into the instrument chamber and chemically react with the unwanted hydrocarbons.

By using Vac Quiet Mode and with help from a vacuum reservoir the pre-pump is automatically switched off after reaching a factory pre-set vacuum level. The vacuum reservoir allows the system to be operated for hours without the need of the pre-pump. This results in both the reduction of noise levels and energy consumption.

Not all products are available in every country. Use of products for medical diagnostic, therapeutic or treatment purposes may be limited by local regulations. Contact your local ZEISS provider for more information.

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