Samples in periodicals archive:

4, 2012 /PRNewswire/ -- The Temescal Division of Ferrotec Corporation, a global supplier of materials, components, and precision system solutions and the leading manufacturer of electron beam evaporative coating systems, today announced a major process breakthrough in electron beam metallization for lift-off compound semiconductor applications.

Those steps include measuring the incident electron beam current and voltage, knowing the angle between the electron beam and the sample (takeoff angle), collecting the emitted x rays from the sample, comparing the emitted x-ray flux to known standards (to determine the k-ratio) and transformation of the k-ratio to concentration using algorithms which includes, as a minimum, the atomic number, absorption, and fluorescence corrections.

Starting this fall, researchers will be able to obtain even more detailed information about proton and nuclear structure at the Continuous Electron Beam Accelerator Facility (CEBAF) in Newport News, Va.

a leading supplier of Electron Beam Lithography systems is pleased to announce the delivery and successful installation of the EBPG5000pES Lithography system at the newly established Melbourne Centre for Nanofabrication (MCN) in Australia.