Capabilities for simulation of anisotropic silicon etching are greater than ever. Here are some videos showing the new version of IntelliEtch in action:

Microneedle SEM photos and IntelliEtch simulation

As you can see in the picture, IntelliEtch can be used to model complex structures with multiple wet and dry etching steps using any wafer orientation. The videos are in real time – simulations in the new version run over 100x faster than in the previous version!