16cm High Power RF Ion Source

Veeco announces the 16cm RF High Power (HP) ion source, with beam uniformity of <10% across 120cm. It is ideal for use in reactive processes such as ion assisted e-beam (IAD) or sputter deposition processes.

Supports wide range of high power peration: 200 to 1500eV and 200 to >1000mA

Reliable, uniform operation in both inert and oxidizing environments

Increased power and current uniformity facilitates improved packing densities and increased oxidation rates