Shin-Etsu joins Sematech's 22-nm resist program

MANHASSET, NY Shin-Etsu Chemical Co. Ltd has joined Sematech's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering's (CNSE) Albany NanoTech Complex.

Shin-Etsu, one of the world's largest suppliers of semiconductor materials, will team with researchers at Sematech to develop and demonstrate advanced EUV photoresist for use at the 22 nm node and beyond.

"The cutting-edge research and development that is necessary for the commercialization of EUVL technology will be further enhanced by the addition of Shin-Etsu," said Richard Brilla, CNSE Vice President for Strategy, Alliances and Consortia, in a statement.

Sematech's RMDC will provide access to two micro-exposure tools (METs) located at the University at Albany's College of Nanoscale Science and Engineering and University of California at Berkeley, as well as several metrology tools.