Abstract

A way of influencing growth of siliconfilms by magnetic field is demonstrated. Permanent magnet(s) placed under the substrate influenced the discharge in a mixture of silane and hydrogen and led to formation of microcrystalline regions in otherwise amorphous film. The pattern of microcrystalline regions varied with the orientation of the magnetic field. Microscopic study by atomic force microscopy and by micro-Raman spectroscopy revealed that the microcrystalline regions resulted from a higher density of crystalline grain nuclei, increased at the locations where the magnetron effect could be expected. This phenomenon could be used to study the transition between amorphous and microcrystalline growth. Moreover, we suggest it as a kind of “magnetic lithography” for the preparation of predefined microcrystalline patterns in otherwise amorphous siliconfilms.

Received 13 January 2005Accepted 31 May 2005Published online 27 June 2005

Acknowledgments:

The authors would like to thank I. Gregora for help with Raman spectra measurements and J. Valter for fruitful discussions. This research was supported by AV0Z 10100521, VaV∕300∕01∕03, VaV SN∕172∕05, GAAV IAA1010316, IAA1010413, and GA ČR 202∕05∕H003 projects.