WarningYour internet explorer is in compatibility mode and may not be displaying the website correctly.
You can fix this by pressing 'F12' on your keyboard, Selecting 'Document Mode' and choosing 'standards' (or the latest version
listed if standards is not an option).

Laser Heating of a Silicon Wafer

Model ID: 13835

A silicon wafer is heated up by a laser that moves radially in and out over time. In addition, the wafer itself is rotated on its stage. The incident heat flux from the laser is modeled as a spatially distributed heat source on the surface. The transient thermal response of the wafer is shown. The peak, average, and minimum temperature during the heating process is computed, as well as the temperature variations across the wafer.