Abstract

We report the use of an amplified femtosecond laser for single-shot two-photon
exposure of the commercial photoresist SU-8. By scanning of the focal volume
through the interior of the resist, three-dimensional (3-D) structures are
fabricated on a shot-by-shot basis. The 800-nm two-photon exposure and damage
thresholds are 3.2 and 8.1TW/cm2, respectively. The nonlinear nature of the two-photon process allows
the production of features that are smaller than the diffraction limit. Preliminary
results suggest that Ti:sapphire oscillators can achieve single-shot
two-photon exposure with thresholds as low as 1.6TW/cm2 at 700 nm, allowing 3-D structures to be constructed
at megahertz repetition rates.

References

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