Abstract:

We show that nanoimprint lithography combined with electron-beam evaporation provides a cost-efficient, rapid, and reproducible method to fabricate conical nanostructures with very sharp tips on flat surfaces in high volumes. We demonstrate the method by preparing a wafer-scale array of gold nanocones with an average tip radius of 5 nm. Strong local fields at the tips enhance the second-harmonic generation by over 2 orders of magnitude compared with a nonsharp reference.

Copyright:This publication is copyrighted. You may download, display and print it for Your own personal use. Commercial use is prohibited.

Description:This paper was published in Optics Letters and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-34-13-1979. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.