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Abstract:

An in-cell touch-sensitive panel includes TFT and CF substrates. The TFT
substrate includes a net-shaped readout circuit and conductive pads
arranged in array manner. The net-shaped readout circuit includes
widthwise and lengthwise readout lines. The widthwise readout lines are
electrically connected to the lengthwise readout lines. The conductive
pads are electrically connected to the net-shaped readout circuit.
Spacers are adapted to keep a first gap between the TFT and CF
substrates. Protrudent portions are arranged to be corresponding to the
conductive pads, and there is a second gap between the protrudent portion
and the conductive pad. A transparent electrode covers the spacers and
the protrudent portion.

Claims:

1. An in-cell touch-sensitive panel comprising:a thin film transistor
(TFT) substrate comprising:a net-shaped readout circuit comprising a
plurality of widthwise and lengthwise readout lines, wherein the
widthwise readout lines are electrically connected to the lengthwise
readout lines; anda plurality of conductive pads arranged in array manner
and electrically connected to the net-shaped readout circuit; anda color
filter (CF) substrate opposite to the TFT substrate and comprising:a
plurality of spacers adapted to keep a first gap between the TFT and CF
substrates:a plurality of protrudent portions corresponding to the
conductive pads, wherein there is a second gap between the protrudent
portion and the conductive pad; anda transparent electrode adapted to
cover the spacers and the protrudent portion.

2. The in-cell touch-sensitive panel as claimed in claim 1, wherein the
net-shaped readout circuit further comprises a plurality of connections
constituted by crosses of the widthwise and lengthwise readout lines, and
the conductive pads are adjacent to the connections respectively.

3. The in-cell touch-sensitive panel as claimed in claim 1, further
comprising:a plurality of scan lines and data lines, wherein the
widthwise readout lines are parallel to the scan lines, and the
lengthwise readout lines are parallel to the data lines.

4. The in-cell touch-sensitive panel as claimed in claim 3, wherein the
widthwise readout lines and the scan lines are located the same level,
and the lengthwise readout lines and the data lines are located the same
level.

5. The in-cell touch-sensitive panel as claimed in claim 4, further
comprising:a plurality of plated through holes adapted to electrically
connected the conductive pads to the net-shaped readout circuit.

6. The in-cell touch-sensitive panel as claimed in claim 5, further
comprising:a plurality of metallic extension layers adapted to be
electrically connected to the plated through holes.

7. The in-cell touch-sensitive panel as claimed in claim 6, wherein the
metallic extension layers are made of transparent metal.

8. The in-cell touch-sensitive panel as claimed in claim 3, further
comprising:a first transparent substrate, wherein the widthwise and
lengthwise readout lines are located between the scan lines and the first
transparent substrate.

9. The in-cell touch-sensitive panel as claimed in claim 8, further
comprising:a plurality of plated through holes adapted to electrically
connected the conductive pads to the net-shaped readout circuit.

10. The in-cell touch-sensitive panel as claimed in claim 1, further
comprising:a plurality of pixel electrodes, wherein the widthwise readout
lines and the lengthwise readout lines are located on the same level.

11. The in-cell touch-sensitive panel as claimed in claim 10, wherein the
conductive pads are directly electrically connected to the net-shaped
readout circuit.

12. The in-cell touch-sensitive panel as claimed in claim 11, wherein
conductive pads are directly disposed at connections between the
widthwise readout lines and the lengthwise readout lines.

13. The in-cell touch-sensitive panel as claimed in claim 2, wherein the
net-shaped readout circuit is net-shaped readout metallic lines, and the
widthwise readout line and the lengthwise readout line are metallic
lines.

14. The in-cell touch-sensitive panel as claimed in claim 1, wherein the
CF substrate further comprises:a second transparent substrate;a plurality
of black matrixes disposed on the second transparent substrate; anda
plurality of color filters disposed on the second transparent substrate
and the black matrixes, wherein the color filter located on the black
matrix is formed to a protrusion;wherein:the spacers are disposed on the
protrusions of the color filter,the protrudent portions are disposed on
the black matrixes, andthe transparent electrode also covers the second
transparent substrate, the black matrixes and the color filters.

15. The in-cell touch-sensitive panel as claimed in claim 14, wherein the
spacers and the protrudent portions are made by the same material.

16. The in-cell touch-sensitive panel as claimed in claim 15, wherein the
protrudent portions are made of nonconductive material.

17. The in-cell touch-sensitive panel as claimed in claim 14, wherein
there is a height difference defined between top surfaces of the spacers
and top surfaces of the protrudent portions.

18. The in-cell touch-sensitive panel as claimed in claim 8, wherein the
TFT substrate further comprises a pad layer, which is formed between the
first transparent substrate and the spacers.

19. A method for calculating a coordinate of a touch position of an
in-cell touch-sensitive panel comprising the following steps of:providing
a TFT substrate, wherein the TFT substrate comprises a net-shaped readout
circuit and a plurality of conductive pads arranged in array manner, the
net-shaped readout circuit comprises a plurality of widthwise readout
lines, lengthwise readout lines and connections constituted by crosses of
the widthwise readout lines and the lengthwise readout lines, and the
conductive pads are electrically connected to the net-shaped readout
circuit;providing a CF substrate, wherein the CF substrate is opposite to
the TFT substrate, the CF substrate comprises a plurality of spacers, a
plurality of protrudent portions and a transparent electrode, the spacers
are adapted to keep the first predetermined gap between the TFT substrate
and the CF substrate, there is the second predetermined gap between each
protrudent portion and the corresponding conductive pad, and the
transparent electrode covers the spacers and the protrudent
portions;electrically contacting the transparent electrode located on the
protrudent portion with the corresponding conductive pad according to a
touch position, wherein the touch position divides the widthwise readout
lines into the first and second widthwise resistance lines, and divides
the lengthwise readout lines into the first and second lengthwise
resistance lines; andcalculating a coordinate of the touch position by
voltages of the divided resistance lines being proportional to lengths of
the divided resistance lines.

Description:

[0001]This application claims the priority benefit of Taiwan Patent
Application Serial Number 098104590, filed on Feb. 13, 2009, the full
disclosure of which is incorporated herein by reference.

TECHNICAL FIELD

[0002]The invention is related to a method for calculating a coordinate of
a touch position of a touch-sensitive LCD panel, and more particularly to
a touch-sensitive LCD panel, wherein the relative circuit of the
touch-sensitive functions is designed in the touch-sensitive LCD panel.

BACKGROUND

[0003]It is important to apply touch-sensitive technology to a liquid
crystal display (LCD) panel. Recently, a touch-sensitive panel (e.g.
resistance type, capacity type, infrared ray type or surface acoustic
wave type touch-sensitive panel) is generally extra attached on the LCD
panel to order to realize touch-sensitive function. Referring to FIG. 1,
a resistance type touch-sensitive panel 50 is widely applied to various
terminal products because of simple manufacture processes and low cost.
According to the resistance type touch-sensitive panel 50, the touch
position can be certainly determined by using a plurality of conductive
lines (e.g. four or five conductive lines), measuring a variation in
voltage of conductive lines, and calculating the touch position. However,
the extra attached touch-sensitive panel will result in the optical loss
and relative characteristic loss of the LCD panel.

[0004]In order to solve the above-mentioned problem, an in-cell
touch-sensitive panel is developed recently. In other words, relative
circuit of the touch-sensitive functions is designed in the LCD panel.
When the touch-sensitive LCD panel is manufactured, the circuit of the
touch-sensitive function can be finished simultaneously. Such
touch-sensitive LCD panel has no optical loss, but has touch-sensitive
function.

[0005]For example, referring to FIG. 2, U.S. Patent Publication Number
2008/0122800 A1, entitled "Touch-sensitive Liquid Crystal Display Panel
With Built-in Touch Mechanism And Method For Driving Same," discloses
that a touch-sensitive liquid crystal display (LCD) panel 10 includes a
first substrate 20, a second substrate 30 and a liquid crystal (LC) layer
40. The second substrate 30 is opposite to the first substrate 20. The
liquid crystal layer 40 is disposed between the first substrate 20 and
the second substrate 30. An electrode layer 24 is formed on the first
substrate 20, and includes a plurality of scan and data lines. The scan
and data lines cross each other, thereby defining a plurality of pixel
regions. A plurality of conductive pads 22 are arranged to be
corresponding to and electrically connected to the scan lines of the
electrode layer 24. A conductive layer 32 is disposed between the second
substrate 30 and the LC layer 40. A plurality of conductive protrusions
34 are located on the conductive layer 32, and there is a predetermined
gap between each of the conductive protrusions 34 and a corresponding
conductive pad 22.

[0006]The first substrate 20 belongs to a thin film transistor (TFT)
substrate 12 which utilizes the scan lines to calculate a coordinate of
touch position. However, scan signals of the scan lines are possibly
disturbed accordingly. Furthermore, the second substrate 30 belongs to a
color filter (CF) substrate 14 which already includes a transparent
electrode 38. However, the conductive layer 32 and a flat insulating
layer 36 must be extra added so as to increase manufacture cost and time.
In addition, a plurality of spacers 42 are adapted to keep a
predetermined gap between the TFT substrate 12 and the CF substrate 14
for accommodating the LC layer 40. However, the spacers 42 and the
conductive protrusions 34 must be finished by different manufacture
processes so as to also increase manufacture time.

[0007]Accordingly, there exists a need for a touch-sensitive LCD panel
capable of solving the above-mentioned problems.

SUMMARY

[0008]The present invention provides an in-cell touch-sensitive panel
includes TFT and CF substrates. The TFT substrate includes a net-shaped
readout circuit and a plurality of conductive pads arranged in array
manner. The net-shaped readout circuit includes a plurality of widthwise
and lengthwise readout lines, wherein the widthwise readout lines are
electrically connected to the lengthwise readout lines. The conductive
pads are electrically connected to the net-shaped readout circuit. The CF
substrate includes a plurality of spacers, a plurality of protrudent
portions and a transparent electrode. The spacers are adapted to keep a
first gap between the TFT and CF substrates. The protrudent portions are
arranged to be corresponding to the conductive pads, and there is a
second gap between the protrudent portion and the conductive pad. The
transparent electrode covers the spacers and the protrudent portions.

[0009]The relative circuit of the touch-sensitive functions is designed in
the touch-sensitive LCD panel of the present invention. When the
touch-sensitive LCD panel is manufactured, the circuit of the
touch-sensitive function can be finished simultaneously. The
touch-sensitive LCD panel of the present invention has no optical loss,
but has touch-sensitive function. Furthermore, it is not necessary to
extra add a conventional conductive layer and a conventional flat
insulating layer so as not to increase manufacture cost and time. In
addition, the spacers and the protrudent portions can be made by the same
material and by the same manufacture processes so as not to also increase
manufacture time.

[0010]The foregoing, as well as additional objects, features and
advantages of the invention will be more apparent from the following
detailed description, which proceeds with reference to the accompanying
drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

[0011]Embodiments of the present invention are illustrated by way of
example, and not by limitation, in the figures of the accompanying
drawings, wherein elements having the same reference numeral designations
represent like elements throughout and wherein:

[0012]FIG. 1 is perspective and enlarged cross-sectional views of a
resistance type touch-sensitive panel in the prior art;

[0013]FIG. 2 is a cross-sectional view of a touch-sensitive LCD panel in
the prior art;

[0014]FIG. 3 is a cross-sectional view of a touch-sensitive LCD panel
according to an embodiment of the present invention;

[0015]FIG. 3a is a cross-sectional view of a touch-sensitive LCD panel
according to another embodiment of the present invention;

[0016]FIG. 4 is an exploded perspective view of the touch-sensitive LCD
panel according to the embodiment of the present invention;

[0017]FIGS. 5 and 6 show that the voltage Vx and Vy of the
touch-sensitive LCD panel are measured according to the embodiment of the
present invention;

[0018]FIG. 7 shows that the voltage Vx and Vy of the
touch-sensitive LCD panel are calculated according to the embodiment of
the present invention;

[0019]FIG. 8 is a partial plan view of a TFT substrate according to the
embodiment of the present invention;

[0020]FIG. 9 is a partial plan view of a TFT substrate according to an
alternative embodiment of the present invention;

[0021]FIG. 10 is a partial plan view of a TFT substrate according to
another embodiment of the present invention;

[0022]FIG. 11 is a partial plan view of a TFT substrate according to a
further embodiment of the present invention;

[0023]FIG. 12 is a partial cross-sectional view of a TFT substrate
according to a further embodiment of the present invention;

[0024]FIG. 13 is a flow diagram showing a method for calculating a
coordinate of a touch position according to an embodiment of the present
invention;

[0025]FIG. 14 is a flow diagram showing a method for manufacturing a TFT
substrate according to an embodiment of the present invention; and

[0026]FIG. 15 is a flow diagram showing a method for manufacturing a CF
substrate according to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

[0027]Referring to FIG. 3, it depicts a touch-sensitive liquid crystal
display (LCD) panel 100, e.g. an in-cell touch-sensitive panel. The
touch-sensitive LCD panel 100 includes a thin film transistor (TFT)
substrate 112, a color filter (CF) substrate 114 and a liquid crystal
(LC) layer 140. The liquid crystal layer 140 is disposed between the TFT
substrate 112 and the CF substrate 114. The TFT substrate 112 includes a
transparent substrate 120, an electrode layer 124, a net-shaped readout
circuit (e.g. a net-shaped metallic lines 125) and a first insulating
layer 126. The electrode layer 124 is formed above the transparent
substrate 120. The net-shaped metallic lines 125 are also formed above
the transparent substrate 120. The first insulating layer 126 is adapted
to cover the electrode layer 124 and the first insulating layer 126.

[0028]Referring to FIG. 4, the net-shaped metallic lines 125 includes M
widthwise readout lines (e.g. widthwise metallic lines 152) and N
lengthwise readout lines (e.g. lengthwise metallic lines 154), wherein M
and N are integers and more than two. The widthwise metallic lines 152
are electrically connected to the lengthwise metallic lines 154. In this
embodiment, the widthwise metallic lines 152 and the lengthwise metallic
lines 154 can have M×N-4 connections 156 arranged in array manner.
In other words, the widthwise metallic lines 152 and the lengthwise
metallic lines 154 can have no connection arranged at corners of the
net-shaped metallic lines 125. In another embodiment, the widthwise
metallic lines 152 and the lengthwise metallic lines 154 can also have
M×N connections 156 arranged in array manner. A plurality of
conductive pads 158 arranged in array manner are electrically connected
to the net-shaped metallic lines 125, and arranged to be adjacent to the
connections 156.

[0029]Referring to FIG. 3 again, in this embodiment, the CF substrate 114
is opposite to the TFT substrate 112 and includes a transparent substrate
130, a plurality of black matrixes 137, a plurality of color filters 135,
a plurality of spacers 142, a plurality of protrudent portions 134 and a
transparent electrode 138. The black matrixes 137 are disposed on the
transparent substrate 130. The color filters 135 are disposed on the
transparent substrate 130 and the black matrixes 137, wherein the color
filter 135 located on the black matrix 137 is formed to a protrusion 139.
The spacers 142 are disposed on the protrusions 139 of the color filter
135 for keep the first pre-determined gap G1 between the TFT substrate
112 and the CF substrate 114. The protrudent portions 134 are disposed on
the black matrixes 137, wherein there is a height difference H defined
between top surfaces 142a of the spacers 142 and top surfaces 134a of the
protrudent portions 134. The spacers 142 and the protrudent portions 134
can be made of same material by same manufacturing processes. The
protrudent portions 134 are corresponding to the conductive pads 158, and
there is the second gap G2 located between the protrudent portions 134
and the conductive pads 158. The protrudent portions 134 are made of
nonconductive material. The transparent electrode 138 covers the
transparent substrate 130, the black matrixes 137, the color filters 135,
the spacers 142 and the protrudent portions 134. In addition, the
arrangement density of the conductive pads 158 depends on design
requirement, and further the arrangement density of the protrudent
portions 134 are corresponding to that of the conductive pads 158.
However, it is not necessary that the arrangement density of the spacers
142 is corresponding to that of the conductive pads 158. Thus, some of
the spacers 142 are adjacent to the protrudent portions 134, and it is
not necessary that the others of the spacers 142 are adjacent to the
protrudent portions 134.

[0030]Referring to FIG. 3a, in another embodiment, the TFT substrate 112
further includes a pad layer 143, which is formed between the transparent
substrate 120 and the spacers 142. The pad layer 143 is simultaneously
formed during the manufacturing processes of scan lines and data lines.
The pad layer 143 causes the spacers 142 to increase the gap between the
TFT substrate 112 and the CF substrate 114 to be G1', and increases the
gap between the protrudent portions 134 and the conductive pads 158 to be
G2'. In other words, the gap between the protrudent portions 134 and the
conductive pads 158 can be adjusted by the thickness of the pad layer 143
so as to fulfill the best touch-sensitive effect.

[0031]Referring to FIGS. 5 and 6, in this embodiment, the transparent
electrode 138 of the CF substrate 114 and the net-shaped metallic lines
125 of the TFT substrate 112 are considered as upper conductive layer 104
and lower conductive layer 102 of a resistance type touch-sensitive
panel. The principle of the resistance type touch-sensitive panel is that
the lower conductive layer 102 controls two conductive lines parallel to
X axis and two conductive lines parallel to Y axis (i.e. four metallic
lines 102a, 102b, 102c, 102d located around the lower conductive layer
102), and the upper conductive layer 104 responsibly transmits the
voltage Vx of X-axis and the voltage Vy of Y-axis during
touching. In this embodiment, the transparent electrode 138 is an uniform
conductive layer, and thus the transparent electrode 138 can responsibly
transmit the voltage when the transparent electrode 138 located on each
of the protrudent portions 134 is contacted with the conductive pad 158
of the net-shaped metallic lines 125. Referring to FIG. 7, the touch
position divides the lengthwise metallic lines into the first and second
resistance lines (the first resistance line has the first resistance
R1, and the second resistance line has the second resistance
R2), and divides the widthwise metallic lines into the third and
fourth resistance lines (the third resistance line has the first
resistance R3, and the fourth resistance line has the fourth
resistance R4). The voltages of divided resistance lines are
proportional to resistance, and are shown in the following equations:

Vx=V×R3/(R3+R4)

Vy=V×R1/(R1+R2)

Wherein V, is the voltage of the third widthwise resistance line, Vy
is the voltage of the first lengthwise resistance line, and V is rated
voltage (e.g. 5 volts). If the diameters of the resistance lines are the
same, the voltages of divided resistance lines are proportional to the
lengths of divided resistance lines, thereby calculating a coordinate of
the touch position.

[0032]The relative circuit of the touch-sensitive functions is designed in
the touch-sensitive LCD panel of the present invention. When the
touch-sensitive LCD panel is manufactured, the circuit of the
touch-sensitive function can be finished simultaneously. The
touch-sensitive LCD panel of the present invention has no optical loss,
but has touch-sensitive function. Furthermore, it is not necessary to
extra add a conductive layer and a flat insulating layer so as not to
increase manufacture cost and time. In addition, the spacers and the
protrudent portions can be made by the same material and by the same
manufacture processes so as not to also increase manufacture time.

[0033]Referring to FIG. 8, according the TFT substrate 112 in this
embodiment, the electrode layer 124 can include a plurality of scan lines
162 and data lines 164, which are disposed above the transparent
substrate 120. The scan and data lines 162, 164 cross each other, thereby
defining a plurality of pixel regions 160. The widthwise metallic lines
152 are parallel to the scan lines 162, and the lengthwise metallic lines
154 are parallel to the data lines 164. The widthwise metallic lines 152
and the scan lines 162 are located the same level, and the lengthwise
metallic lines 154 and the data lines 164 are located the same level.
Those skilled in the art understand that a second insulating layer (not
show) is disposed between the scan lines 162 and the data lines 164.
Thus, the second insulating layer is also disposed between the widthwise
metallic lines 152 and the lengthwise metallic lines 154. The conductive
pads 158 are electrically connected to the net-shaped metallic lines 125
by forming a plurality of plated through holes (PTHs) 172, 174 in the
first and second insulating layers and forming a plurality of metallic
extension layers 176 on the first insulating layer. For example, each
conductive pad 158 is electrically connected to the widthwise metallic
line 152 by the metallic extension layer 176 and the PTH 172, and is
electrically connected to the lengthwise metallic line 154 by the
metallic extension layer 176 and the PTH 174. The metallic extension
layers 176 can be made of transparent metal. Or, referring to FIG. 9, in
an alternate embodiment, each conductive pad 158 is directly electrically
connected to the widthwise metallic line 152 and the lengthwise metallic
line 154. In addition, the arrangement density of the widthwise metallic
line 152 and the lengthwise metallic line 154 depends on the requirement,
e.g. one widthwise metallic line 152 and one lengthwise metallic line 154
per one, four or nine pixels 160 are arranged.

[0034]Referring to FIG. 10, according to the TFT substrate 112 in another
embodiment, the electrode layer 124 can also include a plurality of scan
lines 162 and data lines 164, which are disposed above the transparent
substrate 120. The widthwise metallic lines 152 and the lengthwise
metallic lines 154 are located above the scan lines 162. Those skilled in
the art understand that a third insulating layer (not show) is disposed
between the scan lines 162 and the data lines 164. The conductive pads
158 are electrically connected to the net-shaped metallic lines 125 by
forming a plurality of plated through holes (PTHs) 182 in the third
insulating layer. For example, each conductive pad 158 is directly
electrically connected to a connection between the widthwise metallic
line 152 and the lengthwise metallic line 154 by the single PTH 182.

[0035]Referring to FIG. 11, according to the TFT substrate 112 in a
further embodiment, the electrode layer 124 can include a plurality of
pixel electrodes 166, which are disposed above the transparent substrate
120. Referring to FIG. 12, the widthwise metallic lines 152 and the
lengthwise metallic lines 154 are located on the same level, and are
exposed from the first insulating layer. Thus, the conductive pads 158
can be directly electrically connected to the net-shaped metallic lines
125 without any PTH. For example, each conductive pad 158 is directly
disposed at a connection between the widthwise metallic line 152 and the
lengthwise metallic line 154.

[0036]Referring to FIG. 13, it depicts a method for calculating a
coordinate of a touch position of a touch-sensitive LCD panel according
to an embodiment of the present invention. In step 200, a TFT substrate
is provided, wherein the TFT substrate includes a net-shaped metallic
lines and a plurality of conductive pads, and conductive pads are
arranged in array manner. The net-shaped metallic lines include a
plurality of widthwise metallic lines, lengthwise metallic lines and
connections constituted by crosses of the widthwise metallic lines and
the lengthwise metallic lines. The conductive pads are electrically
connected to the net-shaped metallic lines. In step 202, a CF substrate
is provided, and is opposite to the TFT substrate. The CF substrate
includes a plurality of spacers, a plurality of protrudent portions and a
transparent electrode, wherein the spacers are adapted to keep the first
predetermined gap between the TFT substrate and the CF substrate, there
is the second predetermined gap between each protrudent portion and the
corresponding conductive pad, and the transparent electrode covers the
spacers and the protrudent portions. In step 204, the transparent
electrode located on the protrudent portion is electrically contacted
with the corresponding conductive pad according to a touch position,
wherein the touch position divides the widthwise metallic lines to the
first and second widthwise resistance lines, and divides the lengthwise
metallic lines into the first and second lengthwise resistance lines. In
step 206, a coordinate of the touch position is calculated by voltages of
the divided resistance lines (e.g. the first and second widthwise
resistance lines and the first and second lengthwise resistance lines) of
the net-shaped metallic lines being proportional to lengths of the
divided resistance lines.

[0037]Referring to FIG. 14, it depicts a method for manufacturing a TFT
substrate according to an embodiment of the present invention. In step
300, a transparent substrate is provided. In step 302, net-shaped
metallic lines are formed on the transparent substrate, wherein the
net-shaped metallic lines include a plurality of widthwise metallic
lines, lengthwise metallic lines and connections constituted by crosses
of the widthwise metallic lines and the lengthwise metallic lines. In
step 304, a plurality of conductive pads are formed, wherein the
conductive pads are arranged in array manner and are electrically
connected to the net-shaped metallic lines.

[0038]Referring to FIGS. 8 and 9 again, the method for manufacturing a TFT
substrate in this embodiment of the present invention further includes
the following step of: forming a plurality of scan lines 162 and data
lines 164 on the transparent substrate 120, wherein the widthwise
metallic lines 152 and the scan lines 162 are simultaneously formed by
the same photolithography & etching processes, and the lengthwise
metallic lines 154 and the data lines 164 are simultaneously formed by
the same photolithography & etching processes.

[0039]Referring to FIG. 10 again, a method for manufacturing a TFT
substrate in another embodiment of the present invention further includes
the following step of: forming a plurality of scan lines 162 and data
lines 164 on the transparent substrate 120, wherein formation steps of
the widthwise metallic lines 152 and the lengthwise metallic lines 154
are earlier than a formation step of the scan lines 162.

[0040]Referring to FIG. 11, a method for manufacturing a TFT substrate in
a further embodiment of the present invention further includes the
following step of: forming a plurality of pixel electrode 166 on the
transparent substrate 120, wherein the widthwise and lengthwise metallic
lines 152, 154 and the pixel electrodes 166 are simultaneously formed by
the same photolithography & etching processes.

[0041]Referring to FIG. 15, it depicts a method for manufacturing a CF
substrate according to an embodiment of the present invention. In step
400, a transparent substrate. In step 402, a plurality of black matrixes
are formed on the transparent substrate. In step 404, a plurality of
color filters are formed on the transparent substrate and the black
matrixes, wherein the color filter located on the black is formed to a
protrusion. In step 406, by the same formation step, a plurality of
spacers are formed on the protrusions of the color filters, and a
plurality of protrudent portions are simultaneously formed on the black
matrixes. In step 408, a transparent electrode is formed for covering the
transparent substrate, the black matrixes, the color filters, the spacer
and the protrudent portions.

[0042]Although the invention has been explained in relation to its
preferred embodiment, it is not used to limit the invention. It is to be
understood that any other possible modifications and variations can be
made by those skilled in the art without departing from the spirit and
scope of the invention as hereinafter claimed.