material acting as an opaque (nontransparent to UV radiation) part of the masks used in photolithography; inferior to chrome, used for the same purpose, due to lower optical density (thicker film needed to block off UV radiation) grainy structure (not as sharp edges as in the case of chrome) and softness making it vulnerable to mechanical damage.

photoemulsion mask

mask used in photolithography which uses thin fim of photoemulsion as an opaque material.

Term (Index)

Definition

photoemulsion mask

mask used in photolithography which uses thin fim of photoemulsion as an opaque material.

material acting as an opaque (nontransparent to UV radiation) part of the masks used in photolithography; inferior to chrome, used for the same purpose, due to lower optical density (thicker film needed to block off UV radiation) grainy structure (not as sharp edges as in the case of chrome) and softness making it vulnerable to mechanical damage.