From gsosa at stanford.edu Thu Feb 26 15:31:38 2009
From: gsosa at stanford.edu (Gary J Sosa)
Date: Thu, 26 Feb 2009 15:31:38 -0800 (PST)
Subject: Mask Cleaner is back up! 2/26/09
Message-ID: <1376184464.178511235691098506.JavaMail.root@zm08.stanford.edu>
Hi All....
This note is to let you know that the mask cleaner is back up and running. Please let us know if you have any problems with it.
Thanks... Gary
From ahryciw at stanford.edu Sat Feb 28 12:11:36 2009
From: ahryciw at stanford.edu (Aaron Hryciw)
Date: Sat, 28 Feb 2009 12:11:36 -0800
Subject: Mylar masks on karlsuss?
Message-ID: <4d36fb940902281211m78ab0fafj1199a4d664f76f9f@mail.gmail.com>
Hi ?
I need to expose some large (10s to 100s of um) features on an SOI piece
fairly quickly. The SNF maskmaking page mentions the possibility of using
mylar transparency masks for quick turnaround on designs with non-critical
features, but I can't seem to find which exposure tools can use such masks.
Is this possible on karlsuss? If so, if anyone could point me to some more
info (or offer personal advice) about making transparency masks for karlsuss
in particular, I would be very grateful!
Cheers!
? Aaron
--
Dr. Aaron Hryciw
Postdoctoral Scholar
Geballe Laboratory for Advanced Materials
Stanford University
476 Lomita Mall (04-490)
McCullough Building, Rm. 325
Stanford, CA 94305-4045
Tel.: (650) 723-5840
Fax.: (650) 736-1984
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