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RETAINING RING FOR CMP
A retaining ring includes a generally annular body having an inner
surface to constrain a substrate and a bottom surface, the bottom surface
having a plurality...

2018/0021917

POLISHING METHOD AND POLISHING APPARATUS
A polishing method and a polishing apparatus which can increase a
polishing rate and can control a polishing profile of a substrate being
polished by adjusting...

2018/0021916

SURFACE FINISHING ASSEMBLY
A honing assembly, a sanding assembly and a turning machine for
performing an operation on a workpiece. The turning machine may include a
rotatable machine...