Photolithography

Providing prototyping facilities and services to developers of photonics integrated circuits. The group specialises in photolithography foundry services including photomask production and direct laser writing of optical materials.

Services offered include provision of external access to:

direct-write photolithography using a Heidelberg Instruments DWL 200, a proven quality manufacturing tool used worldwide for mask making and direct writing. The facility produces structures with a resolution down to 0.4 µm in its class 100 clean room.

High Resolution optical lithography with a new ASML i-line stepper system.