Process control is essential in industrial plasma applications to ensure reliability and high quality of the process. Here, optical emission spectroscopy (OES) is a first choice technique since it does not affect the plasma and since real-time monitoring of several plasma species is possible. Our PLASUS EMICON systems come with all the features you need to analyze, optimize and control your plasma application.

System Features:

Real time monitoring of plasma emissionLight emission from process relevant plasma particles is observed and tracked in real time. This allows a continuous monitoring of plasma conditions and changes are realized instantaneously.

Process optimizationReal-time monitoring gives the capability to optimize the plasma process by taking advantage of the instant system response on parameter changes.

Process controlAnalog and digital outputs and inputs are available to install open and closed loop control functions. This feature can be used, for example, for end-point detection or for monitoring deviations from standard plasma process conditions. The integrated digital PID control function gives direct access to applications where closed loop control is necessary such as gas flow control or power control in reactive sputtering applications.

Multi-channel systemThe EMICON MC systems are available with up to 8 independent spectrometer channels. This enables e.g. multi-chamber process control or spatial resolved gas flow control in reactive sputtering applications.

Easy set-up for industrial environmentsAll parts of the system are designed to work in industrial conditions. The USB 2.0 connectivity to the PC makes the system the first choice for mobile use at different application.

Type seriesThere are two EMICON series which satisfy different application types:EMICON MC: multi-channel standard system for plasma monitoring and process control.EMICON HR: spectral high-resolution system for detailed plasma analysis and plasma monitoring.