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Calibre Advanced Topics: Double Patterning

Starting with the 20nm processing node, the use of two masks to print a single layer becomes a requirement because of lithography issues. This course will help you understand the impact of double patterning on your designs and how to use Calibre to find and fix layout problems associated with this approach.
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Classroom

Classroom Training

Full instructor-led courses in a Mentor training facility, with complete course materials and access to classroom computers.

Course Highlights

Foundries have already modified their rule decks to support the use of double patterning and will require all 20nm (and smaller) customers to use this technique. There are many implications for chip designers and CAD support teams when double patterning is employed. This course will help users understand those implications and show them how to create designs that are compatible with double patterning using foundry-provided rule decks and Calibre.

You will learn how to:

Explain the need for double patterning

Describe the various techniques employed to compensate for double patterning implications