tag: Sii NanoTechnology

Photomask complexity and costs are increasing at each node, thereby creating a number of challenges on several fronts.
On one front, for example, traditional single-beam e-beam tools are struggling to keep up with mask complexity. As a result, the write times and costs continue to rise. Mask complexity also impacts the other parts of the tool flow, such as inspection, metrology and repair. I... » read more

By Mark LaPedus
For years, the biggest challenges in photomask manufacturing have revolved around the slow write times for electron-beam tools and soaring mask inspection costs. Now, photomask repair, a sometimes forgotten technology in the mask shop, is in the spotlight and turning into the clash of the titans.
Mask repair involves the process of finding defects on a photomask and repairin... » read more