Hi,
The etch rate for 5:1 BOE is typically
~1000 A/min for Thermal Oxide
~4900 A/min for Unannealed PECVD
~2400 A/min for annealed PECVD
I am not sure what you mean by concentration profile.
The container used for BOE etching is some type of teflon container
Ther container used for KOH etching is a pyrex beaker.
Phil Tabada
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