Abstract

YBa2Cu3O7−x(YBCO)superconducting thin films with Tc of 89 K and Jc of 2.7×106 A/cm2 at 77 K, zero field were prepared by a modified high pressure (1.5 Torr) dc planar diode sputtering process. The design and construction of the simple, economic hot‐wall sputtering system which has been achieved in growing high‐quality YBCO films on (001)MgO, (001)LaAlO3, and (001)YSZ substrates are reported.