LOCATION: All meetings are taking place at the Faculty Club which is the conference and meeting centre of the Catholic University of Leuven. Please check the event Travel & Hotelpage for more information.
Faculty Club - Groot Begijnhof 14 - 3000 Leuven - Tel : 016/32.95.00 - Fax : 016/32.95.02 - info@facultyclub.bewww.facultyclub.be

Introduction & Description:

Mask ordering has become increasingly complex, yet it is often done without the benefit of automation. Even when ordering is automated, the data sent to mask suppliers is usually structured differently by each customer. This creates inefficiencies for both the customer and the mask supplier, leads to delays when ambiguities must be resolved, occasionally leads to wasted masks and even bad wafers. It also means both that customers invest extensive manpower in designing and maintaining customized software to place mask orders, and that mask suppliers invest extensive manpower to interpret those customized orders from various formats. SEMI P10, “Specification of Data Structures for Photomask Orders” was developed to standardize the exchange of mask order information, simplify the process, eliminate ambiguity and reduce errors.

This workshop will explain the background and rationale of P10, the mask products and features supported by P10, difficulties for software implementation, success stories and approaches to adopting P10. The goal of this workshop is to improve understanding of what P10 is and can do, to explain the benefits of using P10, and to help customers of all types learn how to implement and take advantage of P10. The changes expected to be balloted in January 2006 will be addressed.

The workshop is designed for all persons involved in the mask supply chain, including managers and engineers involved in:

design data tapeout, including fabless customers

mask order placement

mask purchasing

wafer fab lithography

mask order entry

mask data prep

mask engineering

mask software development

The outcome should be a clear understanding of what can be accomplished by P10 mask ordering and the alternatives available for taking advantage of P10 automation.

More Details about the difference between the July 2004 and July 2005 version.

Who Should Attend:

Persons involved in mask data preparation, wafer fab process and lithography engineers, or software development people involved in supporting the above. Mask equipment suppliers may also be interested to find out how P10 can support their tools. Designers interested in what happens to their layout data are also welcome.

Workshop Instructors:

Wes Erck, VP Mask Data Management Systems, OASIS Tooling, Inc.

Gordon Hughes, CAD Systems Manager, Compugraphics International Ltd

About the SEMI Europe Standards Autumn Event:

This workshop is being held in conjunction with the SEMI Europe Standards Autumn Conference and Meetings. From trend spotting to technology development to market intelligence and product exposure, the importance of developing and expanding your network of industry contacts makes this event a requisite of success.

What is a STEP and why should I attend?

A Standards Technical Education Program (STEP) is a technical program focused on one or several SEMI International Standards. SEMI produces STEPs to communicate information about newly published or revised standards, or critical documents under development, that are expected to have a profound impact on industry operations. It is common for members of the originating standards task force to serve as presenters. Attending a STEP will give you the opportunity to learn more about the application of a critical new standard which impacts your manufacturing site or affects your supplier-customer relationships. This technical education program will teach you how to implement new technical information into your everyday fab operations, which may help you and your company to improve your product and processes considerably.