WarningYour internet explorer is in compatibility mode and may not be displaying the website correctly.
You can fix this by pressing 'F12' on your keyboard, Selecting 'Document Mode' and choosing 'standards' (or the latest version
listed if standards is not an option).

Quick Search

Stress-Optical Effects with Generalized Plane Strain

Application ID: 190

Planar photonic waveguides in silica (SiO2) have great potential for use in wavelength routing applications. The major problem with this type of waveguide is birefringence. Anisotropic refractive indices result in fundamental mode splitting and pulse broadening. The goal is to minimize birefringence effects by adapting materials and manufacturing processes. One source of birefringence is the use of a silicon (Si) wafer as the substrate onto which the waveguide structure is deposited.

After annealing at high temperatures, a mismatch in thermal expansion between the silica and silicon layers results in thermally induced stresses in the structure at the operating temperature (typically room temperature).