learn the fundamentals of ALD based on sequential self-limiting surface reactions

understand the important advantages of ALD and comparison with other deposition techniques

learn about ideal and non-ideal ALD and thermal and plasma-enhanced ALD.

understand how ALD surface chemistry and growth are studied using in situ probes

learn how ALD can be used for thin film nanoengineering

understand the many current and potential applications of ALD

The Summer school is organised into lessons, seminars and thematic work sessions.
Lessons will take place in the morning from 8:30 to 12:30. All the physical, chemical and engineering concepts of ALD will be revised, by illustrious scientist.
Seminars dedicated to one main theme of application will be held by scientist leader in the field in the early afternoon from 14:30 to 16:00.
Thematic work sessions dedicated to the theme faced during the daily seminar will take place in the late afternoon from 16:00 to 18:00. Five minutes presentation of posters or slides from students are encouraged to discuss the main problems of material synthesis and characterization in the selected field. Detailed program and speakers will be available soon.

Limited number of fellowships supported by COST Action HERALD will be available for early registrations. Deadline is 30 April 2015. The names of selected fellows will be communicated within 15 May 2015.