CATS

Technology Leading Mask Data Prep

CATS® is a highly scalable and flexible software application that transcribes complex design data into machine readable instructions for e-beam and laser machines used for the pattern generation and manufacturing of IC, MEMS, TFT-LCD, TFH, photonics, and biochip products. CATS has installations in virtually every photomask manufacturing facility worldwide, and is the de facto standard for mask manufacturing, inspection, metrology, and direct-write-on-wafer.CATS the Mask Data Preparation Standard