Abstract of the Disclosure

A method of forming semiconductor electronic devices by ionic bombardment including the steps of placing an ion absorbing mask of semiconductor substrate; bombarding the substrate with monoenergetic ions and heating the material to repair radiation damage

Figure descriptions: cover graphic

Figure 1 is a side elevational view, partly in section of the apparatus utilized in this invention.

Figure 2 is a cross-sectional view of a semiconductor device produced by this invention.