Peter Do Wins LVMH Graduates Award

May 30, 2014

Peter Do, a May 2014 Fashion Design graduate of the Fashion Institute of Technology (FIT), has won the Graduates Award in the prestigious inaugural LVMH Prize for Young Fashion Designers competition. Do will receive 10,000 euros (approximately $13,600) and a one-year contract with the LVMH fashion house Céline. FIT will also receive 10,000 euros, signifying LVMH's support of education that allows fashion to renew itself in order to reach a higher level of excellence.

Do, 23, is a native of Vietnam who moved to Philadelphia to attend high school in 2004. Felicia Zivkovic, head designer at Lela Rose, selected Do’s Bachelor of Fine Arts senior thesis collection last month as an FIT Critic Award winner. Do also received a Critic Award in 2012, when he earned an Associate in Applied Science degree from FIT. In 2013, Do won the top award in the Council of Fashion Designers of America (CFDA) Scholarship Program competition. He has held internships at Calvin Klein, Inc. and with women’s wear designer Chris Gelinas.

Two other fashion design school graduates also received the Graduates Award. However, Do is the only winner from North America and the only designer without an advanced degree. Teruhiro Hasegawa, who holds a BA and an MA from Central Saint Martins College of Art and Design in London, will join Givenchy. Flavien Juan Nunez, with a bachelor’s from La Cambre, in Brussels, and a post-graduate degree from the Institut Francais de la Mode, in Paris, will be at Christian Dior.

Do was selected from among 600 applicants worldwide, each of whom submitted six images of their most recent work to the selection committee.

“We are extremely proud of Peter and pleased to call him one of our own,” said Joanne Arbuckle, dean, School of Art and Design, FIT. “The innovation and originality that Peter has shown at such a young age speaks both to his extraordinary talent and to the promise of a very bright future.”

About FIT
The internationally renowned Fashion Design program at the Fashion Institute of Technology (FIT) was established in 1944, the year the college was founded. The program’s close ties to industry help ensure that the curriculum continually evolves, immersing students in current real-world practice. The program provides both an essential foundation for creating apparel and advanced study in specialized areas. Students intern with leading designers and design houses, and have the opportunity to study abroad, in FIT’s programs in Florence and Milan. Notable alumni include Calvin Klein, Michael Kors, Nanette Lepore, Amsale Aberra, Reem Acra, Nina Garcia, Francisco Costa, Joe Zee, Brian Atwood, Ralph Rucci, Michelle Smith, Andrew Fezza, Dennis Basso, Norma Kamali, John Bartlett, Stephen Burrows, Daniel Vosovic, Victor Alfaro, Jhane Barnes, Miranda Morrison, Kari Sigerson, and Rebecca Moses.

The Fashion Institute of Technology, a college of the State University of New York, has been a leader in career education in art, design, business, and technology for nearly 70 years. With a curriculum that provides a singular blend of hands-on, practical experience, classroom study, and a firm grounding in the liberal arts, FIT offers a wide range of outstanding programs that are affordable and relevant to today’s rapidly changing industries. The college offers more than 45 majors and grants AAS, BFA, BS, MA, MFA, and MPS degrees, preparing students for professional success and leadership in the global marketplace.