Title (fr)

Publication

Application

Priority

EP 00830640 A 20000927

Abstract (en)

Integrated microreactor, formed in a monolithic body (50) and including a semiconductor material region (2, 23) and an insulating layer (25, 30); a buried channel (21) extending in the semiconductor material region; a first and a second access trench (40a, 40b) extending in the semiconductor material region (2, 23) and in the insulating layer (25, 30), and in communication with the buried channel (21); a first and a second reservoir (41a, 41b) formed on top of the insulating layer (25, 30) and in communication with the first and the second access trench; a suspended diaphragm (45) formed by the insulating layer (25, 30), laterally to the buried channel (21); and a detection electrode (28), supported by the suspended diaphragm (45), above the insulating layer (25, 30), and inside the second reservoir. <IMAGE>