Micro/Nano Lithography

Michael Lercel: EUV will build on success of DUV and holistic lithography

An interview from SPIE Advanced Lithography 2017.

3 April 2017, SPIE Newsroom. DOI: 10.1117/2.3201703.20

Michael Lercel holds a doctorate in physics from Cornell University where he studied nanofabrication on ultra-thin films, as well as a bachelor's degree in physics from Massachusetts Institute of Technology.

After graduation, he joined IBM Microelectronics working in positions in advanced photomask development, lithography research and leading microelectronics equipment strategy. He joined Cymer in 2010 as Senior Director for EUV Product Marketing, and was at SEMATECH in various positions including Lithography Director and Chief Technologist before joining ASML in 2015 as Director of Strategic Marketing.