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Abstract

The generation of multi foci is an established method for high-speed parallel direct laser writing, scanning microscopy and for optical tweezer arrays. However, the quality of multi foci reduces with increasing resolution due to interference effects. Here, we report on a spatial-light-modulator-based method that allows for highly uniform, close to Gaussian spots with diffraction limited resolution using a wavelength of 780 nm. We introduce modifications of a standard algorithm that calculates a field distribution on the entrance pupil of a high numerical aperture objective splitting the focal volume into a multitude of spots. Our modified algorithm compares favourably to a commonly used algorithm in full vectorial calculations as well as in point-spread-function measurements. The lateral and axial resolution limits of spots generated by the new algorithm are found to be close to the diffraction limit.

Calculation of five spots laterally separated by 340 nm (a) and measurement of four spots laterally separated by 390 nm (b). Calculated and measured slices along the optical axis of two spots axially separated by (c) 1500 nm and (d) 1100 nm.