Etch
Chamber Components

Graphite and SUPERSiC
components are produced to customer prints.

Silicon Carbide

SUPERSiC® silicon carbide, is
typically used for plasma etch electrodes, showerheads,
focus rings, hot edge rings, confinement rings and
other chamber components. SUPERSiC is the ideal
material for current and legacy equipment as replacement
components for silicon, quartz and other ceramics to
improve process performance.

Currently, all SUPERSiC etch chamber components are
custom made for OEMs to go in the next generation equipment.