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Temescal 1800 e-beam evaporator is a single-chamber system for the thin-film evaporation. A maximum of four different materials can be evaporated in one pump-down cycle, from the four pocket electron gun. The thickness of the metal is monitored during the evaporation by an Inficon thickness monitor. Substrates up to 4 inches can be attached to the rotating substrate holder. The system does not have substrate heating . The available materials are: Au, Ag, Al, Cr, Ni, Pt, Tungsten and Ti. The vacuum system has been upgraded to a cryo pump.

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The ATC 1500 sputter deposition system, by AJA International, has the capability to co-sputter conductive and insulating materials on substrates up to 100mm in diameter. In addition to Ar sputtering, N2 and O2 are also available for use in reactive-ion sputtering. The UTD object is equipped with 2 RF and 2 DC magnetron sources with in-situ tilt capability to optimize film uniformity. The substrate is capable of heating to 800C while under rotation as well as exposure to reactive gasses and RF bias. Software for control of the various source shutters is also available for automated film stack deposition.

Process Data

Control Charts

The ATC Orion sputter deposition system, by AJA International, has the capability to co-sputter conductive and insulating materials on substrates up to 100mm in diameter. In addition to Ar sputtering, N2 or O2 are also available for use in reactive-ion sputtering. The UTD object is equipped with 2 RF and 2 DC magnetron sources. The substrate is capable of heating to 800C while under rotation as well as exposure to reactive gasses and RF bias. Software for control of the various source shutters is also available for automated film stack deposition.