Abstract: Disclosed are a light guide plate for a non-contact type coordinate input system, a system including the same, and a non-contact type coordinate input method using the same. More particularly, the present invention relates to a light guide plate for a non-contact type coordinate input system, which eliminates inconvenience of a conventional contact-type coordinate input system inputting coordinates through direct contact, and which can reduce use of sensors and optical loss as much as possible. The present invention also relates to a system including the same, and a non-contact type coordinate input method using the same.

Abstract: A charged particle beam drawing apparatus has a drawing chamber including a movable stage which supports a mask, the mask being formed by applying a resist to an upper surface of a mask substrate, an optical column for applying a charged particle beam to draw patterns in the resist, a charged particle beam dose correction portion for correcting a dose of the charged particle beam applied from the optical column to the resist on the basis of proximity effect and fogging effect, and a conversion coefficient changing portion for changing a conversion coefficient on the basis of pattern density in the resist and a position in the resist, wherein the conversion coefficient is a ratio of an accumulation energy of the charged particle beam accumulated in the resist, to an accumulation dose of the charged particle beam accumulated in the resist.

Abstract: An ink composition for ink jet printing is provided which gives a cured object excellent in adhesion to metallic plates, resistance to etchants, and alkali removability and can be stably ejected with an ink jet apparatus. The ink jet composition for etching resists has a viscosity at 25° C. of 3-50 mPa s and includes monomers comprising: either a polymerizable phosphoric ester compound represented by general formula (I); a polyfunctional monomer having two or more ethylenic double-bond groups per molecule and having no phosphoric ester group, the content of the ethylenic double-bond groups being 4×10?3 to 8×10?3 mol/g; and a monofunctional monomer having one ethylenic double-bond group per molecule and having neither phosphoric ester group nor carboxy group. In the formula, X represents C1-3 alkylene, Y represents C2-3 alkylene, and R represents hydrogen or methyl.

Abstract: A method of evaluating astigmatism of an irradiation system irradiating an electron beam is disclosed. In this method, a figure pattern consisting of plural (for example, four) concentric circles is formed on a reference sample “WP” and an image (scanned image) is formed based on an electron signal obtained by scanning the electron beam onto the reference sample “WP”. In the scanned image, the image has a blur in a region with its longitudinal direction parallel to the generating direction of the astigmatism and the size of the blur depends on magnitude of the astigmatism. Therefore, the direction and the magnitude of the astigmatism of the irradiation system of an irradiation apparatus can be detected based on the obtained scanned image.

Abstract: A circuit pattern having a size finer than a half of a wavelength of an exposure beam is transferred on a semiconductor wafer plane with an excellent accuracy by means of a mask whereupon an integrated circuit pattern is formed and a reduction projection aligner. The accuracy of transferring the circuit pattern on the semiconductor wafer is improved by synergic effects of super-resolution exposure, wherein a mask cover made of a transparent medium is provided on a pattern side of the integrated circuit mask so as to suppress the aberration of reduction projection alignment, and a method of increasing the number of actual apertures of the optical reduction projection lens system provided with the wafer cover made of the transparent medium on a photoresist side of the semiconductor wafer to which planarizing process is performed.

Abstract: Provided are a system for generating a surface mesh surrounding particles on a 3D space. An implicit function module receives particle data containing three-dimensional location and radius data of the particles, grids the particles into rectangular parallelepiped shape, and generates implicit function data having implicit function value determining the surface at grid points. A mesh module generates a mesh through a pre-process of substituting the implicit function value of the gird point, where the implicit function value is defined, by zero when the a distance between a grid point where the implicit function value of the implicit function data and the vertex of the mesh is within a set distance. Accordingly, the system and method are useful for visualizing the results of particle simulations used in basic science and engineering. In particular, the system and method can generate high-quality mesh in computer graphics of fluid simulation using the particles.

Abstract: According to a specific embodiment of the present invention, a mask-less lithography method and apparatus is provided. The apparatus includes an integrated write head on a slider with an air bearing that creates a lift force that allows that write head to fly over a spinning wafer substrate in nanometer distance without physical contact. The short distance between the write head and substrate prevents the light from diffracting. As a result, micro and nanometer structures can be patterned without being limited by light diffraction in conventional lithography methods.

Abstract: Disclosed herein are methods and apparatus for providing markings upon objects, including the read side of an optical information media, where the markings do not substantially interfere with object, including the use of the optical information media. This invention discloses use of a coating, marking schemes, printing of markings with UV light, as well as methods and apparatus for reading and deciphering said marking. Included is an authentication scheme, where the marking may be used as a lock to limit access to information contained in an optical information media.

Abstract: In order to obtain a preferable image without “stripe-shaped unevenness”, an exposure apparatus comprising first and second exposure heads having light emitting sections emitting light with first and second intensity arranged in main and sub scanning directions such that an exposure area including an overlapped exposure area overlapping an exposure area of the first exposure head is exposed by the second exposure head and a driving control unit by which light emitting sections of the first and second exposure heads are lit at a predetermined timing in the overlapped exposure area such that a difference in the maximum exposure amount between pixels adjoining each other in the main scanning direction is smaller than a difference in the maximum exposure amount between each pixel in the exposure area of the first exposure head and each pixel in the exposure area of the second exposure head, is provided.

Abstract: A color cathode ray tube having a black matrix fluorescent screen of a high degree of accuracy and in which the accuracy of beam transmissive aperture edges of a color selecting mechanism is moderated, as well as a method of manufacture thereof are provided. On the color selecting mechanism, a resist pattern that is independent of the pattern of beam transmissive apertures of the color selecting mechanism is formed, and a fluorescent screen is created using the resist pattern as a mask. After creating the fluorescent screen, resist patterns are removed to form the color selecting mechanism. The color cathode ray tube is configured by positioning this color mechanism in such a way that it faces the color fluorescent screen created in the manner described above.

Abstract: A method of manufacturing a luminescent screen assembly, having a light-absorbing matrix with a plurality of substantially equally-sized openings therein, on an inner surface of a faceplate panel of a cathode-ray tube (CRT) is provided. The method include the steps of exposing a first photoresist layer to light from a light source, located relative to a central source position, as well as two symmetrical source positions located relative to the central source position. Thereafter, a second photoresist layer and a third photoresist layer are sequentially exposed to define second guardbands of light-absorbing material and third guardbands of light-absorbing material, respectively. However, the light source positions for the second photoresist layer and the third photoresist layer are located at asymmetric positions relative to the central source position.

Abstract: A bulb for a color cathode ray tube having a face plate and a color selection member having a plurality of opening portions, wherein X is a nominal diagonal dimension of the bulb, P is a pitch of the opening portions along an electron beam sweep direction in the central portion of the bulb, GH is a distance between an inner surface of the face plate and the color selection member in the central portion of the bulb, and LT is a value obtained by dividing a size of the opening portion along the electron beam sweep direction in the central portion of the bulb by the pitch P and the expressions
0.0117X−0.0457<P<0.018X−0.0771
and
2.8×10−2<P×LT×GH−1/2<4.1×10−2
are satisfied.

Abstract: A bulb for a color cathode ray tube comprising a face plate and a color selection member having a plurality of opening portions, said bulb satisfying the following expressions (1) and (2), wherein X is a nominal diagonal inchage of the bulb, P (unit: mm) is a pitch of the opening portions along an electron beam sweep direction in the central portion of the bulb, GH (unit: mm) is a distance between an inner surface of the face plate and the color selection member in the central portion of the bulb, and LT is a value obtained by dividing a size (unit: mm) of the opening portion along the electron beam sweep direction in the central portion of the bulb by the pitch P (unit: mm).

Abstract: An ultraviolet-curable resin composition comprising a phosphorus atom-containing photopolymerizable compound and a carboxyl group-containing photopolymerizable compound and exhibiting surface tension at 25° C. in the range of 30 to 50 mN/m. Preferably the composition comprises (a) a compound having one or more (meth)acryloyl groups in its molecule and a phosphorus atom, (b) a compound having at least one carboxyl group and one (meth)acryloyl group in its molecule, (c) a compound having one or more (meth)acryloyl groups in its molecule, (d) a leveling agent, and (e) a photoinitiator. The ultraviolet-curable resin composition is useful as a protective material for etching, particularly as a back-coating material in the production of a shadow mask.

Abstract: A method of manufacturing a luminescent screen assembly for a color cathode-ray tube (CRT) is disclosed. The luminescent screen assembly is formed on an inner surface of a faceplate panel of the CRT. The luminescent screen assembly includes an organic conductive (OC) layer overcoated with an organic photoconductive (OPC) layer. Three different color-emitting phosphors are sequentially deposited over portions of the OPC layer by uniformly charging and than selectively discharging desired areas thereof. Appropriate color-emitting phosphors are then deposited on the discharged areas. The first color-emitting phosphor lines are deposited on the OPC layer by charging and then selectively discharging the OPC layer using a symmetric exposure profile. Thereafter, the OPC layer is charged again and selectively discharged to deposit the second color-emitting phosphor lines using an asymmetric exposure profile.

Abstract: A method of manufacturing a luminescent screen assembly for a color cathode-ray tube (CRT) is disclosed. The luminescent screen assembly is formed on an inner surface of a faceplate panel of the CRT. The luminescent screen assembly includes an organic conductive (OC) layer overcoated with an organic photoconductive (OPC) layer. Three different color-emitting phosphors are sequentially deposited over portions of the OPC layer by uniformly charging and than selectively discharging desired areas thereof. Appropriate color-emitting phosphors are then deposited on the discharged areas. The first color-emitting phosphor lines are deposited on the OPC layer by charging and then selectively discharging the OPC layer using a symmetric exposure profile. Thereafter, the OPC layer is charged again and selectively discharged to deposit the second color-emitting phosphor lines using an asymmetric exposure profile.

Abstract: The invention relates to a method of producing a screen (6) having a striped structure of electroluminescent material on a display window (3) of a color display tube (1). In present day color display tubes (1), this screen (6) is produced using a photochemical process for exposing a photosensitive material which is applied to the display window (3). Normally, the exposure device used for this process comprises two lenses, a first lens (28) for correcting the rotation of the image of the elongated light source (22) and a second lens (27) for taking care that the landing position of the light on the display window (3) will be representative of the landing position of the electron beams (7), (8), (9) in the color display tube (1) when it is operated. Unfortunately, the prior art system has the disadvantage that the line-growth factor is not constant over the entire screen (6).

Abstract: A method of manufacturing a luminescent screen assembly, having a light-absorbing matrix with a plurality of substantially equally-sized openings therein, on an inner surface of a faceplate panel of a cathode-ray tube (CRT) is provided. The tube has a color selection electrode spaced from the inner surface of the faceplate panel in which the color selection electrode has a plurality of strands interleaved with slots. The method includes the steps of providing a first photoresist layer, whose solubility is altered when exposed to light, such that greater dosages of light reduce the solubility thereof. The first photoresist layer is applied to the inner surface of the faceplate panel. The first photoresist layer is exposed to light from a light source, located relative to a central source position, as well as two symmetrical source positions relative to the central source position.

Abstract: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.

Abstract: A method of manufacturing a luminescent screen assembly for a color cathode-ray tube (CRT) is disclosed. The luminescent screen assembly is formed on an interior surface of a faceplate panel of the CRT. The luminescent screen assembly includes a light-absorbing matrix having a plurality of substantially equally sized openings formed therein. The matrix is formed by applying one or more light sensitive layers on the interior surface of the faceplate panel of the CRT tube. The one or more light sensitive layers includes a photoresist material. Also, the one or more light sensitive layers includes a contrast enhancing material. The one or more light sensitive layers are selectively exposed to actinic radiation projected through openings in a shadow mask, positioned a fixed distance from the screen assembly.

Abstract: The present invention provides a method of manufacturing a cathode ray tube, comprising a step of automatically setting peculiar information to a panel of a cathode ray tube, a step of performing a plurality of treatments on an inner surface of the panel of the cathode ray tube, thereby forming a phosphor film pattern on the inner surface, a step of automatically measuring a condition set in the phosphor film pattern forming step, a step of automatically storing a measurement value obtained in the measuring step such that the value is coupled with the peculiar information, a step of inspecting the panel obtained in the treatment step to determine whether or not the panel is defective, and a step of automatically storing a defectiveness code coupling with the peculiar information if the panel is determined to be defective.

Abstract: A method of photolithography using super-resolution near-field structure. A super-resolution near-field structure is formed on a semiconductor chip comprising a substrate and a photoresist layer thereon. An incident light beam penetrates through the super-resolution near-field structure to expose the photoresist layer. While penetrating through the super-resolution near field structure, the intensity of the incident light beam is increased, and the aperture of the light beam is reduced. As a result, the line width of the pattern formed on the photoresist layer is narrowed. The super-resolution near-field structure has a first dielectric layer, a second dielectric layer and an active layer sandwiched between the first and the second dielectric layers. The active layer is formed of one of gallium (Ga), germanium (Ge), arsenic (As), selenium (Se), indium (In), tin (Sn), antimony (Sb), tellurium (Te), and silver (Ag).

Abstract: A shadow mask for a cathode ray tube includes through-holes defined by first and second recessed formed at first and second surfaces of the shadow mask, respectively. Each through-hole has a first wall farther away from a center of the shadow mask than a second wall thereof. The second recess has a smaller size than that of the first recess. The first wall is formed of a first wall portion defined by an inner surface of the first recess and a second wall portion defined by an inner surface of the second recess. The second wall portion of through-holes located at a peripheral region of the first region has a configuration such that electron beams reflected therefrom are directed to an inner surface of the first recess to thereby reduce electron beams reflected therefrom in directions different from a direction in which the electron beams are originally directed before the electron beams enter the shadow mask.

Abstract: To provide a thermosensitive transfer film in which a color filter layer and a phosphor layer can be easily formed by a small number of processes and a method of using the film. A thermosensitive transfer film 10 comprising at least a photosensitive phosphor layer 5 of a predetermined color, a color filter layer 4 of the same color, and a photosensitive adhesive layer 3 which are provided on a base film 6.

Abstract: An ultraviolet-curable resin composition comprises a phosphorus atom-containing photopolymerizable compound and a carboxyl group-containing photopolymerizable compound and exhibits the surface tension at 25° C. in the range of 30 to 50 mN/m. Preferably the composition comprises (a) a compound having one or more (meth)acryloyl groups in its molecule and a phosphorus atom, (b) a compound having at least one carboxyl group and one (meth)acryloyl group in its molecule, (c) a compound having one or more (meth)acryloyl groups in its molecule, (d) a leveling agent, and (e) a photoinitiator. The ultraviolet-curable resin composition is useful as a protective material for etching, particularly as a back-coating material in the production of a shadow mask.

Abstract: A light quantity correction filter that can implement the desired transmittance distribution precisely and easily without complicating an exposure system, a method of making the light quantity correction filter, and a method of manufacturing a color cathode ray tube using the light quantity correction filter are provided.

Abstract: A photosensitive layer of or for a cathode ray tube is illuminated by means of a laser illumination arrangement. The laser illumination arrangement comprises a homogenizer which serves to reduce the coherence of the laser beam.

Abstract: The invention relates to a method of producing a screen (6) having a striped structure of electroluminescent material on a display window (3) of a color display tube (1). In present day color display tubes (1), this screen (6) is produced using a photochemical process for exposing a photosensitive material which is applied to the display window (3). Normally, the exposure device used for this process comprises two lenses, a first lens (28) for correcting the rotation of the image of the elongated light source (22) and a second lens (27) for taking care that the landing position of the light on the display window (3) will be representative of the landing position of the electron beams (7), (8), (9) in the color display tube (1) when it is operated. Unfortunately, the prior art system has the disadvantage that the line-growth factor is not constant over the entire screen (6).

Abstract: Methods of forming face plate assemblies are described. In one implementation, a substrate is patterned with photoresist and a first phosphor-comprising material is formed over first surface areas of the substrate. The photoresist is stripped leaving some of the first phosphor-comprising material over substrate areas other than the first areas. Photoresist is again formed over the substrate and processed to expose second substrate areas which are different from the first substrate areas. In a preferred aspect, processing the photoresist comprises using a heated aqueous developing solution comprising an acid, e.g. lactic acid, effective to dislodge and remove first phosphor-comprising material from beneath the developed photoresist. A second phosphor-comprising material is formed over the substrate and the exposed second areas, with trace deposits being left over other substrate areas.

Abstract: An apparatus and a method for exposure for a multi-neck cathode ray tube, the exposure apparatus includes a panel supporting plate to support the face panel, light sources respectively mounted in each central position of the electron guns to radiate light beams and to generate an overlapped section on an inner surface of the face panel between a pair of the respective light sources, exposure lenses provided with the respective light sources to control optical paths of light beams emitted from corresponding light sources to follow paths of corresponding electron beams, and a plurality of exposure filters provided in front of the respective exposure lenses to control illumination distribution as a function of position and having light transmission characteristics reduced at an area corresponding to the overlapped section in order to maintain a uniform illumination distribution in the overlapped and non-overlapped sections.

Abstract: A light quantity correction filter that can implement the desired transmittance distribution precisely and easily without complicating an exposure system, a method of making the light quantity correction filter, and a method of manufacturing a color cathode ray tube using the light quantity correction filter are provided.

Abstract: A photosensitive layer of or for a cathode ray tube is illuminated by means of a laser illumination arrangement. The laser illumination arrangement comprises a homogenizer which serves to reduce the coherence of the laser beam.

Abstract: A bulb for a color cathode ray tube comprising a face plate and a color selection member having a plurality of opening portions, said bulb satisfying the following expressions (1) and (2), wherein X is a nominal diagonal inchage of the bulb, P (unit: mm) is a pitch of the opening portions along an electron beam sweep direction in the central portion of the bulb, GH (unit: mm) is a distance between an inner surface of the face plate and the color selection member in the central portion of the bulb, and LT is a value obtained by dividing a size (unit: mm) of the opening portion along the electron beam sweep direction in the central portion of the bulb by the pitch P (unit: mm).

Abstract: Disclosed is a method of manufacturing a plasma addressed electro-optical display having a side surface electrode structure. In the display, a display cell is superimposed on a plasma cell. The display cell includes an intermediate substrate, an upper substrate having columns of signal electrodes, and an electro-optical material held therebetween. The plasma cell includes a lower substrate joined to the intermediate substrate, and a plurality of rows of discharge channels formed therebetween and composed of discharge electrodes and barrier ribs.

Abstract: The present invention discloses a method of optical correction for improving the pattern shrinkage caused by scattering of the light during photolithography processes, wherein the patterns on photomasks are corrected by providing aid patterns. Therefore, serifs or hammerheads are not necessary, and the costs can be decreased. According to the present invention, a chrome aid block is provided between the edges of the patterns. It is noted that the size of the chrome aid block is between &frac13; to ½ the wavelength of light used during exposure. Therefore, the pattern shrinkage caused by scattering of the light during exposure can be reduced, and there is no additional block formed on the photoresist layer. In addition, the standing wave effect can be prevented; thus, the pattern transfer is more accurate.

Abstract: Disclosed are a process for preparing a phosphor pattern of the present invention comprises the steps of:
(I) forming a phosphor-containing photosensitive resin composition layer (A) on a substrate having unevenness,
(II) irradiating a scattered light to the layer (A) imagewisely,
(III) developing the layer (A) by removing the portion to which the scattered light is imagewisely irradiated to form a pattern, and
(IV) calcinating the formed pattern to remove an unnecessary portion from the pattern formed in the step (III) to form a phosphor pattern,
a phosphor pattern produced by the above process and a back plate for the plasma display panel provided with the phosphor pattern on a substrate for a plasma display panel.

Abstract: In an exposure method for a picture tube, photoresists which are applied on an inner surface of a panel are exposed through a shadow mask to fix the photoresists on the inner surface of the pane. A position where light, which is emitted by an exposure light source and passes through an outermost slot of the shadow mask, becomes directly incident on the inner surface of the panel, and a position where light, which is emitted by an exposure light source at the same position as that of the first exposure light source or at a different position from that of the first exposure light source, passes through a slot inside the outermost slot of the shadow mask, is reflected by an outer surface of the panel, and returns, becomes incident on the inner surface of the panel are set to coincide with each other. An exposure apparatus for achieving this method is also disclosed.

Abstract: A method for creating a faceplate of a display provides a faceplate substrate with a faceplate interior side and a faceplate exterior side. A plurality of barriers are formed on the faceplate interior side, with the barriers defining a plurality of subpixel volumes. Phosphor containing photopolymerizable material mixtures of red, green and blue, are deposited into subpixel volumes, and create a faceplate interior side/phosphor interface. At least a portion of the phosphor containing photopolymerizable material mixture is exposed with sufficient actinic light through the faceplate interior side/phosphor interface to polymerize a selected depth of the phosphor containing photopolymerizable material mixture in the subpixel volumes, and form a polymerized phosphor containing material in a plurality of subpixel volumes. Non-polymerized phosphor containing photopolymerizable material is removed from the polymerized phosphor containing material.

Abstract: A composite shadow ring for use in an etch chamber that does not generate contaminating oxygen gas when bombarded by a gas plasma and a method for using such composite shadow ring are presented. The composite shadow ring may have a structure of a body portion of a ring shape that is made of a material that is substantially of silicon dioxide and an insert portion which is intimately joined to the body portion and is adjacent to a plasma cloud in the etch chamber when the shadow ring is positioned juxtaposed to the wafer, the insert portion of the shadow ring may also have a ring shape and is eccentric with the body portion, it generally has a diameter smaller than a diameter of the body portion, the insert portion may be fabricated of a material that does not generate oxygen when bombarded by a fluorine-containing gas plasma. The body portion may have a crosssection of a rectangle which has an upper inner corner of the rectangle missing to form a cavity for receiving an insert member intimately therein.

Abstract: A color cathode-ray tube, and a method for manufacturing this color cathode-ray tube capable of reducing light/dark line patterns produced while the color cathode-ray tube is operated. Exposing light which has passed through a correction lens made of a continuous lens and a discontinuous lens is irradiated onto a photosensitive film of an inner surface of a face panel of the color cathode-ray tube via a shadow mask so as to expose this photosensitive film, and then while using the exposed photosensitive film as a mask, fluorescent dot patterns are formed on a surface of the face panel. The correction lens having a discontinuous plane owns a plurality of light incident planes, a light projection plane for projecting the light entered into the light incident planes outside this light projection plane, and a plurality of level difference planes arranged between the light incident planes located adjacent to each other.

Abstract: The invention relates to a method of manufacturing a luminescent screen structure 22 with a light-absorbing matrix 23, having a plurality of substantially equally sized openings therein, on an inner surface of a CRT faceplate panel 12. A color selection electrode 24 is spaced a distance, Q, from the inner surface. The method includes providing a first photoresist layer 50, whose solubility is altered when it is exposed to light, on the inner surface of the faceplate panel 12. The first photoresist layer 50 is exposed to light from two symmetrically located source positions +G and -G, relative to a central source position, 0. Then the more soluble regions 54 of the photoresist layer 50 are removed, overcoated with a light-absorbing material 58 and developed to remove the retained, less soluble regions 52 of the first photoresist layer with the light-absorbing material thereon. First guardbands 60 of light-absorbing material remain on the interior surface of the faceplate panel 12.

Abstract: There is disclosed a display screen obtained such that a first pigment layer and a resist layer are exposed and developed, then a second pigment layer is formed on the photoresist pattern, and the resultant structure is coated with a resist decomposition agent to remove the photoresist pattern and the second pigment layer formed on the photoresist pattern.

Abstract: Apparatus for use as a lighthouse in the manufacture of a color cathode ray tube (CRT) includes a housing with a cover lens. Disposed within the housing is a light source assembly including a light source in the form of a cylindrical shaped mercury lamp and an optical aperture closely spaced to the mercury lamp. The mercury lamp directs light through the optical aperture as well as through the cover lens onto the inner surface of the CRT's glass faceplate in a photo-stenciling process for registering, or aligning, phosphor dots on the faceplate's inner surface with electron beam passing apertures in the CRT's color selection electrode, or shadow mask. The optical aperture is elongated, with its longitudinal axis aligned generally transverse to the longitudinal axis of the mercury lamp, and is curvilinear having from two (2) to eight (8) inflection points along its length.

Abstract: In the manufacture of a color-display device comprising color-filter layers, phosphor haze may occur. Said phosphor haze adversely affects the picture quality. Phosphor haze can be reduced substantially, or precluded, by providing one, and only one, of the color-filter layers by means of a negative lithography process and, subsequently, providing the phosphor corresponding to this color-filter layer before the other phosphor layers.

Abstract: Light radiated from a light source is gathered by an oval mirror. The gathered light is incident on one end of a rod-shaped optical integrator, integrated and made uniform within the optical integrator, and is radiated from the other end of the optical integrator. The light from the optical integrator is diffused and projected on an exposure area of a display tube by a lens system. The lens system presents an astigmatism, thereby forming a first virtual focus and a second virtual focus on its virtual image area. The diffused light is apparently diffused vertically at the first virtual focus and apparently diffused horizontally at the second virtual focus. The first vertical focus and the second vertical focus correspond respectively in position to the positions of the vertical deflection means and horizontal deflection means of the display tube.

Abstract: For the manufacture of a color screen for a cathode ray tube a process is described which uses a single photolithographic mask for defining multiple patterns, so that said single mask may be used for determining the different areas where several different phosphor layers will be located. Masks used for conventional photolithographic processes normally comprise a pattern of regions that are either fully transparent or fully opaque to the radiation used for exposing the resist. The mask used as part of the present invention includes regions that are neither fully transparent nor fully opaque, having, instead, a grey scale of optical densities. Through careful control of both exposure and development time, selected parts of a layer of a positive photoresist, that were exposed through successively denser regions of the mask, can be successively removed.

Abstract: An exposure system including a master mask used for exposing a glass panel to form a plurality of phosphor stripes or dots on an inner surface of the glass panel wherein the master mask and/or a light source are movable for correction of an exposure position, thereby eliminating the need to attach and remove a color selecting mechanism to and from the glass panel when the glass panel is exposed to form a fluorescent screen on the inner surface of the glass panel.

Abstract: A mask and method of manufacturing is disclosed. The mask may include a transparent quartz substrate having light-transmitting regions and light-shielding regions, a light-control layer formed on the substrate excluding a portion corresponding to a light-transmitting region of an edge portion, and a light-shielding layer formed on the light-control layer of an light-shielding region. The method may include the steps of preparing a quartz substrate, forming a light-control layer on the quartz substrate, forming a light-shielding layer on the light-shielding region of the light-control layer, and selectively etching the light-control layer corresponding to light-transmitting regions of an edge portion of the substrate.