Fabbrix, Inc.

Below 65 nm, sub-wavelength lithography challenges and the corresponding process variability create new design challenges. Some of the challenges are familiar and can be handled by applying known techniques with additional rigor. But as process technologies approach fundamental physical limits, design and analysis flows increase in complexity and traditional methodologies fail.

An effective nanoscale design methodology must embrace the capabilities and limitations of the latest process technologies and at the same time meet the demands of a competitive marketplace.