EasyTube® 2000

EasyTube® 2000

50 mm x 50 mm Substrate

The EasyTube® 2000 is an advanced turnkey thermal chemical vapor deposition system for the synthesis of a wide variety of thin films and nanomaterials.

The base system can process 50 mm x 50 mm diameter substrates and has a 3-zone resistance heated furnace. The system is optimized for controlled process development and user safety. Our modular platform includes a range of options which can be configured to meet your specific processing requirements. Many of the options are available as upgrades after installation.

The system is designed to meet today’s safety standards for handling pyrophoric, corrosive, flammable, and toxic gases such as hydrogen, silane, germane, diborane, hydrogen chloride, and metal organic precursors. The system has application configured safety protocols embedded into relay logic, PLC, and CVDWinPrC™ software.

FirstNano® offers turnkey system capabilities with support equipment such as gas cabinets and exhaust gas conditioning systems. All major components from one vendor makes interfacing easy. The FirstNano® EasyGas™ gas cabinets are capable of delivering a variety of toxic and hazardous gases. The EasyExhaust™ system will thermally pyrolyze and wet scrub the process effluents.

Our field proven system performance and solid customer base establishes FirstNano® as the clear choice in leading edge nanotechnology development equipment for the advanced research facility.