Mechanisms affecting kinetic energies of laser-ablated materials

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Laser materials processing techniques are expected to have a dramatic impact on materials science and engineering in the near future and beyond. One of the main laser materials processing techniques is Pulsed Laser Deposition (PLD) for thin film growth. While experimentalists search for optimal approaches for thin film growth with pulsed laser deposition (PLD), a systematic effort in theory and modeling of various processes during PLD is needed. The quality of film deposited depends critically on the range and profile of the kinetic energy and density of the ablated plume. While it is to the advantage of pulsed laser deposition ...
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Description

Laser materials processing techniques are expected to have a dramatic impact on materials science and engineering in the near future and beyond. One of the main laser materials processing techniques is Pulsed Laser Deposition (PLD) for thin film growth. While experimentalists search for optimal approaches for thin film growth with pulsed laser deposition (PLD), a systematic effort in theory and modeling of various processes during PLD is needed. The quality of film deposited depends critically on the range and profile of the kinetic energy and density of the ablated plume. While it is to the advantage of pulsed laser deposition to have high kinetic energy, plumes that are too energetic causes film damage. A dynamic source effect was found to accelerate the plume expansion velocity much higher than that from a conventional free expansion model. A self-similar theory and a hydrodynamic model are developed to study this effect, which may help to explain experimentally observed high front expansion velocity. Background gas can also affect the kinetic energies. High background gas may cause the ablated materials to go backward. Experimentally observed plume splitting is also discussed.

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