Technical article

Particle Monitoring Program: Hot Liquid Baths

Abstract

Controlling contamination throughout a manufacturing environment requires accurate data on particle and other contaminant levels in process equipment. In the past, obtaining such measurements for hot-liquid baths has been especially difficult. This article presents Micron Semiconductor's experience with a particle-counting system that was developed for use with such aggressive liquids. Counter operation is reviewed, and data from the company's weekly monitoring program are given as part of the discussion of the improvements that have been implemented. Micron's plan to extend its use of the counter are also outlined.

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