Request for processinf BCB

Dear Specmat members,
I would like to make a request to process 4022-35 PhotoBCB in the following
manner:
1. Clean wafer
2. Spin coat adhesion promoter, AP3000
3. Spincoat BCB
4. Softbake for 60 seconds at 65 degrees C
5. Expose
6. Pre-develop bake the wafer for 5 minutes at 60 degrees
7. Develop in the DS3000 developer which is at 40 degrees for 1 minute
8. rinse in room temperature developer for a few minutes
9. Spin dry.
The point of concern here could be that , the developer. which is benzene
based, needs to be at an elevated temperature for optimum results. PLease
let me know how/where this can be done.
APpreciate you r co-operation, the MSDS for DS3000 and the processing
procedures are attached with this email.
Regards,
Vidya
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