Since the foundation of LTM in 1999, the team of Advanced Lithography has been working, in tight partnership with STMicroelectronics and CEA-Leti, on the improvement of the cutting-edge photolithography techniques used for integrated circuits patterning.

In this challenging domain, requiring tremendous investments that only a few leading industrial groups can afford, it became essential to gather academia and industry R&D efforts. Within this collaborative framework, LTM has been participating to the spectacular progress of conventional photolithography over the last decade by providing developments of simulation tools and nanoimprint techniques.