Final Report on Hybrid Nano-Building Blocks for Pixelated EUV Photoresists and Dielectric Thin-Films

Authors:

Mark F. Roll (Univ. of Idaho),
Brandon T. Hardie (Univ. of Idaho)

Publication ID:

P091231

Publication Type:

Deliverable Report

Received Date:

30-Jun-2017

Last Edit Date:

30-Aug-2017

Research:

2439.001
(University of Idaho)

Research Report Highlight

Final report summarizes the progress of task, citing significant changes in task direction, key outcomes, and future directions. Although not decisively shown, polyoxometalates do appear to offer opportunities as resist modifiers.