Researchers improve tabletop EUV laser system

Researchers have modified a tabletop EUV (extreme ultraviolet) system, increasing the system’s output power from 100 watts to 1 megawatt and downsizing the wavelength of its laser beam from 30 nanometers to 7 nm, making it applicable to next-generation 13-nm EUV chip lithography.

In the future, the researchers hope to downsize the wavelength to 4 nm — what they call the “water- window” — a region of the spectrum where imaging living biological structures would be possible.