This electron beam deposition device (100) is provided with: a crucible (14) into which a deposition material is charged; an electron gun (16) for producing an electron beam (20) incident on the deposition material; a magnetic field producing unit (30); and a magnetic shield (40). The magnetic field producing unit (30) produces a first magnetic field (B1) for deflecting electrons reflected from the deposition material. The magnetic shield (40) blocks the first magnetic field (B1) to prevent the first magnetic field (B1) from affecting the path of the electron beam (20).