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Abstract

Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top
critical issues. A survey was created with support from SEMATECH and administered by SEMI North America to
gather information about the mask industry as an objective assessment of its overall condition. This year's survey
data was presented at BACUS and a detailed trend analysis is presented here. The annual survey is designed with the
input of semiconductor company mask technologists, merchant mask suppliers and industry equipment makers. This
year's assessment is the fifth in the current series of annual reports. With continued industry support the report can
be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics
industries. The report will continue to serve as a valuable reference to identify trends in the mask industry. The
results will be used to guide future investments on critical path issues. This year's survey is basically the same as the
2005 survey. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields
and Yield Loss, Mechanisms, Delivery Times, Returns and Services, Operating Cost Factors, and Equipment
Utilization. Within each category is a multitude of questions that create a detailed profile of both the business and
technical status of the critical mask industry. Note: the questions covering operating cost factors and equipment
utilization were only added to the survey in 2005; therefore meaningful trend analysis is not yet available.

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Journal of Applied Remote SensingJournal of Astronomical Telescopes Instruments and SystemsJournal of Biomedical OpticsJournal of Electronic ImagingJournal of Medical ImagingJournal of Micro/Nanolithography, MEMS, and MOEMSJournal of NanophotonicsJournal of Photonics for EnergyNeurophotonicsOptical EngineeringSPIE Reviews