Octiv Mono 2.0

The Best RF Power & Impedance Meter On The Market

The Octiv Mono is an in-line RF power meter and RF power sensor measurement system. It measures a single fundamental frequency and has an accuracy rating of 1%. Each system has a drop down menu with a choice of 5 fundamental frequencies to choose from.

It measures real power, forward power, reflected power and impedance and displays through a meter unit or direct to a laptop or PC via USB.

The Octiv Mono RF power meter and RF power sensor can measure up to five different fundamental frequencies in a single sensor. This reduces the need for multiple sensors in a laboratory environment.

Overview

The Octiv Mono is a precision RF power sensor used in a large number of laboratory applications. The Octiv Mono operates to 1% true accuracy, and is immune to harmonics making it the most trusted power sensor for applications such as semiconductor manufacturing.

The Octiv Mono is calibrated to five fundamental frequencies: 2MHz | 13.56MHz | 27.12MHz | 40.68MHz | 60MHz. Each frequency can be selected via a drop down menu and the sensor has a power range from 0 to 12 kW.

The Octiv Mono takes the confusion out of choosing a precision RF power sensor and reduces your cost by providing a one sensor fits all solution. The Octiv Mono covers the full RF power and frequency range in a single RF power sensor needed for most laboratory applications. The Octiv Mono gives you a choice of five standard frequency ranges in a single RF power sensor and RF power meter.

The Octiv Mono RF power meter and RF power sensor helps solve issues such as poor production yields, tool matching, fault detection and classification. It helps to define exact process windows and determines the health of power subsystems. The Octiv Mono helps determine 'process run to run' stability. It gives you the confidence to trust the accuracy of the most complex process input, RF power delivery.

RF Parameters Measured

Real Power

Forward Power

Reflected Power

Impedance

Measurement Functionality

Time Averaged MeasurementsThis provides an average over time of the RF power measurements required.

Time Resolved MeasurementsThis allows the user to synchronise measurements with an external synchronisation signal. The user can then obtain detailed information on the power distribution as a function of time or phase through the synchronisation pulse period. Typically the pulse period would be on a timescale of milliseconds to microseconds.

Time Trend MeasurementsThis allows the user to obtain information on the variation of power as time progresses through a particular process. This feature does not require external synchronisation and the timescales involved can be in range of seconds to hours.

Smith Chart MeasurementsMonitor the Load Impedance as it is displayed on a Smith Chart and track Impedance variations throughout the process cycle.

Further Product Information

Probe

Compact DesignThe Octiv Mono is designed to be compact and easy to install. It is mounted between the match unit and the generator to give the most accurate measurement of the RF delivery into the plasma chamber.

Octiv Mono Pulsed Power MeasurementThe Octiv Mono measures the pulsed power time profile at micro second resolution while maintaining a very high degree of accuracy (1%). It measures a single frequency at a time and 15 of its harmonics. The user can select the frequency they wish to analyse from a drop down menu of 5 frequencies or the user can request 5 specific frequencies at the time of order.

Meter ViewView process parameters as they are acquired by the sensor. This feature provides a useful way of monitoring RF power delivery during process hardware setup and installation. Data can be recorded to a file for analysis.

Smith Chart ViewMonitor the Load Impedance as it is displayed on a Smith Chart and track Impedance variations throughout the process cycle.

Time Trend ViewUse the Time Trend view to monitor each RF parameter in real-time. Visualise time-series data as it is acquired. Acquire an overview of each parameter during the process run and monitor run-to-run or chamber-to-chamber variations.

Electronics Unit

Octiv Mono Meter Display UnitEach Octiv Mono comes complete with a portable touch screen display meter which can also be rack mounted. Alternatively the customer might decide to connect their PC directly to the Octiv Sensor and run their measurements through the Octiv dedicated software, supplied with each Octiv Mono

Software

Frequency AgilityThe Octiv Mono allows the user to accurately measure the RF parameters while tracking a rapidly varying fundamental frequency. For example: in variable frequency tuning to match the plasma.

Software Application Programmers Interface (API)A comprehensive API is provided with the sensor to facilitate integration with 3rd party software applications. Sensor initialisation, configuration, and data transfer functions are easily implemented on all of the common software platforms.

Communications InterfaceThe standard Octiv communications interface is USB 2.0, which provides power to the sensor, and supports sensor configuration and data transfer activities in a laboratory environment. For integration with industrial equipment and manufacturing automation systems, alternative communications interfaces are available and based on RS-232 or Ethernet. Electrical isolation ensures the reliable transfer of data even in RF environments.

Abstract

It is reported that a RF match network can have up to 50% power loss in a plasma process or any process with a RF power delivery system to a non-50ohm load causing variability within the process. In this document we discuss a novel method to characterize a matching network using two Octiv Monos

OCTIV - Theory of Operation

Abstract

The Octiv VI probe is an advanced RF voltage and current sensor, which can provide real-time information on complex loads. Real-time information the Octiv provides includes voltage, current, phase, power and impedance on all harmonics of a chosen frequency simultaneously, as well as transmission line parameters such as forward power, reflected power, standing wave ratio (SWR) and reflection coefficient. The Octiv sensor was designed to meet the need for post-match voltage and current measurements in RF excited plasma processes.

OCTIV - Standards of Calibration

Abstract

High power radio-frequency (RF) voltage and current sensors need to be accurately calibrated to a traceable standard. Calibrating to high accuracy can be the most challenging aspect of high power, voltage-current sensor manufacture. This is due to the many sources of error in any calibration process. If the calibration is performed accurately and correctly, then most errors can be characterized and removed.

Abstract

Amine containing plasma polymer films are of interest due to their ability to bind biomolecules either covalently or electrostatically. One issue with generating such plasma polymers is the need to generate sufficient amine density on the surface to enable binding, while simultaneously maintaining the chemical, physical stability of the surface in aqueous media. Here we investigate the relationship between plasma parameters, film stability for two commonly used monomers, allylamine AA, ethylenediamine EDA. Plasma polymer films from AA, EDA were produced at radio frequency RF powers between 2 and 20 W at a constant monomer flowrate. Deposition rate, ion flux, ion energy, plasma phase mass spectrometry were used to investigate the plasma-surface interactions. Film stability was assessed by comparing X-ray photoelectron spectroscopy XPS, atomic force microscopy AFM measurements before, after washing in phosphate buffered saline PBS. The results show that films generated from EDA plasmas are generally unstable in aqueous media, while films generated from AA plasmas exhibit higher stability, particularly those deposited at high RF power. The chemical, physical stability of the films is then related to the mechanisms of deposition, the energy density provided to the surface during film growth.

An Experimental and Analytical Study of an Asymmetric Capacitively Coupled Plasma Used for Plasma Polymerization

Abstract

Plasma processing is widely used to provide novel surface modifications to materials for a variety of
applications. Typically, the systems used to carry out these modifications are poorly characterised. Here we describe the basics of a global model for a capacitively coupled asymmetric parallel plate radiofrequency plasma system routinely used to produce plasma polymers. An analytical global model was developed for argon, for which cross-sections are known, at a constant pressure of 1 Pa, and includes an electrical model and a power balance. The main parameters of interest were ion flux and self-bias voltages. The argon modelling results were then compared to experimental results for a range of operating gases (argon, oxygen, amines, acids, alcohols, ethers, siloxanes) including both saturated and unsaturated compounds with molecular weights ranging from 40 to 162 g mol1, for different inter-electrode separations and from 2 to 50 W using an Impedans OctIV probe. Importantly, it is shown that the RF power transfer efficiency is dependent on the gas. The results show that the argon model results can be used to predict the plasma parameters for other gases when the RF power transfer efficiency is taken into account.

A word from our clients

About us

Impedans specialises in the delivery of high performance and high resolution plasma diagnostics solutions to customers in research and industry. Our products find applications in plasma process research and development, process monitoring and control, and manufacturing tool development in the semiconductor, surface coating, flat panel, thin film and solar sectors.

Impedans' products represent the next generation in plasma diagnostics technology, and coupled with our in-depth plasma knowledge and years of experience, our customers can be sure that they can fully characterise, optimise and monitor their plasma processes with confidence.