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Abstract

The adhesion of an amorphous carbon overcoat to the magnetic layer in a thin film metal alloy recording disk is improved by oxidation of the magnetic layer by a plasma oxidation process to improve the strength of bonds at the interface between the magnetic layer and the carbon overcoat. The magnetic layer is oxidized in an rf diode plasma system using a gas mixture of argon and oxygen. The substrate to be treated is placed on the cathode and builds up a negative self-bias potential when the plasma is ignited. Oxygen ions from the plasma are accelerated towards the disk surface where ion-assisted oxidation takes place. The carbon overcoat is then deposited in the same system using methane or a mixture of argon and methane.

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United States

Language

English (United States)

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A Carbon Overcoat With Improved Adhesion to the Magnetic Layer in a
Thin Film Metal Alloy Recording Disk

The adhesion of an amorphous carbon overcoat to the magnetic layer in a
thin film metal alloy recording disk is improved by oxidation of the magnetic layer
by a plasma oxidation process to improve the strength of bonds at the interface
between the magnetic layer and the carbon overcoat. The magnetic layer is
oxidized in an rf diode plasma system using a gas mixture of argon and oxygen.
The substrate to be treated is placed on the cathode and builds up a negative
self-bias potential when the plasma is ignited. Oxygen ions from the plasma are
accelerated towards the disk surface where ion-assisted oxidation takes place.
The carbon overcoat is then deposited in the same system using methane or a
mixture of argon and methane.