Investigates particle formation from a silicon substrate in an argon sputtering and reactive ion etching plasmas. Use of laser light scattering; Study of the kinetics of particle growth; Observation of threshold behavior for particle generation; Detection of smallest particle size.

Presents some corrections to the article 'Particle Sputtering and Deposition Mechanism for Material Transfer in Breaking Arcs,' by Zhuan-Ke Chen and Koichiro Sawa, from the 1994 issue of the 'Journal of Applied Physics.'

Focuses on the particle sputtering and deposition model to explain the material transfer process and contact resistance degradation during arcing. Technique used to accomplish the erosion measurements; Information on contact resistance and arc duration.

This paper investigates the spatial and temporal variation in plasma electron density over a region between 5 and 10 cm above the race-track region of a pulsed magnetron sputtering target. The pulse operation is performed using an asymmetric bipolar pulsed dc power supply, which provides a...

We have studied chemical sputtering, hydrogen retention and other products of particle-surface interactions in the least known, intermediate-to-low range of impact energies (1â€“30 eV/D), with atomic and molecular projectiles of deuterated amorphous carbon surfaces. Results from atomistic,...

We present 24 Î¼m and 70 Î¼m images of a non-radiative shock in the Cygnus Loop supernova remnant, obtained with the Multiband Imaging Photometer on board the Spitzer Space Telescope. The observed emission is from dust grains heated in the post-shock region. The 70 Î¼m to 24 Î¼m flux...

Magnetotransport measurements have been performed on a (111)B surface of p-type InAs damaged during a SiO2-sputtering process. The transport properties in the in-plane and perpendicular magnetic fields are analyzed with a two-layer model. While the thickness of a three dimensional electron layer...

A simple version of a flow-forming plasma sputtering system is proposed. The causes that determine the properties of the deposited films are revealed when the composition, energy, and particle density of the flow are controlled. The electron component of the plasma flow and an increase in its...

A series of (Fe65Co35)x(MgF2)1-x films with different metal volume fraction x was fabricated by magnetron sputtering. High resolution transmission electron micrographs show that the film consists of bcc Fe65Co35 particles uniformly embedded in an amorphous insulating MgF2 matrix with particle...