Oxford Instruments Plasma Processing Seminar

Plasma Processing Seminar at Cornell

Oxford Instruments Plasma Technology and the Cornell NanoScale Facility (CNF) will hold a technicalseminar addressing the latest research and technologiesin plasma etch deposition and growth.

This one-and-a-half day event is being held on Tuesday and Wednesday, the 20th and 21st of August, at Cornell University, in Ithaca, NY, and will include presentations, discussions, a poster session focusing on latest innovations, and a networking lunch.

Speakers are from key international research institutes, who will discuss their research:

Prof. Peter Ashburn, Southampton University, UK
Vincent Genova, Cornell NanoScale Facility, Cornell University
Prof. Axel Scherer, Director, Caltech, CA
*more speakers to be announcedIn addition, experts in their field from Oxford Instruments and Cornell University will speak on the latest process and applications developments in a number of plasma processing areas.

* For registered participants, ONLY, we will provide coffee and tea service (regular and decaf) through-out both days of the seminar, and lunch on Tuesday (with vegetarian options). For the Poster Session, there will be hors d'oeurves and an open bar. Please note we will not be providing breakfast foods.