This research delineates the design of a nanolithographic process
for nanometer scale surface patterning. The process involves the
combination of serial atomic force microscope (AFM) based
nanolithography with the parallel patterning capabilities of soft
lithography. The union of these two techniques provides for a unique
approach to nanoscale patterning that establishes a research
knowledge base and tools for future research and prototyping.To successfully design this process a number of separate research
investigations were undertaken. A custom 3-axis AFM with feedback
control on three positioning axes of nanometer precision was
designed in order to execute nanolithographic research. This AFM
system integrates a computer aided design/computer aided
manufacturing (CAD/CAM) environment to allow for the direct
synthesis of nanostructures and patterns using a virtual design
interface. This AFM instrument was leveraged primarily to study
anodization nanolithography (ANL), a nanoscale patterning technique
used to generate local surface oxide layers on metals and
semiconductors. Defining research focused on the automated
generation of complex oxide nanoscale patterns as directed by
CAD/CAM design as well as the implementation of tip-sample current
feedback control during ANL to increase oxide uniformity.
Concurrently, research was conducted concerning soft lithography,
primarily in microcontact printing (ÂµCP), and pertinent
experimental and analytic techniques and procedures were
investigated.Due to the masking abilities of the resulting oxide patterns from
ANL, the results of AFM based patterning experiments are coupled
with micromachining techniques to create higher aspect ratio
structures at the nanoscale. These relief structures are used as
master pattern molds for polymeric stamp formation to reproduce the
original in a parallel fashion using µCP stamp formation and
patterning. This new method of master fabrication provides for a
useful alternative to conventional techniques for soft lithographic
stamp formation and patterning.