The technique can record repetitive
phenomena in cantilevers, membranes
and other microelectromechanical systems
constructs. These are used in a variety of
ways and devices. Being able to image
them could benefit industry as well as
researchers.

To work in single-shot mode, the micro-scope needs an adequate photon flux, suchas that provided by an EUV laser. As withother EUV applications, the microscopeoperates in a vacuum because extremeultraviolet is absorbed by nearly every-thing. For the same reason, EUV opticsoften use reflectors, typically constructedout of multilayer materials. The interfer-ence between layers gives rise to reflectiv-ity of about 70 percent, at best.

Measuring Your EUV Laser

Erik Schoeffel, McPherson Inc.
mcp@mcphersoninc.com
For manufacturers and others who have acquired extreme-ultraviolet (EUV) lasers recently, some test and measurement are in order. At the very least, you will want
to measure the exact wavelengths emitted. Perhaps you will want to select one wavelength and use it to interact with a sample in some experiment. Both jobs call for
spectrometers.

At short wavelengths, designs such as the Czerny-Turner are not viable. This spectrometer has at least three reflective surfaces, all at near-normal incidence angles.
Even with a vacuum enclosure and state-of-the-art reflective coatings, it is not useful
at wavelengths of <110 nm.