Title (de)

Title (fr)

Publication

Application

Priority

JP 9299099 A 19990331

JP 31526499 A 19991105

Abstract (en)

A chemical amplification type positive resist composition which is good in resolution, provide a good pattern profile under exposure using light of wavelength of 220 nm or shorter even when applied on a basic substrate or a low reflectance substrate and which comprises an acid generator comprising an aliphatic sulfonium salt represented by the following formula (I): <CHEM> wherein Q<1> represents an alkyl group, Q<2> represents an alkyl group or a residue of an alicyclic hydrocarbon and m represents an integer of 1 to 8; and at least one onium salt selected from triphenylsulfonium salts represented by the following formula (IIa) and diphenyiodonium salts represented by the following formula (IIb): <CHEM> wherein Q<3>, Q<4>, Q<5>, Q<6> and Q<7> each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and q and p represent a integer of 4 to 8; and (2) a resin which has a polymerization unit with a group unstable to an acid, and is insoluble or barely soluble in alkali by itself but changes to become soluble in alkali by the action of the acid, is provided.