In the last decade, the accessibility of inexpensive and powerful computers has allowed true digital holography to be used for industrial inspection using a microscopy. This technique allows capturing a complex image of a scene, and reconstructing the phase and magnitude information. This type of image gives a new dimension to texture analysis since the topology information can be used as an additional way to extract features. This new technique can be used to extend our previous work on image segmentation of patterned wafers for defect detection. This paper presents a comparison between the features obtained using Gabor filtering on complex (i.e. containing magnitude and phase) images under illumination and focus variations.