Keynote speakers

prof.dr.ir. Richard van de Sanden - 1st keynote speaker

CV:Richard van de Sanden is the director of the Dutch Institute for Fundamental Energy Research (DIFFER since 2011) and a Professor at the Department of Applied Physics of the Eindhoven University of Technology in the Netherlands. He received his Ph.D. in 1991 from the Eindhoven University on the topic of the fundamental investigation of an expanding plasma jet. In 1990, he was appointed an Assistant Professor, his main interest being the fundamentals of plasma enhanced deposition and etching. During 1992-1997, he was a Research Fellow of the Royal Netherlands Academy of Arts and Sciences. In 1993, he was on sabbatical leave at AT&T Bell Labs in the group of R. Gottscho and worked on aspect ratio dependent etching. Since then he has worked on fast plasma deposition technology, focusing on the fundamentals of both plasma, as well as on the surface processes occurring in plasma processing of materials. He specializes in applying new advanced diagnostics for gas phase species detection as well as in situ analysis and control of the physical and chemical properties of the materials processed. In 2000, he was appointed a Full Professor at the Eindhoven University of Technology.Personal page

ir. Wiro Zijlmans - 3rd keynote speaker

CV:Having his original background in aerospace, Wiro Zijlmans has worked in the machinery industry for several years on various projects. After doing a management buy-out in 2001 he successfully transferred Smit Ovens from a glass and display machinery manufacturer to a leading supplier of customized thermal equipment and processes for the worldwide photovoltaic, glass, electronic and display industries. Smit Ovens B.V. is now serving several thin film solar manufacturers.