15.
Conclusions <ul><li>Introduction of low- k dielectric is needed in order to continue to downscale technology </li></ul><ul><li>Several CVD or Spin-on deposited materials look promising for the near-future generations </li></ul><ul><li>Spin-on porous materials appear to be the only option for future generations </li></ul><ul><li>Air gaps need more research in order to be considered for future low- k dielectrics </li></ul>