Tammo Hereen, Alisa Viejo, CA US

Patent application number

Description

Published

20140333978

FORWARD SCANNING OPTICAL PROBES WITH ONE OR MORE ROTATING COMPONENTS - In certain embodiments, a scanning system comprises optical elements and a movement system. The optical elements comprise an optical fiber and a focusing element. The optical fiber transmits a light ray and has a fiber axis that extends to an imaginary fiber axis. The focusing element refracts the light ray and has a focusing element optical axis that is substantially aligned with the imaginary fiber axis. The movement system rotates the focusing element about the focusing element optical axis to scan the light ray. In other embodiments, a scanning system comprises optical elements and a movement system. The optical elements comprise an optical fiber, a focusing element, and a prism. The prism has a prism optical axis and receives the light ray from the focusing element. The movement system rotates the prism about the prism optical axis to scan the light ray.

11-13-2014

Tammo Ripken, Wunstorf DE

Patent application number

Description

Published

20090294422

Method and device for the removal of material by means of laser pulses - The invention relates to a method for removing material by means of a laser, wherein a sequence of laser pulses is generated and an area of material to be machined is irradiated with the sequence of laser pulses. Methods of this kind are used to cut a number of different materials. One problem with this method is that thermal or mechanical damage occurs in the surroundings of the area being machined and causes impairment of areas of material that are not being machined. The invention solves this problem by the pulse energy of a single pulse in the sequence of laser pulses being lower than the laser pulse energy required to produce material removal using an isolated laser pulse in the region irradiated with the single laser pulse of the sequence of laser pulses.

OPHTHALMOLOGIC DEVICE FOR BREAKING DOWN EYE TISSUE - An opthalmological apparatus includes a base station having a light source for generating light pulses, and an application head mountable on an eye having a light projector for the focussed projection of the light pulses for punctiform breakdown of eye tissue. The application head has drivers for moving the light projector in a feed direction and in a first scanning direction. A scanner is arranged in the base station in order to deflect the light pulses in a second scanning direction. The opthalmological apparatus includes an optical transmission system for transmitting deflected light pulses from the base station to the application head, and for superimposing the light pulses deflected in the second scanning direction onto the movement of the light projector in the first scanning direction.

09-20-2012

20130274725

DEVICE FOR PROCESSING MATERIAL OF A WORKPIECE AND METHOD FOR CALIBRATING SUCH A DEVICE - A device for processing material of a workpiece, the device including a pulsed processing laser, a focusing lens, a beam-deflection unit, a control unit and a confocal detector unit. The intensity of the laser radiation is variable. An imaging unit is provided to detect structures within the workpiece using electromagnetic radiation, wherein the electromagnetic radiation of the imaging unit is radiated via the beam-deflection unit and the focusing lens into the workpiece, and evaluating device is provided and compares the position of the focus of the laser radiation determined by the detector unit with the expected position of the focus in the image of the workpiece obtained by the imaging unit.

10-17-2013

20150190275

OPHTHALMOLOGIC DEVICE FOR BREAKING DOWN EYE TISSUE - An ophthalmological apparatus includes a base station having a light source generating light pulses, and an application head mountable on an eye having a light projector for focussed projection of the light pulses for punctiform breakdown of eye tissue. The application head has movement drivers moving the light projector in a feed direction and a first scanning direction. A scanner in the base station deflects the light pulses in a second scanning direction. The ophthalmological apparatus includes an optical transmission system transmitting deflected light pulses from the base station to the application head, and superimposing the light pulses deflected in the second scanning direction onto the movement of the light projector in the first scanning direction. Light sources with high light pulse rates, for example femtosecond lasers may be used, without impractical enlargement of the size of the application head.

07-09-2015

Patent applications by Tammo Ripken, Wunstorf DE

Tammo Spalink, Taipei TW

Patent application number

Description

Published

20130082098

APPARATUS AND METHOD FOR AUTOMATICALLY PROVIDING INFORMATION TO A NEW COMPUTER - A system and method is disclosed for automatically providing information to a newly-manufactured computing device. During the manufacture of a new computing device at an assembly line, a camera integrated with the computing device is automatically activated as a barcode scanner. On the camera viewing a barcode that includes device-specific configuration information, the barcode is read by the computing device to read the device-specific configuration information for storage in a non-volatile memory of the device.

04-04-2013

Tammo Uitterdijk, Gj De Bilt NL

Patent application number

Description

Published

20090190116

METHOD OF MANUFACTURING A MINIATURIZED DEVICE - A lithographic method of manufacturing a miniaturized device using a projection exposure system involves illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

07-30-2009

Tammo Uitterdijk, De Bilt NL

Patent application number

Description

Published

20080212183

Lithographic apparatus, aberration correction device and device manufacturing method - An aberration correction device useable in lithography comprises two elements, at least one of which is relatively rotatable to the other about, for example, an optical axis. One surface of each element has an aspheric form describable by higher Zernike polynomials. When the two surfaces are rotationally aligned, the device has the optical effect of a plane plate. If there is a small relative rotation of the two elements the effect of the device is a phase shift describable by the derivative of the aspheric form. The correction device may be used to correct aberrations caused by lens heating, especially with illumination modes and pattern types resulting in strong off-axis localized pupil filling in the projection system.

09-04-2008

20080259296

Lithographic apparatus and device manufacturing method - In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

10-23-2008

20100045956

Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

02-25-2010

20100118288

Lithographic projection system and projection lens polarization sensor - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

05-13-2010

20100182582

Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.

07-22-2010

20110159441

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.

06-30-2011

20110279796

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

11-17-2011

20120008113

LITHOGRAPHIC APPARATUS, CONTROL SYSTEM AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.

01-12-2012

20130176547

Lithographic Apparatus and a Method for Determining a Polarization Property - A lithographic apparatus includes an illumination system, a support, a patterning device, a substrate table, a projection system, and a detector. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable and a polarization analyzer, such as a linear polarizer. The polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.

07-11-2013

20140071420

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF

03-13-2014

20140347642

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF