This is a single ion beam Seiko SII system with a built-in scanning ion microscope. It scans the sample surface at nanometer levels using a Ga ion beam, detects secondary electrons for imaging. Micro-etching (cross-sectioning) and micro-deposition (Pt and W) can be done on any kind of samples. It is a very useful ultra micro fabrication technique for our nanomaterial projects.

DEPARTMENT OF PHYSICS

The Hong Kong University of Science and Technology
Clear Water Bay, Kowloon, Hong Kong