The 157nm F2-laser drives strong and precisely controllable interactions with fused silica, the most widely used material for bulk optics, optical fibers, and planar optical circuits. Precise excisions of 10 to 40 nm depth are available that meet the requirements for generating efficient visible and ultraviolet diffractive optical elements (DOE). F2-laser radiation was applied in combination with beam homogenization optics and high-precision computer controlled motion stages to shape 16-level DOE devices on bulk glasses and optical fiber facets. A 128×128 pixel DOE was fabricated and characterized. Each level had distinguishable spacing of ~140 nm and surface roughness of ~38 nm. The far-field pattern when illuminated with a HeNe laser agreed well with the simulation results by an Iterative Fourier Transform Algorithm (ITFA). Improvements to increase the 1st order diffraction efficiency of 22% are offered.