Proceedings Paper

A perspective is given using student projects on how university research can be an important resource for the highly
advanced and sophisticated photomask industry. The collaborative and cross-discipline nature of innovation in the IC
industry naturally leads to win-win relationships. Specific examples are given of successful collaborative research
projects from the University of California consortium "Integrated Modeling Process and Computation for Technology"
(IMPACT). The examples include research on lithography and inspection, devices, statistical characterization, and
Design-for-Manufacturing frameworks for multiple-patterning and EUV. The paper concludes with a perspective on
future opportunities, challenges and plans. The technical details of the student projects were published but not presented
in connection with Photomask Japan 2011 (SPIE Proc. 8081).