Abstract

Results on optimization and manufacturing of La/B4C multilayers are reported. Such mirrors are promising optical elements for the development of the next generation of nano-lithography at an operation wavelength of 6.7 nm. A near-normal incidence reflectivity of up to 58.6% has been measured at the BESSY-II soft x-ray reflectometer beamline. This is the highest reflectivity measured so far at this wavelength. The potential to further increase the reflectivity of the multilayers is discussed.

Received 30 September 2012Accepted 19 December 2012Published online 09 January 2013

Acknowledgments:

This work was supported in part by companies ASML and Phystex, the Netherlands, and also supported by RFBR 09-02-00912, 10-02-00957, 11-02-00597, 11-02-00589, 11-02-00961, 11 - 02-97109 and the Federal Program “Scientific and scientific-pedagogical personnel of innovative Russia in 2009-2013.”