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In this study, the structuring of micro- and nanocrystalline diamond thin ﬁlms is demonstrated. The structuring of the diamond ﬁlms is performed using the technique of microsphere lithography followed by reactive ion etching. Specifically, this paper presents a four-step fabrication process: diamond deposition (microwave plasma assisted chemical vapor deposition), mask preparation (by the standard Langmuir-Blodgett method), mask modification and diamond etching. A self-assembled monolayer of monodisperse polystyrene (PS) microspheres with close-packed ordering is used as the primary template. Then the PS microspheres and the diamond films are processed in capacitively coupled radiofrequency plasma using different plasma chemistries. This fabrication method illustrates the preparation of large arrays of periodic and homogeneous hillock-like structures. The surface morphology of processed diamond films is characterized by scanning electron microscopy and atomic force microscope. The potential applications of such diamond structures in various fields of nanotechnology are also briefly discussed.