Abstract

Nanoscale anodization was performed on the surface of amorphous siliconthin films by means of an atomic force microscope. The anodization mechanism was different from that previously reported on metalthin films. We found that the anodization was a function of defect density and current through the sample. The optical properties of the anodized area were measured by means of micro-photoluminescence, in which photoluminescence intensity decreases with oxidation. We concluded that both defect reaction and creation processes are important during the nanoscale anodization of amorphous material.