Abstract

Based on the analyses of microprocesses involved in the interaction of synchrotron radiation with materials, we have developed a simulation method to calculate heat energy distribution when the synchrotron radiation goes through insert devices (filters, mirrors, or monochromators). The absorbed x‐ray energy may be taken away from materials when some scatteredphoton and photoelectron escape from material. We have calculated the percentage of the absorbed energy taken away by the escaped photons and photoelectrons for C, Be, and Al, these elements being very important as filter materials, and for Si which is significant as a monochromatormaterial.