Used primarily as a plasma generator for 200 and 300 mm wafer processing, flat panel display (FPD), and DVD equipment, the flexible HFV generator offers process consistency for ionized physical vapor deposition (IPVD), CVD, and etch. This versatile power generator’s features include digitally synthesized variable-frequency output and microprocessor control, with output power levels of 5 and 8 kW. In addition, it delivers an output frequency range of 1.765 to 2.165 MHz. Frequency tuning parameters that reside in firmware may be customized to ensure repeatable operation with a wide variety of chamber configurations and process recipes.